{"id":"https://openalex.org/W1978288458","doi":"https://doi.org/10.1103/physrevb.81.035317","title":"Detection of arsenic dopant atoms in a silicon crystal using a spherical aberration corrected scanning transmission electron microscope","display_name":"Detection of arsenic dopant atoms in a silicon crystal using a spherical aberration corrected scanning transmission electron microscope","publication_year":2010,"publication_date":"2010-01-11","ids":{"openalex":"https://openalex.org/W1978288458","doi":"https://doi.org/10.1103/physrevb.81.035317","mag":"1978288458"},"language":"en","primary_location":{"id":"doi:10.1103/physrevb.81.035317","doi":"https://doi.org/10.1103/physrevb.81.035317","is_oa":false,"landing_page_url":"https://doi.org/10.1103/physrevb.81.035317","pdf_url":null,"source":{"id":"https://openalex.org/S6791298","display_name":"Physical Review B","issn_l":"1098-0121","issn":["1098-0121","1538-4489","1550-235X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","vabb-shw"],"host_organization":"https://openalex.org/P4310320261","host_organization_name":"American Physical Society","host_organization_lineage":["https://openalex.org/P4310320261"],"host_organization_lineage_names":["American Physical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Physical Review B","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5039613818","display_name":"Yoshifumi Oshima","orcid":"https://orcid.org/0000-0003-1898-0142","observed_orcids":["https://orcid.org/0000-0003-1898-0142"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Y. Oshima","raw_affiliation_strings":["JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Y. Hashimoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Hashimoto","raw_affiliation_strings":["JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069512933","display_name":"Y. Tanishiro","orcid":"https://orcid.org/0000-0003-1916-3961","observed_orcids":["https://orcid.org/0000-0003-1916-3961"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Tanishiro","raw_affiliation_strings":["JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103226752","display_name":"K. Takayanagi","orcid":"https://orcid.org/0000-0001-9567-4929","observed_orcids":["https://orcid.org/0000-0001-9567-4929"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Takayanagi","raw_affiliation_strings":["JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5065977516","display_name":"Hidetaka Sawada","orcid":"https://orcid.org/0000-0002-6078-2695","observed_orcids":["https://orcid.org/0000-0002-6078-2695"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I129923673","display_name":"JEOL (Japan)","ror":"https://ror.org/02zme4e72","country_code":"JP","type":"company","lineage":["https://openalex.org/I129923673"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Sawada","raw_affiliation_strings":["JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"]},{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan","institution_ids":["https://openalex.org/I129923673","https://openalex.org/I4210086780"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110099337","display_name":"T. Kaneyama","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I129923673","display_name":"JEOL (Japan)","ror":"https://ror.org/02zme4e72","country_code":"JP","type":"company","lineage":["https://openalex.org/I129923673"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Kaneyama","raw_affiliation_strings":["JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"]},{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan","institution_ids":["https://openalex.org/I129923673","https://openalex.org/I4210086780"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069695916","display_name":"Yukihito Kondo","orcid":"https://orcid.org/0000-0002-5145-1712","observed_orcids":["https://orcid.org/0000-0002-5145-1712"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I129923673","display_name":"JEOL (Japan)","ror":"https://ror.org/02zme4e72","country_code":"JP","type":"company","lineage":["https://openalex.org/I129923673"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Kondo","raw_affiliation_strings":["JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"]},{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and JEOL Ltd., 3-1-2 Musashino, Akishima, Tokyo 196-8558, Japan","institution_ids":["https://openalex.org/I129923673","https://openalex.org/I4210086780"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018508633","display_name":"Naoto Hashikawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},{"id":"https://openalex.org/I4210153176","display_name":"Renesas Electronics (Japan)","ror":"https://ror.org/058wb7691","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210153176"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"N. Hashikawa","raw_affiliation_strings":["JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","Renesas Technology Corp., 5-20-1 Josuihon-cho Kodaira, Tokyo 187-8588, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"]},{"raw_affiliation_string":"Renesas Technology Corp., 5-20-1 Josuihon-cho Kodaira, Tokyo 187-8588, Japan","institution_ids":["https://openalex.org/I4210153176"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5086215826","display_name":"Kei Asayama","orcid":"https://orcid.org/0000-0003-3365-0547","observed_orcids":["https://orcid.org/0000-0003-3365-0547"]},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698","https://openalex.org/I4400009020"]},{"id":"https://openalex.org/I4210086780","display_name":"Japan Science and Technology Agency","ror":"https://ror.org/00097mb19","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},{"id":"https://openalex.org/I4210153176","display_name":"Renesas Electronics (Japan)","ror":"https://ror.org/058wb7691","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210153176"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Asayama","raw_affiliation_strings":["JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","Renesas Technology Corp., 5-20-1 Josuihon-cho Kodaira, Tokyo 187-8588, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"JST\u2013CREST, 5-Sanbancho, Chiyoda-ku, Tokyo 102-0075, Japan and Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro-ku, Tokyo 152-8551, Japan","institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"]},{"raw_affiliation_string":"Renesas Technology Corp., 5-20-1 Josuihon-cho Kodaira, Tokyo 187-8588, Japan","institution_ids":["https://openalex.org/I4210153176"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5039613818"],"corresponding_institution_ids":["https://openalex.org/I114531698","https://openalex.org/I4210086780"],"apc_list":{"value":2675,"currency":"USD","value_usd":2675},"apc_paid":null,"fwci":1.8838,"has_fulltext":false,"cited_by_count":29,"citation_normalized_percentile":{"value":0.89775561,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"81","issue":"3","first_page":"035317","last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10857","display_name":"Advanced Electron Microscopy Techniques and Applications","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/1315","display_name":"Structural Biology"},"field":{"id":"https://openalex.org/fields/13","display_name":"Biochemistry, Genetics and Molecular Biology"},"domain":{"id":"https://openalex.org/domains/1","display_name":"Life Sciences"}},"topics":[{"id":"https://openalex.org/T10857","display_name":"Advanced Electron Microscopy Techniques and Applications","score":0.9932000041007996,"subfield":{"id":"https://openalex.org/subfields/1315","display_name":"Structural Biology"},"field":{"id":"https://openalex.org/fields/13","display_name":"Biochemistry, Genetics and Molecular Biology"},"domain":{"id":"https://openalex.org/domains/1","display_name":"Life Sciences"}},{"id":"https://openalex.org/T13552","display_name":"Advanced Materials Characterization Techniques","score":0.0026000000070780516,"subfield":{"id":"https://openalex.org/subfields/2500","display_name":"General Materials Science"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.0017999999690800905,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon","display_name":"silicon","score":0.3720000088214874},{"id":"https://openalex.org/keywords/spherical-aberration-correction","display_name":"spherical aberration correction","score":0.878000020980835},{"id":"https://openalex.org/keywords/scanning-transmission-electron-microscopy","display_name":"scanning transmission electron microscopy","score":0.9679999947547913},{"id":"https://openalex.org/keywords/dopant-clustering","display_name":"dopant clustering","score":0.6859999895095825},{"id":"https://openalex.org/keywords/rapid-thermal-annealing","display_name":"rapid thermal annealing","score":0.8289999961853027},{"id":"https://openalex.org/keywords/silicon-transistors","display_name":"silicon transistors","score":0.6949999928474426}],"concepts":[{"id":"https://openalex.org/C191952053","wikidata":"https://www.wikidata.org/wiki/Q15119237","display_name":"Dopant","level":3,"score":0.8484082221984863},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.772284209728241},{"id":"https://openalex.org/C193016168","wikidata":"https://www.wikidata.org/wiki/Q874835","display_name":"Scanning transmission electron microscopy","level":3,"score":0.7390295267105103},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6603184938430786},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.5396843552589417},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.5015413761138916},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.4865785837173462},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.47054344415664673},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.44897571206092834},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2189415991306305},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1103/physrevb.81.035317","doi":"https://doi.org/10.1103/physrevb.81.035317","is_oa":false,"landing_page_url":"https://doi.org/10.1103/physrevb.81.035317","pdf_url":null,"source":{"id":"https://openalex.org/S6791298","display_name":"Physical Review B","issn_l":"1098-0121","issn":["1098-0121","1538-4489","1550-235X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","vabb-shw"],"host_organization":"https://openalex.org/P4310320261","host_organization_name":"American Physical Society","host_organization_lineage":["https://openalex.org/P4310320261"],"host_organization_lineage_names":["American Physical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Physical Review B","raw_type":"journal-article"},{"id":"pmh:oai:irdb.nii.ac.jp:00897:0004035610","doi":null,"is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100598037","pdf_url":null,"source":{"id":"https://openalex.org/S7407056385","display_name":"Institutional Repositories DataBase (IRDB)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I184597095","host_organization_name":"National Institute of Informatics","host_organization_lineage":["https://openalex.org/I184597095"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Physical Review B","raw_type":"journal article"},{"id":"pmh:oai:t2r2.star.titech.ac.jp:50094439","doi":null,"is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100598037","pdf_url":null,"source":{"id":"https://openalex.org/S4377196385","display_name":"Tokyo Tech Research Repository (Tokyo Institute of Technology)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I114531698","host_organization_name":"Tokyo Institute of Technology","host_organization_lineage":["https://openalex.org/I114531698"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Journal Article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":25,"referenced_works":["https://openalex.org/W1621319046","https://openalex.org/W1876297499","https://openalex.org/W1966272533","https://openalex.org/W1974906265","https://openalex.org/W1987449940","https://openalex.org/W1995315132","https://openalex.org/W2000149281","https://openalex.org/W2002801138","https://openalex.org/W2030383355","https://openalex.org/W2042046341","https://openalex.org/W2048003872","https://openalex.org/W2063492227","https://openalex.org/W2064462943","https://openalex.org/W2071077478","https://openalex.org/W2084057125","https://openalex.org/W2087070363","https://openalex.org/W2093183051","https://openalex.org/W2102010849","https://openalex.org/W2142718365","https://openalex.org/W2146377329","https://openalex.org/W2150444965","https://openalex.org/W2151365450","https://openalex.org/W2153041356","https://openalex.org/W2162532420","https://openalex.org/W2542533065"],"related_works":["https://openalex.org/W2064462943","https://openalex.org/W2051811676","https://openalex.org/W2903405646","https://openalex.org/W2095953689","https://openalex.org/W2000149281","https://openalex.org/W2561400627","https://openalex.org/W2782840190","https://openalex.org/W2055840587","https://openalex.org/W4206373931","https://openalex.org/W7113775051"],"abstract_inverted_index":{"In":[0,45],"recent":[1],"silicon":[2,61,91,125],"transistors,":[3],"fluctuation":[4],"of":[5,17,83,103,132],"the":[6,15,43,94,101,114],"gate":[7],"threshold":[8],"voltage":[9],"due":[10],"to":[11,24,86],"statistical":[12],"variation":[13],"in":[14,58,121],"number":[16],"dopant":[18,40,105],"atoms":[19,41,57,106,134],"has":[20],"been":[21],"pointed":[22],"out":[23],"be":[25],"a":[26,50,59,75,80,108,122],"serious":[27],"problem.":[28],"For":[29],"this":[30,46],"reason,":[31],"characterization":[32],"methods":[33],"are":[34],"required":[35],"which":[36],"can":[37],"detect":[38],"individual":[39,54],"within":[42,107],"transistor.":[44],"paper,":[47],"we":[48],"present":[49],"technique":[51],"for":[52],"visualizing":[53],"arsenic":[55],"(As)":[56],"doped":[60,90,124],"crystal":[62],"using":[63],"our":[64],"developed":[65],"spherical":[66],"aberration":[67],"corrected":[68],"scanning":[69],"transmission":[70],"electron":[71,77],"microscope":[72],"(STEM)":[73],"with":[74,79],"convergent":[76],"probe":[78],"half":[81],"angle":[82],"30":[84],"mrad":[85],"view":[87],"very":[88],"thin":[89],"crystals":[92],"from":[93],"[001]":[95],"direction.":[96],"The":[97],"STEM":[98],"images":[99],"show":[100],"distribution":[102],"As":[104,133],"2.7":[109],"nm":[110],"defocusing":[111],"range":[112],"around":[113],"focal":[115],"position.":[116],"It":[117],"was":[118,135],"found":[119],"that":[120],"highly":[123],"wafer":[126],"following":[127],"rapid":[128],"thermal":[129],"annealing,":[130],"clustering":[131],"extremely":[136],"rare.":[137]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":2},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":2},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":3},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":5},{"year":2012,"cited_by_count":4}],"updated_date":"2026-11-11T12:16:26.678958","created_date":"2016-06-24T00:00:00"}