{"id":"https://openalex.org/W1975922467","doi":"https://doi.org/10.1016/s0040-6090(00)01568-6","title":"Oxygen diffusion in silicon oxide films produced by different methods","display_name":"Oxygen diffusion in silicon oxide films produced by different methods","publication_year":2000,"publication_date":"2000-12-01","ids":{"openalex":"https://openalex.org/W1975922467","doi":"https://doi.org/10.1016/s0040-6090(00)01568-6","mag":"1975922467"},"language":"en","primary_location":{"id":"doi:10.1016/s0040-6090(00)01568-6","doi":"https://doi.org/10.1016/s0040-6090(00)01568-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0040-6090(00)01568-6","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5081468877","display_name":"Jos\u00e9 de Jes\u00fas P\u00e9rez Bueno","orcid":"https://orcid.org/0000-0002-7775-405X","observed_orcids":["https://orcid.org/0000-0002-7775-405X"]},"institutions":[{"id":"https://openalex.org/I157492648","display_name":"Autonomous University of Queretaro","ror":"https://ror.org/00v8fdc16","country_code":"MX","type":"education","lineage":["https://openalex.org/I157492648"]}],"countries":["MX"],"is_corresponding":true,"raw_author_name":"J.J P\u00e9rez-Bueno","raw_affiliation_strings":["Divisi\u00f3n de Estudios de Posgrado, Facultad de Ingenier\u0131\u0301a, Universidad Aut\u00f3noma de Quer\u00e9taro, Quer\u00e9taro, Qro., Mexico","Divisi\u00f3n de Estudios de Posgrado, Facultad de Ingenier\u00eda, Universidad Aut\u00f3noma de Qu\u00e9retaro Qu\u00e9retaro, Qro., Mexico"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Divisi\u00f3n de Estudios de Posgrado, Facultad de Ingenier\u0131\u0301a, Universidad Aut\u00f3noma de Quer\u00e9taro, Quer\u00e9taro, Qro., Mexico","institution_ids":["https://openalex.org/I157492648"]},{"raw_affiliation_string":"Divisi\u00f3n de Estudios de Posgrado, Facultad de Ingenier\u00eda, Universidad Aut\u00f3noma de Qu\u00e9retaro Qu\u00e9retaro, Qro., Mexico","institution_ids":["https://openalex.org/I157492648"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051813371","display_name":"Rafael Ram\u00edrez-Bon","orcid":"https://orcid.org/0000-0001-8939-6731","observed_orcids":["https://orcid.org/0000-0001-8939-6731"]},"institutions":[{"id":"https://openalex.org/I68368234","display_name":"Centro de Investigaci\u00f3n y de Estudios Avanzados del Instituto Polit\u00e9cnico Nacional","ror":"https://ror.org/009eqmr18","country_code":"MX","type":"facility","lineage":["https://openalex.org/I59361560","https://openalex.org/I68368234"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"R Ram\u0131\u0301rez-Bon","raw_affiliation_strings":["Centro de Investigaci\u00f3n y de Estudios Avanzados del I.P.N., Unidad Quer\u00e9taro, Ap. Postal 1-798, 76001 Quer\u00e9taro, Qro., Mexico"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centro de Investigaci\u00f3n y de Estudios Avanzados del I.P.N., Unidad Quer\u00e9taro, Ap. Postal 1-798, 76001 Quer\u00e9taro, Qro., Mexico","institution_ids":["https://openalex.org/I68368234"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113662778","display_name":"Yu. V. Vorobiev","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I68368234","display_name":"Centro de Investigaci\u00f3n y de Estudios Avanzados del Instituto Polit\u00e9cnico Nacional","ror":"https://ror.org/009eqmr18","country_code":"MX","type":"facility","lineage":["https://openalex.org/I59361560","https://openalex.org/I68368234"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"Y.V Vorobiev","raw_affiliation_strings":["Centro de Investigaci\u00f3n y de Estudios Avanzados del I.P.N., Unidad Quer\u00e9taro, Ap. Postal 1-798, 76001 Quer\u00e9taro, Qro., Mexico"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centro de Investigaci\u00f3n y de Estudios Avanzados del I.P.N., Unidad Quer\u00e9taro, Ap. Postal 1-798, 76001 Quer\u00e9taro, Qro., Mexico","institution_ids":["https://openalex.org/I68368234"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046705796","display_name":"F.J. Espinoza\u2010Beltr\u00e1n","orcid":"https://orcid.org/0000-0001-7270-4881","observed_orcids":["https://orcid.org/0000-0001-7270-4881"]},"institutions":[{"id":"https://openalex.org/I68368234","display_name":"Centro de Investigaci\u00f3n y de Estudios Avanzados del Instituto Polit\u00e9cnico Nacional","ror":"https://ror.org/009eqmr18","country_code":"MX","type":"facility","lineage":["https://openalex.org/I59361560","https://openalex.org/I68368234"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"F Espinoza-Beltr\u00e1n","raw_affiliation_strings":["Centro de Investigaci\u00f3n y de Estudios Avanzados del I.P.N., Unidad Quer\u00e9taro, Ap. Postal 1-798, 76001 Quer\u00e9taro, Qro., Mexico"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centro de Investigaci\u00f3n y de Estudios Avanzados del I.P.N., Unidad Quer\u00e9taro, Ap. Postal 1-798, 76001 Quer\u00e9taro, Qro., Mexico","institution_ids":["https://openalex.org/I68368234"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5103127033","display_name":"Jesus Gonzalez-Hernandez","orcid":"https://orcid.org/0000-0002-3724-1583","observed_orcids":["https://orcid.org/0000-0002-3724-1583"]},"institutions":[{"id":"https://openalex.org/I68368234","display_name":"Centro de Investigaci\u00f3n y de Estudios Avanzados del Instituto Polit\u00e9cnico Nacional","ror":"https://ror.org/009eqmr18","country_code":"MX","type":"facility","lineage":["https://openalex.org/I59361560","https://openalex.org/I68368234"]}],"countries":["MX"],"is_corresponding":false,"raw_author_name":"J Gonz\u00e1lez-Hern\u00e1ndez","raw_affiliation_strings":["Centro de Investigaci\u00f3n y de Estudios Avanzados del I.P.N., Unidad Quer\u00e9taro, Ap. Postal 1-798, 76001 Quer\u00e9taro, Qro., Mexico"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centro de Investigaci\u00f3n y de Estudios Avanzados del I.P.N., Unidad Quer\u00e9taro, Ap. Postal 1-798, 76001 Quer\u00e9taro, Qro., Mexico","institution_ids":["https://openalex.org/I68368234"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5081468877"],"corresponding_institution_ids":["https://openalex.org/I157492648"],"apc_list":{"value":3120,"currency":"USD","value_usd":3120},"apc_paid":null,"fwci":1.2678,"has_fulltext":false,"cited_by_count":28,"citation_normalized_percentile":{"value":0.78591034,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"379","issue":"1-2","first_page":"57","last_page":"63"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9667999744415283,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9667999744415283,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.022099999710917473,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12420","display_name":"Silicone and Siloxane Chemistry","score":0.0012000000569969416,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/oxygen-diffusion-coefficient","display_name":"oxygen diffusion coefficient","score":0.8420000076293945},{"id":"https://openalex.org/keywords/silicon-oxide-thin-films","display_name":"silicon oxide thin films","score":0.8870000243186951},{"id":"https://openalex.org/keywords/copper-oxide-layer","display_name":"copper oxide layer","score":0.8069999814033508},{"id":"https://openalex.org/keywords/sol-gel-thin-films","display_name":"sol-gel thin films","score":0.5989999771118164},{"id":"https://openalex.org/keywords/tetraethyl-orthosilicate","display_name":"tetraethoxysilane","score":0.9200000166893005},{"id":"https://openalex.org/keywords/dc-sputtering","display_name":"DC sputtering","score":0.8960000276565552},{"id":"https://openalex.org/keywords/heat-treatment","display_name":"heat treatment","score":0.5889999866485596},{"id":"https://openalex.org/keywords/dielectric-breakdown-field","display_name":"dielectric breakdown field","score":0.9089999794960022},{"id":"https://openalex.org/keywords/oxide-film-structure","display_name":"oxide film structure","score":0.5889999866485596}],"concepts":[{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.6352657079696655},{"id":"https://openalex.org/C69357855","wikidata":"https://www.wikidata.org/wiki/Q163214","display_name":"Diffusion","level":2,"score":0.6287342309951782},{"id":"https://openalex.org/C540031477","wikidata":"https://www.wikidata.org/wiki/Q629","display_name":"Oxygen","level":2,"score":0.5613059401512146},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5612789392471313},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5487280488014221},{"id":"https://openalex.org/C2781183027","wikidata":"https://www.wikidata.org/wiki/Q106920642","display_name":"Copper oxide","level":3,"score":0.5426478981971741},{"id":"https://openalex.org/C25442681","wikidata":"https://www.wikidata.org/wiki/Q28087","display_name":"Auger electron spectroscopy","level":2,"score":0.542102038860321},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.503607451915741},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.49076423048973083},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.4887399673461914},{"id":"https://openalex.org/C2779105228","wikidata":"https://www.wikidata.org/wiki/Q2286029","display_name":"Silicon oxide","level":4,"score":0.46512696146965027},{"id":"https://openalex.org/C544778455","wikidata":"https://www.wikidata.org/wiki/Q753","display_name":"Copper","level":2,"score":0.44588765501976013},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.38465794920921326},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.34359079599380493},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.13447612524032593},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.09402698278427124},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.0874125063419342},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.06212747097015381},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C2777431650","wikidata":"https://www.wikidata.org/wiki/Q413828","display_name":"Silicon nitride","level":3,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/s0040-6090(00)01568-6","doi":"https://doi.org/10.1016/s0040-6090(00)01568-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0040-6090(00)01568-6","pdf_url":null,"source":{"id":"https://openalex.org/S84339699","display_name":"Thin Solid Films","issn_l":"0040-6090","issn":["0040-6090","1879-2731"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Thin Solid Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320321739","display_name":"Consejo Nacional de Ciencia y Tecnolog\u00eda","ror":"https://ror.org/059ex5q34"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":22,"referenced_works":["https://openalex.org/W586102426","https://openalex.org/W1491885026","https://openalex.org/W1520026019","https://openalex.org/W1964342233","https://openalex.org/W1968590834","https://openalex.org/W1968594325","https://openalex.org/W1998626321","https://openalex.org/W2012607297","https://openalex.org/W2024659687","https://openalex.org/W2042161833","https://openalex.org/W2042695504","https://openalex.org/W2051297536","https://openalex.org/W2053515004","https://openalex.org/W2058450358","https://openalex.org/W2066301944","https://openalex.org/W2075542154","https://openalex.org/W2149993925","https://openalex.org/W2157321625","https://openalex.org/W2162123284","https://openalex.org/W2333442745","https://openalex.org/W2506651301","https://openalex.org/W4243292997"],"related_works":["https://openalex.org/W1629959757","https://openalex.org/W2606081987","https://openalex.org/W2024659687","https://openalex.org/W3086387985","https://openalex.org/W1988302115","https://openalex.org/W2949957360","https://openalex.org/W2051204325","https://openalex.org/W1991132740","https://openalex.org/W2055250321","https://openalex.org/W2952400503"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":4},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":3},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":3},{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-12T09:40:04.860316","created_date":"2016-06-24T00:00:00"}