{"id":"https://openalex.org/W1975467097","doi":"https://doi.org/10.1364/ao.45.000484","title":"Linear astigmatism of confocal off-axis reflective imaging systems and its elimination","display_name":"Linear astigmatism of confocal off-axis reflective imaging systems and its elimination","publication_year":2006,"publication_date":"2006-01-20","ids":{"openalex":"https://openalex.org/W1975467097","doi":"https://doi.org/10.1364/ao.45.000484","mag":"1975467097","pmid":"https://pubmed.ncbi.nlm.nih.gov/16463732"},"language":"en","primary_location":{"id":"doi:10.1364/ao.45.000484","doi":"https://doi.org/10.1364/ao.45.000484","is_oa":false,"landing_page_url":"https://doi.org/10.1364/ao.45.000484","pdf_url":null,"source":{"id":"https://openalex.org/S4210211917","display_name":"Applied Optics","issn_l":"0003-6935","issn":["0003-6935","1539-4522","1540-8981","1559-128X","2155-3165"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["jufo-1","medline","norway-1"],"host_organization":"https://openalex.org/P4310315679","host_organization_name":"Optica Publishing Group","host_organization_lineage":["https://openalex.org/P4310315679"],"host_organization_lineage_names":["Optica Publishing Group"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Optics","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref","pubmed"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5109415159","display_name":"Seunghyuk Chang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},{"id":"https://openalex.org/I4399598381","display_name":"Samsung Advanced Institute of Technology (South Korea)","ror":"https://ror.org/04axnyp10","country_code":null,"type":"company","lineage":["https://openalex.org/I4399598381"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seunghyuk Chang","raw_affiliation_strings":["Devices Laboratory, Materials and Devices Research Center, Samsung Advanced Institute of Technology, Suwon, Korea. chang@offaxis.co.kr","Devices Laboratory, Materials and Devices Research Center, Samsung Advanced Institute of Technology, Suwon, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Devices Laboratory, Materials and Devices Research Center, Samsung Advanced Institute of Technology, Suwon, Korea. chang@offaxis.co.kr","institution_ids":["https://openalex.org/I4399598381"]},{"raw_affiliation_string":"Devices Laboratory, Materials and Devices Research Center, Samsung Advanced Institute of Technology, Suwon, Korea","institution_ids":["https://openalex.org/I2250650973","https://openalex.org/I4399598381"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100766456","display_name":"Jung-Hoon Lee","orcid":"https://orcid.org/0000-0001-9006-1947","observed_orcids":["https://orcid.org/0000-0001-9006-1947"]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},{"id":"https://openalex.org/I4399598381","display_name":"Samsung Advanced Institute of Technology (South Korea)","ror":"https://ror.org/04axnyp10","country_code":null,"type":"company","lineage":["https://openalex.org/I4399598381"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jung Hoon Lee","raw_affiliation_strings":["Samsung Advanced Institute of Technology","Samsung Adv. Inst. of Tech"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Advanced Institute of Technology","institution_ids":["https://openalex.org/I2250650973","https://openalex.org/I4399598381"]},{"raw_affiliation_string":"Samsung Adv. Inst. of Tech","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5073218810","display_name":"Suk Pil Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},{"id":"https://openalex.org/I4399598381","display_name":"Samsung Advanced Institute of Technology (South Korea)","ror":"https://ror.org/04axnyp10","country_code":null,"type":"company","lineage":["https://openalex.org/I4399598381"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Suk Pil Kim","raw_affiliation_strings":["Samsung Advanced Institute of Technology","Samsung Adv. Inst. of Tech"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Advanced Institute of Technology","institution_ids":["https://openalex.org/I2250650973","https://openalex.org/I4399598381"]},{"raw_affiliation_string":"Samsung Adv. Inst. of Tech","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100752484","display_name":"Hun Kim","orcid":"https://orcid.org/0000-0002-3789-914X","observed_orcids":["https://orcid.org/0000-0002-3789-914X"]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},{"id":"https://openalex.org/I4399598381","display_name":"Samsung Advanced Institute of Technology (South Korea)","ror":"https://ror.org/04axnyp10","country_code":null,"type":"company","lineage":["https://openalex.org/I4399598381"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hun Kim","raw_affiliation_strings":["Samsung Advanced Institute of Technology","Samsung Adv. Inst. of Tech"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Advanced Institute of Technology","institution_ids":["https://openalex.org/I2250650973","https://openalex.org/I4399598381"]},{"raw_affiliation_string":"Samsung Adv. Inst. of Tech","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109943370","display_name":"Won Joo Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},{"id":"https://openalex.org/I4399598381","display_name":"Samsung Advanced Institute of Technology (South Korea)","ror":"https://ror.org/04axnyp10","country_code":null,"type":"company","lineage":["https://openalex.org/I4399598381"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Won Joo Kim","raw_affiliation_strings":["Samsung Advanced Institute of Technology","Samsung Adv. Inst. of Tech"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Advanced Institute of Technology","institution_ids":["https://openalex.org/I2250650973","https://openalex.org/I4399598381"]},{"raw_affiliation_string":"Samsung Adv. Inst. of Tech","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103731289","display_name":"Ihun Song","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},{"id":"https://openalex.org/I4399598381","display_name":"Samsung Advanced Institute of Technology (South Korea)","ror":"https://ror.org/04axnyp10","country_code":null,"type":"company","lineage":["https://openalex.org/I4399598381"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Ihun Song","raw_affiliation_strings":["Samsung Advanced Institute of Technology","Samsung Adv. Inst. of Tech"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Advanced Institute of Technology","institution_ids":["https://openalex.org/I2250650973","https://openalex.org/I4399598381"]},{"raw_affiliation_string":"Samsung Adv. Inst. of Tech","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5107833502","display_name":"Youngsoo Park","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},{"id":"https://openalex.org/I4399598381","display_name":"Samsung Advanced Institute of Technology (South Korea)","ror":"https://ror.org/04axnyp10","country_code":null,"type":"company","lineage":["https://openalex.org/I4399598381"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Youngsoo Park","raw_affiliation_strings":["Samsung Advanced Institute of Technology","Samsung Adv. Inst. of Tech"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Advanced Institute of Technology","institution_ids":["https://openalex.org/I2250650973","https://openalex.org/I4399598381"]},{"raw_affiliation_string":"Samsung Adv. Inst. of Tech","institution_ids":["https://openalex.org/I2250650973"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":19,"citation_normalized_percentile":{"value":0.14688098,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":"45","issue":"3","first_page":"484","last_page":"484"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.9907000064849854,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.9907000064849854,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.0024999999441206455,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14158","display_name":"Optical Systems and Laser Technology","score":0.0008999999845400453,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/confocal-microscopy","display_name":"confocal microscopy","score":0.8299999833106995},{"id":"https://openalex.org/keywords/two-mirror-system","display_name":"two-mirror system","score":0.8159999847412109},{"id":"https://openalex.org/keywords/ray-tracing","display_name":"ray tracing","score":0.7080000042915344}],"concepts":[{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.8853470683097839},{"id":"https://openalex.org/C2779844322","wikidata":"https://www.wikidata.org/wiki/Q2919140","display_name":"Tilt (camera)","level":2,"score":0.7288461327552795},{"id":"https://openalex.org/C136009344","wikidata":"https://www.wikidata.org/wiki/Q336201","display_name":"Confocal","level":2,"score":0.6932064890861511},{"id":"https://openalex.org/C109821595","wikidata":"https://www.wikidata.org/wiki/Q177895","display_name":"Astigmatism","level":2,"score":0.6731383800506592},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.5764523148536682},{"id":"https://openalex.org/C17825722","wikidata":"https://www.wikidata.org/wiki/Q17285","display_name":"Plane (geometry)","level":2,"score":0.48166000843048096},{"id":"https://openalex.org/C121483023","wikidata":"https://www.wikidata.org/wiki/Q7298343","display_name":"Ray tracing (physics)","level":2,"score":0.4796886146068573},{"id":"https://openalex.org/C3756478","wikidata":"https://www.wikidata.org/wiki/Q3410566","display_name":"Optical axis","level":3,"score":0.4731534421443939},{"id":"https://openalex.org/C120515352","wikidata":"https://www.wikidata.org/wiki/Q2564580","display_name":"Image plane","level":3,"score":0.4729470908641815},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.2352394461631775},{"id":"https://openalex.org/C15336307","wikidata":"https://www.wikidata.org/wiki/Q1766051","display_name":"Lens (geology)","level":2,"score":0.20941537618637085},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.11764386296272278},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.11403441429138184},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.11356088519096375},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.07994946837425232}],"mesh":[{"descriptor_ui":"D000465","descriptor_name":"Algorithms","qualifier_ui":null,"qualifier_name":null,"is_major_topic":true},{"descriptor_ui":"D000465","descriptor_name":"Algorithms","qualifier_ui":null,"qualifier_name":null,"is_major_topic":true},{"descriptor_ui":"D000465","descriptor_name":"Algorithms","qualifier_ui":null,"qualifier_name":null,"is_major_topic":true},{"descriptor_ui":"D003198","descriptor_name":"Computer Simulation","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D003198","descriptor_name":"Computer Simulation","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D003198","descriptor_name":"Computer Simulation","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D007089","descriptor_name":"Image Enhancement","qualifier_ui":"Q000379","qualifier_name":"methods","is_major_topic":false},{"descriptor_ui":"D007089","descriptor_name":"Image Enhancement","qualifier_ui":"Q000379","qualifier_name":"methods","is_major_topic":false},{"descriptor_ui":"D007089","descriptor_name":"Image Enhancement","qualifier_ui":"Q000379","qualifier_name":"methods","is_major_topic":false},{"descriptor_ui":"D007090","descriptor_name":"Image Interpretation, Computer-Assisted","qualifier_ui":"Q000379","qualifier_name":"methods","is_major_topic":false},{"descriptor_ui":"D007090","descriptor_name":"Image Interpretation, Computer-Assisted","qualifier_ui":"Q000379","qualifier_name":"methods","is_major_topic":false},{"descriptor_ui":"D007090","descriptor_name":"Image Interpretation, Computer-Assisted","qualifier_ui":"Q000379","qualifier_name":"methods","is_major_topic":false},{"descriptor_ui":"D012680","descriptor_name":"Sensitivity and Specificity","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D012680","descriptor_name":"Sensitivity and Specificity","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D012680","descriptor_name":"Sensitivity and Specificity","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D015203","descriptor_name":"Reproducibility of Results","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D015203","descriptor_name":"Reproducibility of Results","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D015203","descriptor_name":"Reproducibility of Results","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D016014","descriptor_name":"Linear Models","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D016014","descriptor_name":"Linear Models","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D016014","descriptor_name":"Linear Models","qualifier_ui":null,"qualifier_name":null,"is_major_topic":false},{"descriptor_ui":"D016477","descriptor_name":"Artifacts","qualifier_ui":null,"qualifier_name":null,"is_major_topic":true},{"descriptor_ui":"D016477","descriptor_name":"Artifacts","qualifier_ui":null,"qualifier_name":null,"is_major_topic":true},{"descriptor_ui":"D016477","descriptor_name":"Artifacts","qualifier_ui":null,"qualifier_name":null,"is_major_topic":true},{"descriptor_ui":"D018613","descriptor_name":"Microscopy, Confocal","qualifier_ui":"Q000379","qualifier_name":"methods","is_major_topic":false},{"descriptor_ui":"D018613","descriptor_name":"Microscopy, Confocal","qualifier_ui":"Q000379","qualifier_name":"methods","is_major_topic":false},{"descriptor_ui":"D018613","descriptor_name":"Microscopy, Confocal","qualifier_ui":"Q000379","qualifier_name":"methods","is_major_topic":false}],"locations_count":2,"locations":[{"id":"doi:10.1364/ao.45.000484","doi":"https://doi.org/10.1364/ao.45.000484","is_oa":false,"landing_page_url":"https://doi.org/10.1364/ao.45.000484","pdf_url":null,"source":{"id":"https://openalex.org/S4210211917","display_name":"Applied Optics","issn_l":"0003-6935","issn":["0003-6935","1539-4522","1540-8981","1559-128X","2155-3165"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["jufo-1","medline","norway-1"],"host_organization":"https://openalex.org/P4310315679","host_organization_name":"Optica Publishing Group","host_organization_lineage":["https://openalex.org/P4310315679"],"host_organization_lineage_names":["Optica Publishing Group"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Optics","raw_type":"journal-article"},{"id":"pmid:16463732","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/16463732","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied optics","raw_type":"Evaluation Study"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[{"display_name":"Sustainable cities and communities","score":0.5799999833106995,"id":"https://metadata.un.org/sdg/11"}],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":8,"referenced_works":["https://openalex.org/W1617634218","https://openalex.org/W1629946838","https://openalex.org/W1666153062","https://openalex.org/W1965060656","https://openalex.org/W2015648109","https://openalex.org/W2063659133","https://openalex.org/W2104212315","https://openalex.org/W2160053372"],"related_works":["https://openalex.org/W2128444254","https://openalex.org/W2096739869","https://openalex.org/W2063542313","https://openalex.org/W2012166250","https://openalex.org/W2076885125","https://openalex.org/W2182613557","https://openalex.org/W2987839719","https://openalex.org/W2062882702","https://openalex.org/W2363842595","https://openalex.org/W2912105327"],"abstract_inverted_index":{"Linear":[0],"astigmatism":[1,31],"of":[2,38,51,66],"a":[3,18],"confocal":[4,44],"off-axis":[5,45],"reflective":[6],"imaging":[7,23],"system":[8,24],"when":[9],"the":[10,22,39,52],"object":[11],"plane":[12,54],"is":[13,25,55,61],"tilted":[14],"and":[15],"located":[16],"at":[17],"finite":[19],"distance":[20],"from":[21],"derived.":[26,57],"We":[27],"show":[28],"that":[29],"linear":[30],"can":[32],"be":[33],"eliminated":[34],"by":[35,63],"proper":[36],"configuration":[37],"parent":[40],"mirror":[41],"axes":[42],"in":[43],"two-mirror":[46],"systems.":[47],"The":[48,58],"tilt":[49],"angle":[50],"image":[53],"also":[56],"developed":[59],"theory":[60],"verified":[62],"ray-tracing":[64],"analysis":[65],"an":[67],"example":[68],"system.":[69]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":1},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":4},{"year":2019,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2025-10-10T00:00:00"}