{"id":"https://openalex.org/W1970038271","doi":"https://doi.org/10.1117/12.2046144","title":"Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology","display_name":"Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology","publication_year":2014,"publication_date":"2014-04-02","ids":{"openalex":"https://openalex.org/W1970038271","doi":"https://doi.org/10.1117/12.2046144","mag":"1970038271"},"language":"en","primary_location":{"id":"doi:10.1117/12.2046144","doi":"https://doi.org/10.1117/12.2046144","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2046144","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5036150229","display_name":"Kiyoshi Takamasu","orcid":"https://orcid.org/0000-0001-5957-3434","observed_orcids":["https://orcid.org/0000-0001-5957-3434"]},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kiyoshi Takamasu","raw_affiliation_strings":["The Univ. of Tokyo (Japan)","The University of Tokyo, JAPAN"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Univ. of Tokyo (Japan)","institution_ids":["https://openalex.org/I74801974"]},{"raw_affiliation_string":"The University of Tokyo, JAPAN","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028917496","display_name":"Haruki Okitou","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Haruki Okitou","raw_affiliation_strings":["The Univ. of Tokyo (Japan)","The University of Tokyo, JAPAN"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Univ. of Tokyo (Japan)","institution_ids":["https://openalex.org/I74801974"]},{"raw_affiliation_string":"The University of Tokyo, JAPAN","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050010293","display_name":"Satoru Takahashi","orcid":"https://orcid.org/0000-0002-6555-9409","observed_orcids":["https://orcid.org/0000-0002-6555-9409"]},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Satoru Takahashi","raw_affiliation_strings":["The Univ. of Tokyo (Japan)","The University of Tokyo, JAPAN"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Univ. of Tokyo (Japan)","institution_ids":["https://openalex.org/I74801974"]},{"raw_affiliation_string":"The University of Tokyo, JAPAN","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109319874","display_name":"Osamu Inoue","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4387156034","display_name":"Hitachi High-Tech (Japan)","ror":"https://ror.org/033a1rv92","country_code":"JP","type":"company","lineage":["https://openalex.org/I4387156034","https://openalex.org/I65143321"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Osamu Inoue","raw_affiliation_strings":["Hitachi High-Technologies Corp. (Japan)","Hitachi High-Technologies Corporation, Japan#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hitachi High-Technologies Corp. (Japan)","institution_ids":["https://openalex.org/I4387156034","https://openalex.org/I65143321"]},{"raw_affiliation_string":"Hitachi High-Technologies Corporation, Japan#TAB#","institution_ids":["https://openalex.org/I4387156034","https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111765162","display_name":"Hiroki Kawada","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4387156034","display_name":"Hitachi High-Tech (Japan)","ror":"https://ror.org/033a1rv92","country_code":"JP","type":"company","lineage":["https://openalex.org/I4387156034","https://openalex.org/I65143321"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroki Kawada","raw_affiliation_strings":["Hitachi High-Technologies Corp. (Japan)","Hitachi High-Technologies Corporation, Japan#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hitachi High-Technologies Corp. (Japan)","institution_ids":["https://openalex.org/I4387156034","https://openalex.org/I65143321"]},{"raw_affiliation_string":"Hitachi High-Technologies Corporation, Japan#TAB#","institution_ids":["https://openalex.org/I4387156034","https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111579144","display_name":"Vimal Kumar Kamineni","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I35662394","display_name":"GlobalFoundries (United States)","ror":"https://ror.org/02h0ps145","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Vimal Kamineni","raw_affiliation_strings":["GLOBALFOUNDRIES Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"GLOBALFOUNDRIES Inc. (United States)","institution_ids":["https://openalex.org/I35662394"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110598398","display_name":"Abhijeet Paul","orcid":"https://orcid.org/0000-0002-9965-0075","observed_orcids":["https://orcid.org/0000-0002-9965-0075"]},"institutions":[{"id":"https://openalex.org/I35662394","display_name":"GlobalFoundries (United States)","ror":"https://ror.org/02h0ps145","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Abhijeet Paul","raw_affiliation_strings":["GLOBALFOUNDRIES Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"GLOBALFOUNDRIES Inc. (United States)","institution_ids":["https://openalex.org/I35662394"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110796448","display_name":"Abner F. Bello","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I35662394","display_name":"GlobalFoundries (United States)","ror":"https://ror.org/02h0ps145","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. F. Bello","raw_affiliation_strings":["GLOBALFOUNDRIES Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"GLOBALFOUNDRIES Inc. (United States)","institution_ids":["https://openalex.org/I35662394"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":3.2116,"has_fulltext":false,"cited_by_count":13,"citation_normalized_percentile":{"value":0.92329133,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"9050","issue":null,"first_page":"90501K","last_page":"90501K"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9286999702453613,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9286999702453613,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.03840000182390213,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11890","display_name":"Scientific Measurement and Uncertainty Evaluation","score":0.00860000029206276,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/sidewall-roughness","display_name":"sidewall roughness","score":0.9909999966621399},{"id":"https://openalex.org/keywords/finfet","display_name":"FinFET","score":0.9330000281333923},{"id":"https://openalex.org/keywords/tem-imaging","display_name":"TEM imaging","score":0.5799999833106995},{"id":"https://openalex.org/keywords/linewidth-measurement","display_name":"linewidth measurement","score":0.7799999713897705},{"id":"https://openalex.org/keywords/critical-dimension","display_name":"critical dimension","score":0.4399999976158142},{"id":"https://openalex.org/keywords/focused-ion-beam-specimen-preparation","display_name":"focused ion beam sample preparation","score":0.6110000014305115}],"concepts":[{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.761320948600769},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.7503416538238525},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6998525261878967},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.658733606338501},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.6115272045135498},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.6077374815940857},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.48654094338417053},{"id":"https://openalex.org/C67649825","wikidata":"https://www.wikidata.org/wiki/Q196538","display_name":"Microscope","level":2,"score":0.46666449308395386},{"id":"https://openalex.org/C198352243","wikidata":"https://www.wikidata.org/wiki/Q37105","display_name":"Line (geometry)","level":2,"score":0.4349250793457031},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3676586449146271},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.16312021017074585},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.15763211250305176},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.10091269016265869},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.06310847401618958},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.0},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2046144","doi":"https://doi.org/10.1117/12.2046144","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2046144","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1972032359","https://openalex.org/W1980435982","https://openalex.org/W2003628123","https://openalex.org/W2006099103","https://openalex.org/W2010438463","https://openalex.org/W2028069315","https://openalex.org/W2049946180","https://openalex.org/W2060236684","https://openalex.org/W2090025839","https://openalex.org/W2092653780","https://openalex.org/W2117385884","https://openalex.org/W2312344476","https://openalex.org/W6652885790"],"related_works":["https://openalex.org/W2030784546","https://openalex.org/W2088357583","https://openalex.org/W2076266736","https://openalex.org/W2003088419","https://openalex.org/W2607302873","https://openalex.org/W2006099103","https://openalex.org/W2090025839","https://openalex.org/W2324725784","https://openalex.org/W2081117295","https://openalex.org/W2063972243"],"abstract_inverted_index":{"The":[0,128],"novel":[1],"method":[2,71,197],"of":[3,34,53,55,77,84,92,103,119,131,140,175,191],"sub-nanometer":[4],"uncertainty":[5],"for":[6,61,183],"the":[7,12,32,44,51,69,73,88,116,120,137,141,146,149,164,172,188,195],"line":[8,13,28,35,57,81,173,189],"width":[9,29,190],"measurement":[10,15,30,37,76,83],"and":[11,31,58,80,95,126,169,198],"profile":[14,36,54,82,174],"using":[16,180],"STEM":[17,125,167],"(Scanning":[18],"Transmission":[19],"Electron":[20],"Microscope)":[21],"images":[22,118,182],"is":[23,134,152,178],"proposed":[24,45,70,89,196],"to":[25,72],"calibrate":[26],"CD-SEM":[27,202],"standardization":[33],"as":[38,100],"reference":[39,62,184],"metrology.":[40,63,185],"In":[41,64],"accordance":[42],"with":[43],"method,":[46,90],"we":[47,67,162],"already":[48],"have":[49],"established":[50],"methodology":[52],"Si":[56],"photoresist":[59,78,93,132],"feature":[60,94,97],"this":[65],"article,":[66],"applied":[68],"sidewall":[74,129,150],"roughness":[75,130,151],"features":[79,133,177],"finFET":[85,96,176],"features.":[86],"Using":[87],"specimens":[91,102,121],"are":[98,122],"sliced":[99],"thin":[101],"100":[104],"nm":[105],"thickness":[106],"by":[107,124,136,155,166,194,201],"FIB":[108],"(Focused":[109],"Ion":[110],"Beam)":[111],"micro":[112],"sampling":[113],"system.":[114],"Then":[115],"cross-sectional":[117],"obtained":[123],"TEM.":[127],"estimated":[135],"maximum":[138],"slope":[139],"image":[142,168],"intensity":[143],"graph":[144],"at":[145],"edge.":[147],"Then,":[148],"also":[153],"measured":[154,193],"CD-AFM":[156],"(Critical":[157],"Dimension":[158],"Atomic":[159],"Force":[160],"Microscope);":[161],"compared":[163,187],"results":[165],"CD-AFM.":[170],"Moreover,":[171],"defined":[179],"TEM":[181],"We":[186],"fin":[192],"CD":[199],"value":[200],"measurement.":[203]},"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":2},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":4},{"year":2015,"cited_by_count":2},{"year":2014,"cited_by_count":1}],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2016-06-24T00:00:00"}