{"id":"https://openalex.org/W1968704368","doi":"https://doi.org/10.1109/group4.2007.4347744","title":"High Speed Selective-Area-Epitaxial Ge-on-SOI PIN Photo-detector Using Thin Low Temperature Si0.8Ge0.2 Buffer by Ultra-High-Vacuum Chemical Vapor Deposition","display_name":"High Speed Selective-Area-Epitaxial Ge-on-SOI PIN Photo-detector Using Thin Low Temperature Si0.8Ge0.2 Buffer by Ultra-High-Vacuum Chemical Vapor Deposition","publication_year":2007,"publication_date":"2007-09-01","ids":{"openalex":"https://openalex.org/W1968704368","doi":"https://doi.org/10.1109/group4.2007.4347744","mag":"1968704368"},"language":"en","primary_location":{"id":"doi:10.1109/group4.2007.4347744","doi":"https://doi.org/10.1109/group4.2007.4347744","is_oa":false,"landing_page_url":"https://doi.org/10.1109/group4.2007.4347744","pdf_url":null,"source":{"id":"https://openalex.org/S7407086434","display_name":"IEEE International Conference on Group IV Photonics (GFP)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2007 4th IEEE International Conference on Group IV Photonics","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5035041889","display_name":"Loh Ter-Hoe","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Loh Ter-Hoe","raw_affiliation_strings":["Institute of Microelectronics, Singapore","Inst. of Microelectron., Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Singapore","institution_ids":["https://openalex.org/I4210090209"]},{"raw_affiliation_string":"Inst. of Microelectron., Singapore","institution_ids":["https://openalex.org/I4210090209"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100785797","display_name":"Jian Wang","orcid":"https://orcid.org/0000-0002-7945-0826","observed_orcids":["https://orcid.org/0000-0002-7945-0826"]},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Wang Jian","raw_affiliation_strings":["Institute of Microelectronics, Singapore","Inst. of Microelectron., Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Singapore","institution_ids":["https://openalex.org/I4210090209"]},{"raw_affiliation_string":"Inst. of Microelectron., Singapore","institution_ids":["https://openalex.org/I4210090209"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028127088","display_name":"Nguyen Hoai-Son","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Nguyen Hoai-Son","raw_affiliation_strings":["Institute of Microelectronics, Singapore","Inst. of Microelectron., Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Singapore","institution_ids":["https://openalex.org/I4210090209"]},{"raw_affiliation_string":"Inst. of Microelectron., Singapore","institution_ids":["https://openalex.org/I4210090209"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014907778","display_name":"Murthy Ramana","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Murthy Ramana","raw_affiliation_strings":["Institute of Microelectronics, Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Singapore","institution_ids":["https://openalex.org/I4210090209"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102144627","display_name":"Yu Mingbin","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Yu Ming-Bin","raw_affiliation_strings":["Institute of Microelectronics, Singapore","Inst. of Microelectron., Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Singapore","institution_ids":["https://openalex.org/I4210090209"]},{"raw_affiliation_string":"Inst. of Microelectron., Singapore","institution_ids":["https://openalex.org/I4210090209"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082847977","display_name":"Loh Wei-Yip","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Loh Wei-Yip","raw_affiliation_strings":["Institute of Microelectronics, Singapore","Inst. of Microelectron., Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Singapore","institution_ids":["https://openalex.org/I4210090209"]},{"raw_affiliation_string":"Inst. of Microelectron., Singapore","institution_ids":["https://openalex.org/I4210090209"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109803012","display_name":"Guo\u2010Qiang Lo","orcid":"https://orcid.org/0000-0001-7783-3180","observed_orcids":["https://orcid.org/0000-0001-7783-3180"]},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Lo Guo-Qiang","raw_affiliation_strings":["Institute of Microelectronics, Singapore","Inst. of Microelectron., Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Singapore","institution_ids":["https://openalex.org/I4210090209"]},{"raw_affiliation_string":"Inst. of Microelectron., Singapore","institution_ids":["https://openalex.org/I4210090209"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111974571","display_name":"Narayanan Balasubramanian","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Narayanan Balasubramanian","raw_affiliation_strings":["Institute of Microelectronics, Singapore","Inst. of Microelectron., Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Singapore","institution_ids":["https://openalex.org/I4210090209"]},{"raw_affiliation_string":"Inst. of Microelectron., Singapore","institution_ids":["https://openalex.org/I4210090209"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5112133987","display_name":"Kwong Dim-Lee","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210090209","display_name":"Institute of Microelectronics","ror":"https://ror.org/009rw8n36","country_code":"SG","type":"facility","lineage":["https://openalex.org/I115228651","https://openalex.org/I4210090209","https://openalex.org/I91275662"]}],"countries":["SG"],"is_corresponding":false,"raw_author_name":"Kwong Dim-Lee","raw_affiliation_strings":["Institute of Microelectronics, Singapore","Inst. of Microelectron., Singapore"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Singapore","institution_ids":["https://openalex.org/I4210090209"]},{"raw_affiliation_string":"Inst. of Microelectron., Singapore","institution_ids":["https://openalex.org/I4210090209"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210090209"],"apc_list":null,"apc_paid":null,"fwci":0.504,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.51081285,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"18","issue":null,"first_page":"1","last_page":"3"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.7699999809265137,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.7699999809265137,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.07460000365972519,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11637","display_name":"Advanced Semiconductor Detectors and Materials","score":0.0471000000834465,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/germanium-photodetectors","display_name":"germanium photodetectors","score":0.800000011920929},{"id":"https://openalex.org/keywords/pin-photodiode","display_name":"PIN photodiode","score":0.8669999837875366},{"id":"https://openalex.org/keywords/selective-epitaxial-growth","display_name":"selective epitaxial growth","score":0.902999997138977},{"id":"https://openalex.org/keywords/ultrahigh-vacuum-chemical-vapor-deposition","display_name":"ultrahigh vacuum chemical vapor deposition","score":0.8610000014305115},{"id":"https://openalex.org/keywords/1550-nm","display_name":"1550 nm","score":0.7170000076293945},{"id":"https://openalex.org/keywords/850-nm","display_name":"850 nm","score":0.9010000228881836},{"id":"https://openalex.org/keywords/external-quantum-efficiency","display_name":"external quantum efficiency","score":0.8510000109672546},{"id":"https://openalex.org/keywords/dark-current-density","display_name":"dark current density","score":0.9169999957084656},{"id":"https://openalex.org/keywords/high-speed-photodetection","display_name":"high-speed photodetection","score":0.6700000166893005}],"concepts":[{"id":"https://openalex.org/C751236","wikidata":"https://www.wikidata.org/wiki/Q175943","display_name":"Photodiode","level":2,"score":0.7066154479980469},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.5735244750976562},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.5665848851203918},{"id":"https://openalex.org/C205507967","wikidata":"https://www.wikidata.org/wiki/Q900625","display_name":"Quantum efficiency","level":2,"score":0.5275585055351257},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4993102550506592},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.4211958348751068},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.38479477167129517},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.365028440952301},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1993412971496582},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17541995644569397},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0856473445892334},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/group4.2007.4347744","doi":"https://doi.org/10.1109/group4.2007.4347744","is_oa":false,"landing_page_url":"https://doi.org/10.1109/group4.2007.4347744","pdf_url":null,"source":{"id":"https://openalex.org/S7407086434","display_name":"IEEE International Conference on Group IV Photonics (GFP)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2007 4th IEEE International Conference on Group IV Photonics","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":2,"referenced_works":["https://openalex.org/W2000999566","https://openalex.org/W2170115373"],"related_works":["https://openalex.org/W2084696276","https://openalex.org/W2149972521","https://openalex.org/W6997525661","https://openalex.org/W2172076065","https://openalex.org/W2135074260","https://openalex.org/W2022828106","https://openalex.org/W2137013897","https://openalex.org/W2104423576","https://openalex.org/W1999375353","https://openalex.org/W2897308235"],"abstract_inverted_index":{"Ge":[0],"SiGe/SOI":[1],"PIN":[2],"photodiodes":[3],"with":[4],"15":[5],"-":[6,18],"17":[7],"GHz":[8],"bandwidth":[9],"at":[10,21],"1550":[11],"nm,":[12,23],"external":[13],"quantum":[14],"efficiency":[15],"of":[16,29],"20%":[17],"27%":[19],"6":[20],"850":[22],"and":[24,36],"bulk":[25],"dark":[26],"current":[27],"density":[28],"1.5~2":[30],"mA/cm2,":[31],"using":[32],"low":[33],"temperature":[34],"Si0.8Ge0.2buffer":[35],"without":[37],"cyclic":[38],"annealing":[39],"were":[40],"demonstrated.":[41]},"counts_by_year":[],"updated_date":"2026-10-16T09:59:22.235173","created_date":"2016-06-24T00:00:00"}