{"id":"https://openalex.org/W1968474173","doi":"https://doi.org/10.1117/12.829747","title":"Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics","display_name":"Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics","publication_year":2009,"publication_date":"2009-09-29","ids":{"openalex":"https://openalex.org/W1968474173","doi":"https://doi.org/10.1117/12.829747","mag":"1968474173"},"language":"en","primary_location":{"id":"doi:10.1117/12.829747","doi":"https://doi.org/10.1117/12.829747","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.829747","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5034411429","display_name":"Nobutaka Kikuiri","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Nobutaka Kikuiri","raw_affiliation_strings":["Advanced Mask Inspection Technology, Inc. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Advanced Mask Inspection Technology, Inc. (Japan)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017672700","display_name":"Masatoshi Hirono","orcid":"https://orcid.org/0000-0003-0367-0467","observed_orcids":["https://orcid.org/0000-0003-0367-0467"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Masatoshi Hirono","raw_affiliation_strings":["Advanced Mask Inspection Technology, Inc. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Advanced Mask Inspection Technology, Inc. (Japan)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110817410","display_name":"Ryoichi Hirano","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Ryoichi Hirano","raw_affiliation_strings":["Advanced Mask Inspection Technology, Inc. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Advanced Mask Inspection Technology, Inc. (Japan)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100840520","display_name":"Tsuyoshi Amano","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405276234","display_name":"Semiconductor Leading Edge Technologies, Inc (Japan)","ror":"https://ror.org/0523jgb37","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405276234"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tsuyoshi Amano","raw_affiliation_strings":["Semiconductor Leading Edge Technologies, Inc. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Leading Edge Technologies, Inc. (Japan)","institution_ids":["https://openalex.org/I4405276234"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5080200487","display_name":"Osamu Suga","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405276234","display_name":"Semiconductor Leading Edge Technologies, Inc (Japan)","ror":"https://ror.org/0523jgb37","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405276234"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Osamu Suga","raw_affiliation_strings":["Semiconductor Leading Edge Technologies, Inc. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Leading Edge Technologies, Inc. (Japan)","institution_ids":["https://openalex.org/I4405276234"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001423950","display_name":"Hiroyuki Shigemura","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405276234","display_name":"Semiconductor Leading Edge Technologies, Inc (Japan)","ror":"https://ror.org/0523jgb37","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405276234"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hiroyuki Shigemura","raw_affiliation_strings":["Semiconductor Leading Edge Technologies, Inc. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Leading Edge Technologies, Inc. (Japan)","institution_ids":["https://openalex.org/I4405276234"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061470467","display_name":"H Hashimoto","orcid":"https://orcid.org/0000-0002-5694-5236","observed_orcids":["https://orcid.org/0000-0002-5694-5236"]},"institutions":[{"id":"https://openalex.org/I4405263817","display_name":"Nuflare Technology, Inc. (Japan)","ror":"https://ror.org/0053wg403","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405263817"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Hideaki Hashimoto","raw_affiliation_strings":["Nuflare Technology, Inc. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nuflare Technology, Inc. (Japan)","institution_ids":["https://openalex.org/I4405263817"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062297684","display_name":"Kenichi Takahara","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405263817","display_name":"Nuflare Technology, Inc. (Japan)","ror":"https://ror.org/0053wg403","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405263817"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kenichi Takahara","raw_affiliation_strings":["Nuflare Technology, Inc. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nuflare Technology, Inc. (Japan)","institution_ids":["https://openalex.org/I4405263817"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5020965293","display_name":"Kinya Usuda","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405263817","display_name":"Nuflare Technology, Inc. (Japan)","ror":"https://ror.org/0053wg403","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405263817"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Kinya Usuda","raw_affiliation_strings":["Nuflare Technology, Inc. (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Nuflare Technology, Inc. (Japan)","institution_ids":["https://openalex.org/I4405263817"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.937,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.66249871,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":96,"max":97},"biblio":{"volume":"7488","issue":null,"first_page":"74882O","last_page":"74882O"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.000699999975040555,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-mask-inspection","display_name":"EUV mask inspection","score":0.8830000162124634},{"id":"https://openalex.org/keywords/super-resolution-imaging","display_name":"super-resolution imaging","score":0.7450000047683716},{"id":"https://openalex.org/keywords/polarized-illumination","display_name":"polarized illumination","score":0.9020000100135803},{"id":"https://openalex.org/keywords/image-contrast-enhancement","display_name":"image contrast enhancement","score":0.9800000190734863}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9294615983963013},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.7945305705070496},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.5837297439575195},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5187075734138489},{"id":"https://openalex.org/C2982854487","wikidata":"https://www.wikidata.org/wiki/Q9128","display_name":"Light source","level":2,"score":0.49125736951828003},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.4554230570793152},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.40405726432800293},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.36773669719696045},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.30899542570114136}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.829747","doi":"https://doi.org/10.1117/12.829747","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.829747","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W1970820760","https://openalex.org/W1986403105","https://openalex.org/W1990609039","https://openalex.org/W2011081394","https://openalex.org/W2038906616","https://openalex.org/W2042355536","https://openalex.org/W2094932410"],"related_works":["https://openalex.org/W1990609039","https://openalex.org/W2087157343","https://openalex.org/W2026405817","https://openalex.org/W1974233575","https://openalex.org/W2020719849","https://openalex.org/W1981741746","https://openalex.org/W2050234834","https://openalex.org/W2075038564","https://openalex.org/W4416031327","https://openalex.org/W4401877517"],"abstract_inverted_index":{"A":[0],"novel":[1,84],"EUV":[2,38,71],"mask":[3,39,47,60],"inspection":[4,26,40],"tool":[5,17,27],"with":[6,41,62,82],"199nm":[7],"laser":[8],"source":[9],"and":[10,32,58,76,100],"super-resolution":[11],"technique":[12,87],"has":[13],"been":[14],"developed.":[15],"This":[16],"is":[18,23,88],"based":[19],"on":[20],"NPI-5000PLUS,":[21],"which":[22],"a":[24,43],"photo-mask":[25],"for":[28,46,73],"hp2X":[29,74],"nm":[30,75],"node":[31],"beyond.":[33],"In":[34],"order":[35],"to":[36,54,69],"implement":[37],"only":[42],"short":[44],"time":[45],"set-up,":[48],"reflected":[49],"illumination":[50,64,86],"type":[51],"alignment":[52,56],"optics":[53,81],"guide":[55],"mark":[57],"adjust":[59],"coordinate":[61],"visible":[63],"light":[65],"are":[66],"equipped.":[67],"Moreover,":[68],"inspect":[70],"masks":[72],"beyond,":[77],"the":[78,83],"image":[79],"detection":[80],"polarized":[85],"incorporated":[89],"in":[90],"this":[91],"tool.":[92],"Image":[93],"contrast":[94],"enhancement":[95],"was":[96],"confirmed":[97],"by":[98],"experiments":[99],"simulations.":[101]},"counts_by_year":[{"year":2017,"cited_by_count":3}],"updated_date":"2026-09-22T17:25:34.749102","created_date":"2016-06-24T00:00:00"}