{"id":"https://openalex.org/W1968297032","doi":"https://doi.org/10.1117/12.601517","title":"Protection of collector optics in an LPP based EUV source","display_name":"Protection of collector optics in an LPP based EUV source","publication_year":2005,"publication_date":"2005-05-06","ids":{"openalex":"https://openalex.org/W1968297032","doi":"https://doi.org/10.1117/12.601517","mag":"1968297032"},"language":"en","primary_location":{"id":"doi:10.1117/12.601517","doi":"https://doi.org/10.1117/12.601517","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.601517","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5088004029","display_name":"Curtis L. Rettig","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"C. L. Rettig","raw_affiliation_strings":["Cymer, Inc. (United States)","Cymer, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cymer, Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"Cymer, Inc. (USA)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113540083","display_name":"Oleh V. Khodykin","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"O. V. Khodykin","raw_affiliation_strings":["Cymer, Inc. (United States)","Cymer, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cymer, Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"Cymer, Inc. (USA)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111518463","display_name":"J.R. Hoffman","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"J. R. Hoffman","raw_affiliation_strings":["Cymer, Inc. (United States)","Cymer, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cymer, Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"Cymer, Inc. (USA)","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"W. F. Marx","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"W. F. Marx","raw_affiliation_strings":["Cymer, Inc. (United States)","Cymer, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cymer, Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"Cymer, Inc. (USA)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053470497","display_name":"Norbert R. Bowering","orcid":"https://orcid.org/0000-0003-0035-2447","observed_orcids":["https://orcid.org/0000-0003-0035-2447"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"N. R. Bowering","raw_affiliation_strings":["Cymer, Inc. (United States)","Cymer, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cymer, Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"Cymer, Inc. (USA)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108902309","display_name":"Erwin Vargas","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"E. Vargas","raw_affiliation_strings":["Cymer, Inc. (United States)","Cymer, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cymer, Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"Cymer, Inc. (USA)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5087746675","display_name":"Alex I. Ershov","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"A. I. Ershov","raw_affiliation_strings":["Cymer, Inc. (United States)","Cymer, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cymer, Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"Cymer, Inc. (USA)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088410429","display_name":"Igor V. Fomenkov","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"I. V. Fomenkov","raw_affiliation_strings":["Cymer, Inc. (United States)","Cymer, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cymer, Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"Cymer, Inc. (USA)","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5027736647","display_name":"William N. Partlo","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"W. N. Partlo","raw_affiliation_strings":["Cymer, Inc. (United States)","Cymer, Inc. (USA)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Cymer, Inc. (United States)","institution_ids":[]},{"raw_affiliation_string":"Cymer, Inc. (USA)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":2.8142,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.898874,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"5751","issue":null,"first_page":"910","last_page":"910"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.6743000149726868,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.6743000149726868,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.16689999401569366,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.026499999687075615,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/laser-produced-plasma","display_name":"laser-produced plasma","score":0.8379999995231628},{"id":"https://openalex.org/keywords/euv-source","display_name":"EUV source","score":0.8700000047683716},{"id":"https://openalex.org/keywords/multilayer-mirrors","display_name":"multilayer mirrors","score":0.8809999823570251},{"id":"https://openalex.org/keywords/optical-contamination","display_name":"optical contamination","score":0.5809999704360962},{"id":"https://openalex.org/keywords/energetic-ion-beams","display_name":"energetic ion beams","score":0.609000027179718},{"id":"https://openalex.org/keywords/euv-reflectivity","display_name":"EUV reflectivity","score":0.8619999885559082},{"id":"https://openalex.org/keywords/in-situ-cleaning","display_name":"in situ cleaning","score":0.6589999794960022},{"id":"https://openalex.org/keywords/gas-targets","display_name":"gas targets","score":0.6470000147819519},{"id":"https://openalex.org/keywords/xenon","display_name":"xenon","score":0.49300000071525574},{"id":"https://openalex.org/keywords/sns","display_name":"SnS","score":0.9769999980926514},{"id":"https://openalex.org/keywords/lithium","display_name":"lithium","score":0.9890000224113464}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.946171760559082},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.7052993774414062},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.6573623418807983},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6206925511360168},{"id":"https://openalex.org/C68709404","wikidata":"https://www.wikidata.org/wiki/Q1134475","display_name":"Flux (metallurgy)","level":2,"score":0.5593346953392029},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.5574449300765991},{"id":"https://openalex.org/C112570922","wikidata":"https://www.wikidata.org/wiki/Q60528603","display_name":"Contamination","level":2,"score":0.5572599768638611},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.5283684730529785},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.5074986815452576},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4198876619338989},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.394263356924057},{"id":"https://openalex.org/C39432304","wikidata":"https://www.wikidata.org/wiki/Q188847","display_name":"Environmental science","level":0,"score":0.3434475064277649},{"id":"https://openalex.org/C116915560","wikidata":"https://www.wikidata.org/wiki/Q83504","display_name":"Nuclear engineering","level":1,"score":0.3420577645301819},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.16647878289222717},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.162573903799057},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.1220737099647522},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0923798680305481},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.08164450526237488},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.07844647765159607},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C18903297","wikidata":"https://www.wikidata.org/wiki/Q7150","display_name":"Ecology","level":1,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.601517","doi":"https://doi.org/10.1117/12.601517","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.601517","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4250468493","https://openalex.org/W2093492677","https://openalex.org/W1967468904","https://openalex.org/W2065201800","https://openalex.org/W2015044141","https://openalex.org/W2102215969","https://openalex.org/W2074167235","https://openalex.org/W2024776543","https://openalex.org/W2034912832","https://openalex.org/W2010384769"],"abstract_inverted_index":{"In":[0,143],"a":[1,18],"laser":[2],"produced":[3],"plasma":[4,29],"(LPP)":[5],"EUV":[6,119],"source":[7],"the":[8,28,46,54,100,164],"multilayer":[9],"mirror":[10,101],"(MLM)":[11],"collector":[12],"optic":[13],"will":[14,147],"be":[15,62],"exposed":[16],"to":[17,82,107,126],"flux":[19,48],"of":[20,53,99,104,121,130,160],"energetic":[21,108],"ions":[22,127],"and":[23,49,66,76,91,111,128,155],"neutral":[24],"atoms":[25],"ejected":[26],"from":[27,35,163],"as":[30,32,71],"well":[31],"condensable":[33,67],"vapor":[34],"excess":[36],"target":[37,68,131],"material.":[38],"We":[39],"are":[40,115],"investigating":[41],"various":[42],"techniques":[43,157],"for":[44,50,158],"reducing":[45],"contamination":[47],"in-situ":[51],"removal":[52],"contamination.":[55],"The":[56,79],"protection":[57],"strategies":[58],"under":[59],"investigation":[60],"must":[61],"compatible":[63],"with":[64],"gaseous":[65],"materials":[69],"such":[70],"Xe,":[72],"Sn,":[73],"In,":[74],"Li,":[75],"other":[77],"elements.":[78],"goal":[80],"is":[81],"develop":[83,92],"MLM":[84,105,122,161],"structures":[85,123],"that":[86,96],"can":[87],"withstand":[88],"elevated":[89],"temperatures":[90],"protective":[93],"barrier":[94],"coatings":[95],"reduce":[97],"erosion":[98],"surface.":[102],"Results":[103],"exposure":[106,125],"ion":[109],"beams":[110],"thermal":[112],"atomic":[113],"sources":[114],"presented.":[116],"Changes":[117],"in":[118,152],"reflectivity":[120],"after":[124],"deposition":[129],"material":[132],"have":[133],"been":[134],"performed":[135],"on":[136],"samples":[137],"cleaned":[138],"by":[139],"these":[140,153],"developmental":[141],"processes.":[142],"this":[144],"paper,":[145],"we":[146],"summarize":[148],"our":[149],"initial":[150],"results":[151],"areas":[154],"present":[156],"mitigation":[159],"damage":[162],"source.":[165]},"counts_by_year":[{"year":2014,"cited_by_count":1}],"updated_date":"2026-10-12T09:40:04.860316","created_date":"2016-06-24T00:00:00"}