{"id":"https://openalex.org/W1967589360","doi":"https://doi.org/10.1117/12.472302","title":"Impact of EUV light scatter on CD control as a result of mask density changes","display_name":"Impact of EUV light scatter on CD control as a result of mask density changes","publication_year":2002,"publication_date":"2002-07-05","ids":{"openalex":"https://openalex.org/W1967589360","doi":"https://doi.org/10.1117/12.472302","mag":"1967589360"},"language":"en","primary_location":{"id":"doi:10.1117/12.472302","doi":"https://doi.org/10.1117/12.472302","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.472302","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5044576968","display_name":"Christof G. Krautschik","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127336","display_name":"Association of Super-Advanced Electronics","ror":"https://ror.org/0292ym357","country_code":"JP","type":"other","lineage":["https://openalex.org/I4210127336"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Christof G. Krautschik","raw_affiliation_strings":["Association of Super-Advanced Electronics Technologies (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Association of Super-Advanced Electronics Technologies (United States)","institution_ids":["https://openalex.org/I4210127336"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103458467","display_name":"Masaaki Ito","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127336","display_name":"Association of Super-Advanced Electronics","ror":"https://ror.org/0292ym357","country_code":"JP","type":"other","lineage":["https://openalex.org/I4210127336"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Masaaki Ito","raw_affiliation_strings":["Association of Super-Advanced Electronics Technologies (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Association of Super-Advanced Electronics Technologies (Japan)","institution_ids":["https://openalex.org/I4210127336"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113614445","display_name":"Iwao Nishiyama","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127336","display_name":"Association of Super-Advanced Electronics","ror":"https://ror.org/0292ym357","country_code":"JP","type":"other","lineage":["https://openalex.org/I4210127336"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Iwao Nishiyama","raw_affiliation_strings":["Association of Super-Advanced Electronics Technologies (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Association of Super-Advanced Electronics Technologies (Japan)","institution_ids":["https://openalex.org/I4210127336"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101944937","display_name":"Shinji Okazaki","orcid":"https://orcid.org/0000-0003-0840-7449","observed_orcids":["https://orcid.org/0000-0003-0840-7449"]},"institutions":[{"id":"https://openalex.org/I4210127336","display_name":"Association of Super-Advanced Electronics","ror":"https://ror.org/0292ym357","country_code":"JP","type":"other","lineage":["https://openalex.org/I4210127336"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shinji Okazaki","raw_affiliation_strings":["Association of Super-Advanced Electronics Technologies (Japan)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Association of Super-Advanced Electronics Technologies (Japan)","institution_ids":["https://openalex.org/I4210127336"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210127336"],"apc_list":null,"apc_paid":null,"fwci":3.7545,"has_fulltext":false,"cited_by_count":37,"citation_normalized_percentile":{"value":0.9413215,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":87,"max":98},"biblio":{"volume":"4688","issue":null,"first_page":"289","last_page":"289"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.0,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.9539999961853027},{"id":"https://openalex.org/keywords/flares","display_name":"flares","score":0.6140000224113464},{"id":"https://openalex.org/keywords/critical-dimension-control","display_name":"critical dimension control","score":0.9319999814033508},{"id":"https://openalex.org/keywords/power-spectral-density","display_name":"power spectral density","score":0.7590000033378601},{"id":"https://openalex.org/keywords/mirror-surface-roughness","display_name":"mirror surface roughness","score":0.9139999747276306}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9237504005432129},{"id":"https://openalex.org/C2779588948","wikidata":"https://www.wikidata.org/wiki/Q628261","display_name":"Flare","level":2,"score":0.8942313194274902},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6325739026069641},{"id":"https://openalex.org/C207789793","wikidata":"https://www.wikidata.org/wiki/Q3028070","display_name":"Critical dimension","level":2,"score":0.5564137101173401},{"id":"https://openalex.org/C146024833","wikidata":"https://www.wikidata.org/wiki/Q1385457","display_name":"Extreme ultraviolet","level":3,"score":0.49516692757606506},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.48802533745765686},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.4789224863052368},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.4551210403442383},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.4282815158367157},{"id":"https://openalex.org/C168110828","wikidata":"https://www.wikidata.org/wiki/Q1331626","display_name":"Spectral density","level":2,"score":0.41918468475341797},{"id":"https://openalex.org/C9652623","wikidata":"https://www.wikidata.org/wiki/Q190109","display_name":"Field (mathematics)","level":2,"score":0.41331204771995544},{"id":"https://openalex.org/C21881925","wikidata":"https://www.wikidata.org/wiki/Q3503313","display_name":"Power density","level":3,"score":0.41254982352256775},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3688827157020569},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3599609136581421},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.3374623656272888},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.2376614511013031},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.17864990234375},{"id":"https://openalex.org/C44870925","wikidata":"https://www.wikidata.org/wiki/Q37547","display_name":"Astrophysics","level":1,"score":0.169139564037323},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.07800042629241943},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.07491374015808105},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0},{"id":"https://openalex.org/C202444582","wikidata":"https://www.wikidata.org/wiki/Q837863","display_name":"Pure mathematics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.472302","doi":"https://doi.org/10.1117/12.472302","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.472302","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1567165128","https://openalex.org/W2089981706","https://openalex.org/W2036772738","https://openalex.org/W2010330857","https://openalex.org/W4307612879","https://openalex.org/W2073710856","https://openalex.org/W1964064768","https://openalex.org/W2060261235","https://openalex.org/W1995359612","https://openalex.org/W2001722267"],"abstract_inverted_index":{"The":[0],"Power":[1],"Spectral":[2],"Density":[3],"(PSD)":[4],"function":[5],"for":[6,25,50,58,63,89,103],"a":[7,70],"large-field":[8],"EUV":[9],"exposure":[10],"system":[11,68],"is":[12,38],"used":[13],"to":[14,47,78,121,138],"compute":[15],"the":[16,90,123],"impact":[17],"of":[18,93,125],"flare":[19,35,43,126],"on":[20,81,127],"critical":[21],"dimension":[22],"(CD)":[23],"control":[24,75,129],"masks":[26],"exhibiting":[27],"Cr":[28],"density":[29],"changes":[30],"that":[31,40,111],"result":[32],"in":[33,130],"cross-field":[34],"variation.":[36],"It":[37],"shown":[39],"open":[41],"field":[42],"must":[44],"be":[45,119,136],"controlled":[46],"11":[48],"percent":[49,57,73],"30":[51],"nm":[52,60,98],"isolated":[53,61],"features":[54,62],"and":[55,96],"6":[56],"20":[59],"an":[64],"NA":[65],"equals":[66],"0.25":[67],"assuming":[69],"+/-":[71],"3":[72],"CD":[74,116,128],"budget":[76],"allocated":[77],"flare.":[79],"Based":[80],"these":[82],"results":[83],"individual":[84],"mirror":[85,132],"surface":[86],"roughness":[87],"specifications":[88],"mid-spatial":[91],"frequencies":[92],"about":[94],"0.14":[95],"0.11":[97],"RMS,":[99],"respectively,":[100],"are":[101],"needed":[102],"future":[104],"chip":[105],"production.":[106],"This":[107],"paper":[108],"also":[109],"discusses":[110],"either":[112],"mask":[113],"'dummification'":[114],"or":[115],"resizing":[117],"can":[118],"applied":[120],"minimize":[122],"effects":[124],"case":[131],"fabrication":[133],"targets":[134],"may":[135],"difficult":[137],"achieve.":[139]},"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":6},{"year":2012,"cited_by_count":3}],"updated_date":"2026-10-12T09:40:04.860316","created_date":"2016-06-24T00:00:00"}