{"id":"https://openalex.org/W1967054482","doi":"https://doi.org/10.1117/12.557733","title":"Photomask clear defects repair using ultrafast laser technology","display_name":"Photomask clear defects repair using ultrafast laser technology","publication_year":2004,"publication_date":"2004-08-20","ids":{"openalex":"https://openalex.org/W1967054482","doi":"https://doi.org/10.1117/12.557733","mag":"1967054482"},"language":"en","primary_location":{"id":"doi:10.1117/12.557733","doi":"https://doi.org/10.1117/12.557733","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.557733","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5061009130","display_name":"Guy Ben-Zvi","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Guy Ben-Zvi","raw_affiliation_strings":["UC Laser Technologies (Israel)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"UC Laser Technologies (Israel)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039352083","display_name":"N. N. Guletskii","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I172901346","display_name":"St Petersburg University","ror":"https://ror.org/023znxa73","country_code":"RU","type":"education","lineage":["https://openalex.org/I172901346"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Nikolay Guletsky","raw_affiliation_strings":["St. Petersburg State Univ. (Russia)","St Petersburg State University, Russia#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"St. Petersburg State Univ. (Russia)","institution_ids":["https://openalex.org/I172901346"]},{"raw_affiliation_string":"St Petersburg State University, Russia#TAB#","institution_ids":["https://openalex.org/I172901346"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111584792","display_name":"Vladimir Dmitriev","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I172901346","display_name":"St Petersburg University","ror":"https://ror.org/023znxa73","country_code":"RU","type":"education","lineage":["https://openalex.org/I172901346"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Vladimir J. Dmitriev","raw_affiliation_strings":["St. Petersburg State Univ. (Russia)","St Petersburg State University, Russia#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"St. Petersburg State Univ. (Russia)","institution_ids":["https://openalex.org/I172901346"]},{"raw_affiliation_string":"St Petersburg State University, Russia#TAB#","institution_ids":["https://openalex.org/I172901346"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5078141545","display_name":"Sergey V. Oshemkov","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I172901346","display_name":"St Petersburg University","ror":"https://ror.org/023znxa73","country_code":"RU","type":"education","lineage":["https://openalex.org/I172901346"]}],"countries":["RU"],"is_corresponding":false,"raw_author_name":"Sergey V. Oshemkov","raw_affiliation_strings":["St. Petersburg State Univ. (Russia)","St Petersburg State University, Russia#TAB#"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"St. Petersburg State Univ. (Russia)","institution_ids":["https://openalex.org/I172901346"]},{"raw_affiliation_string":"St Petersburg State University, Russia#TAB#","institution_ids":["https://openalex.org/I172901346"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5036145135","display_name":"Eitan Zait","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Eitan Zait","raw_affiliation_strings":["UC Laser Technologies (Israel)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"UC Laser Technologies (Israel)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.7851,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.81777625,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":"5446","issue":null,"first_page":"357","last_page":"357"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.002899999963119626,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10566","display_name":"Laser-Matter Interactions and Applications","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ultrafast-laser-machining","display_name":"ultrafast laser machining","score":0.8700000047683716},{"id":"https://openalex.org/keywords/laser-induced-breakdown","display_name":"laser-induced breakdown","score":0.7900000214576721},{"id":"https://openalex.org/keywords/shading-devices","display_name":"shading devices","score":0.8270000219345093},{"id":"https://openalex.org/keywords/optical-density","display_name":"optical density","score":0.6380000114440918},{"id":"https://openalex.org/keywords/photolithography","display_name":"photolithography","score":0.6660000085830688}],"concepts":[{"id":"https://openalex.org/C14737013","wikidata":"https://www.wikidata.org/wiki/Q1319657","display_name":"Photomask","level":4,"score":0.9704979658126831},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7836788892745972},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.7458653450012207},{"id":"https://openalex.org/C2778386843","wikidata":"https://www.wikidata.org/wiki/Q6493035","display_name":"Laser beam machining","level":4,"score":0.6467530727386475},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6305900812149048},{"id":"https://openalex.org/C178596936","wikidata":"https://www.wikidata.org/wiki/Q844471","display_name":"Ultrashort pulse","level":3,"score":0.6168244481086731},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.6028650999069214},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5377815365791321},{"id":"https://openalex.org/C137905882","wikidata":"https://www.wikidata.org/wiki/Q6783445","display_name":"Maskless lithography","level":5,"score":0.4200563430786133},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.35839515924453735},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.1559033989906311},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.10719406604766846},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.06793466210365295},{"id":"https://openalex.org/C2984025587","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser beams","level":3,"score":0.06768167018890381},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.557733","doi":"https://doi.org/10.1117/12.557733","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.557733","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":5,"referenced_works":["https://openalex.org/W1992700819","https://openalex.org/W2001865656","https://openalex.org/W2004776840","https://openalex.org/W2022532867","https://openalex.org/W2091262675"],"related_works":["https://openalex.org/W2083768502","https://openalex.org/W2086601170","https://openalex.org/W2077287255","https://openalex.org/W2894890640","https://openalex.org/W2080928128","https://openalex.org/W2089619255","https://openalex.org/W2001865656","https://openalex.org/W1511610870","https://openalex.org/W2058801369","https://openalex.org/W2287063761"],"abstract_inverted_index":{"The":[0,17],"applicability":[1],"of":[2,7,29,35,49,56,59,68,80,84,97,109,119,135,140],"ultrafast":[3],"laser":[4,91,126,156],"3D":[5,23],"machining":[6],"transparent":[8],"objects":[9],"for":[10,46,161],"photomask":[11,31,99,162],"clear":[12,36,163],"defects":[13,37,164],"repair":[14,165],"is":[15,19],"investigated.":[16],"technology":[18,157],"based":[20],"on":[21,103,124],"patterning":[22],"shading":[24,121,142,151],"elements":[25,54,152],"inside":[26],"quartz":[27],"body":[28],"the":[30,33,44,47,50,76,81,94,98,104,120,125,133,138,141],"at":[32,90],"vicinity":[34],"in":[38,62,73],"chrome":[39,88,113],"layer,":[40],"which":[41],"effectively":[42],"blocks":[43],"light":[45],"duration":[48],"photolithography":[51],"process.":[52],"Shading":[53],"consist":[55],"an":[57],"array":[58],"breakdown":[60,70,86,131],"points":[61],"quartz,":[63],"produced":[64],"as":[65],"a":[66,159],"result":[67],"laser-induced":[69],"and":[71,78,87,100,107,137,158],"arranged":[72],"accordance":[74],"with":[75],"size":[77,139],"location":[79],"defects.":[82],"Thresholds":[83],"bulk":[85],"removal":[89],"irradiation":[92],"from":[93],"back":[95],"side":[96],"their":[101],"dependence":[102],"pulse":[105,127],"energy":[106],"height":[108],"focal":[110],"point":[111],"under":[112],"layer":[114,150],"were":[115,153],"obtained.":[116],"Optical":[117],"density":[118,148],"element":[122,143],"depends":[123],"energy,":[128],"distance":[129],"between":[130],"points,":[132],"number":[134],"layers":[136],"itself.":[144],"To":[145],"increase":[146],"optical":[147],"multi":[149],"created.":[154],"Ultrafast":[155],"tool":[160],"are":[166],"described.":[167]},"counts_by_year":[{"year":2019,"cited_by_count":1}],"updated_date":"2026-10-12T09:40:04.860316","created_date":"2016-06-24T00:00:00"}