{"id":"https://openalex.org/W1966408692","doi":"https://doi.org/10.1016/j.jallcom.2008.11.158","title":"A general low-temperature CVD synthetic route to fabricate low-melting-point-metal compounds 1D nanostructures","display_name":"A general low-temperature CVD synthetic route to fabricate low-melting-point-metal compounds 1D nanostructures","publication_year":2008,"publication_date":"2008-12-14","ids":{"openalex":"https://openalex.org/W1966408692","doi":"https://doi.org/10.1016/j.jallcom.2008.11.158","mag":"1966408692"},"language":"en","primary_location":{"id":"doi:10.1016/j.jallcom.2008.11.158","doi":"https://doi.org/10.1016/j.jallcom.2008.11.158","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.jallcom.2008.11.158","pdf_url":null,"source":{"id":"https://openalex.org/S67716761","display_name":"Journal of Alloys and Compounds","issn_l":"0925-8388","issn":["0925-8388","1873-4669"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Alloys and Compounds","raw_type":"journal-article"},"parent_works":[],"lineage":["https://openalex.org/W1966408692"],"child_works_count":0,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101745086","display_name":"Leshu Yu","orcid":"https://orcid.org/0000-0001-5274-9142","observed_orcids":["https://orcid.org/0000-0001-5274-9142"]},"institutions":[{"id":"https://openalex.org/I881766915","display_name":"Nanjing University","ror":"https://ror.org/01rxvg760","country_code":"CN","type":"education","lineage":["https://openalex.org/I881766915"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Leshu Yu","raw_affiliation_strings":["The Key Laboratory of Mesoscopic Chemistry of MOE and Jiangsu Provincial Lab for NanoTechnology, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Key Laboratory of Mesoscopic Chemistry of MOE and Jiangsu Provincial Lab for NanoTechnology, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China","institution_ids":["https://openalex.org/I881766915"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100658503","display_name":"Ning Liu","orcid":"https://orcid.org/0000-0003-4841-618X","observed_orcids":["https://orcid.org/0000-0003-4841-618X"]},"institutions":[{"id":"https://openalex.org/I881766915","display_name":"Nanjing University","ror":"https://ror.org/01rxvg760","country_code":"CN","type":"education","lineage":["https://openalex.org/I881766915"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Ning Liu","raw_affiliation_strings":["The Key Laboratory of Mesoscopic Chemistry of MOE and Jiangsu Provincial Lab for NanoTechnology, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Key Laboratory of Mesoscopic Chemistry of MOE and Jiangsu Provincial Lab for NanoTechnology, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China","institution_ids":["https://openalex.org/I881766915"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5047261565","display_name":"Xuebin Wang","orcid":"https://orcid.org/0000-0002-7894-1922","observed_orcids":["https://orcid.org/0000-0002-7894-1922"]},"institutions":[{"id":"https://openalex.org/I881766915","display_name":"Nanjing University","ror":"https://ror.org/01rxvg760","country_code":"CN","type":"education","lineage":["https://openalex.org/I881766915"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xuebin Wang","raw_affiliation_strings":["The Key Laboratory of Mesoscopic Chemistry of MOE and Jiangsu Provincial Lab for NanoTechnology, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Key Laboratory of Mesoscopic Chemistry of MOE and Jiangsu Provincial Lab for NanoTechnology, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China","institution_ids":["https://openalex.org/I881766915"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5007904284","display_name":"Zheng Hu","orcid":"https://orcid.org/0000-0002-4847-899X","observed_orcids":["https://orcid.org/0000-0002-4847-899X","https://orcid.org/0000-0001-8310-4224"]},"institutions":[{"id":"https://openalex.org/I881766915","display_name":"Nanjing University","ror":"https://ror.org/01rxvg760","country_code":"CN","type":"education","lineage":["https://openalex.org/I881766915"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Zheng Hu","raw_affiliation_strings":["The Key Laboratory of Mesoscopic Chemistry of MOE and Jiangsu Provincial Lab for NanoTechnology, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The Key Laboratory of Mesoscopic Chemistry of MOE and Jiangsu Provincial Lab for NanoTechnology, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China","institution_ids":["https://openalex.org/I881766915"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I881766915"],"apc_list":{"value":3660,"currency":"USD","value_usd":3660},"apc_paid":null,"fwci":0.8575,"has_fulltext":false,"cited_by_count":14,"citation_normalized_percentile":{"value":0.71751792,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":95},"biblio":{"volume":"478","issue":"1-2","first_page":"L21","last_page":"L24"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.0017999999690800905,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13104","display_name":"Chemical and Physical Properties of Materials","score":0.0005000000237487257,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/low-temperature-chemical-vapor-deposition","display_name":"low-temperature chemical vapor deposition","score":0.9679999947547913},{"id":"https://openalex.org/keywords/low-melting-point-metals","display_name":"low melting point metals","score":0.8180000185966492},{"id":"https://openalex.org/keywords/one-dimensional-nanostructures","display_name":"one-dimensional nanostructures","score":0.859000027179718},{"id":"https://openalex.org/keywords/gan-nanowires","display_name":"GaN nanowires","score":0.9269999861717224},{"id":"https://openalex.org/keywords/ga2o3-nanowires","display_name":"Ga2O3 nanowires","score":0.9340000152587891},{"id":"https://openalex.org/keywords/sno2-nanorods","display_name":"SnO2 nanorods","score":0.8600000143051147},{"id":"https://openalex.org/keywords/direct-nitridation","display_name":"direct nitridation","score":0.7630000114440918},{"id":"https://openalex.org/keywords/direct-oxidation","display_name":"direct oxidation","score":0.8450000286102295},{"id":"https://openalex.org/keywords/silicon-substrate","display_name":"silicon substrate","score":0.7979999780654907}],"concepts":[{"id":"https://openalex.org/C126201875","wikidata":"https://www.wikidata.org/wiki/Q2684948","display_name":"Nanorod","level":2,"score":0.8180493712425232},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7781578302383423},{"id":"https://openalex.org/C154256306","wikidata":"https://www.wikidata.org/wiki/Q41795528","display_name":"Inert","level":2,"score":0.7088193893432617},{"id":"https://openalex.org/C74214498","wikidata":"https://www.wikidata.org/wiki/Q631739","display_name":"Nanowire","level":2,"score":0.6727945804595947},{"id":"https://openalex.org/C13530604","wikidata":"https://www.wikidata.org/wiki/Q15318","display_name":"Melting point","level":2,"score":0.6326857805252075},{"id":"https://openalex.org/C544153396","wikidata":"https://www.wikidata.org/wiki/Q11426","display_name":"Metal","level":2,"score":0.6057933568954468},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.5984407663345337},{"id":"https://openalex.org/C186187911","wikidata":"https://www.wikidata.org/wiki/Q1093894","display_name":"Nanostructure","level":2,"score":0.5880413055419922},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5660243630409241},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.5397023558616638},{"id":"https://openalex.org/C194760766","wikidata":"https://www.wikidata.org/wiki/Q410851","display_name":"Nitride","level":3,"score":0.5220211148262024},{"id":"https://openalex.org/C145889102","wikidata":"https://www.wikidata.org/wiki/Q902420","display_name":"Dispersant","level":3,"score":0.4474501609802246},{"id":"https://openalex.org/C177562468","wikidata":"https://www.wikidata.org/wiki/Q182893","display_name":"Dispersion (optics)","level":2,"score":0.3713325262069702},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.1535024642944336},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.13769936561584473},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.11519420146942139},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.10118377208709717},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0704658031463623},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/j.jallcom.2008.11.158","doi":"https://doi.org/10.1016/j.jallcom.2008.11.158","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.jallcom.2008.11.158","pdf_url":null,"source":{"id":"https://openalex.org/S67716761","display_name":"Journal of Alloys and Compounds","issn_l":"0925-8388","issn":["0925-8388","1873-4669"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Alloys and Compounds","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":26,"referenced_works":["https://openalex.org/W1586122318","https://openalex.org/W1967925038","https://openalex.org/W1983814657","https://openalex.org/W1986303151","https://openalex.org/W1986893115","https://openalex.org/W1987087542","https://openalex.org/W1994211175","https://openalex.org/W1996002409","https://openalex.org/W2000992499","https://openalex.org/W2009706736","https://openalex.org/W2022977723","https://openalex.org/W2037843882","https://openalex.org/W2040641008","https://openalex.org/W2050393855","https://openalex.org/W2052383938","https://openalex.org/W2053151862","https://openalex.org/W2058502338","https://openalex.org/W2070564133","https://openalex.org/W2073533305","https://openalex.org/W2079193686","https://openalex.org/W2090573711","https://openalex.org/W2093421311","https://openalex.org/W2137059067","https://openalex.org/W2331259585","https://openalex.org/W2949216462","https://openalex.org/W4301806259"],"related_works":["https://openalex.org/W2009633055","https://openalex.org/W1984264203","https://openalex.org/W1996932290","https://openalex.org/W2405965875","https://openalex.org/W2949748907","https://openalex.org/W2066627709","https://openalex.org/W1965513877","https://openalex.org/W2109181906","https://openalex.org/W1978323695","https://openalex.org/W3194336228"],"abstract_inverted_index":null,"counts_by_year":[{"year":2021,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":2}],"updated_date":"2026-09-24T07:57:37.273135","created_date":"2016-06-24T00:00:00"}