{"id":"https://openalex.org/W1966200455","doi":"https://doi.org/10.1063/1.3265740","title":"MgO barrier-perpendicular magnetic tunnel junctions with CoFe/Pd multilayers and ferromagnetic insertion layers","display_name":"MgO barrier-perpendicular magnetic tunnel junctions with CoFe/Pd multilayers and ferromagnetic insertion layers","publication_year":2009,"publication_date":"2009-12-07","ids":{"openalex":"https://openalex.org/W1966200455","doi":"https://doi.org/10.1063/1.3265740","mag":"1966200455"},"language":"en","primary_location":{"id":"doi:10.1063/1.3265740","doi":"https://doi.org/10.1063/1.3265740","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.3265740","pdf_url":null,"source":{"id":"https://openalex.org/S105243760","display_name":"Applied Physics Letters","issn_l":"0003-6951","issn":["0003-6951","1077-3118","1520-8842"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-3","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics Letters","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["arxiv","crossref","datacite"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://arxiv.org/pdf/0910.4204","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111777633","display_name":"K. Mizunuma","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Mizunuma","raw_affiliation_strings":["Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5012267283","display_name":"Shoji Ikeda","orcid":"https://orcid.org/0000-0002-3925-4089","observed_orcids":["https://orcid.org/0000-0002-3925-4089"]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"S. Ikeda","raw_affiliation_strings":["Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5038412073","display_name":"J. H. Park","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"J. H. Park","raw_affiliation_strings":["Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5105780965","display_name":"H. Yamamoto","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Yamamoto","raw_affiliation_strings":["Hitachi, Ltd. 2 Advanced Research Laboratory, , 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hitachi, Ltd. 2 Advanced Research Laboratory, , 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]},{"raw_affiliation_string":"Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032876966","display_name":"Huadong Gan","orcid":"https://orcid.org/0000-0003-3448-5387","observed_orcids":["https://orcid.org/0000-0003-3448-5387"]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Gan","raw_affiliation_strings":["Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101675678","display_name":"K. Miura","orcid":"https://orcid.org/0000-0002-3202-5259","observed_orcids":["https://orcid.org/0000-0002-3202-5259"]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Miura","raw_affiliation_strings":["Hitachi, Ltd. 2 Advanced Research Laboratory, , 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hitachi, Ltd. 2 Advanced Research Laboratory, , 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]},{"raw_affiliation_string":"Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113876529","display_name":"H. Hasegawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Hasegawa","raw_affiliation_strings":["Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110602384","display_name":"Jun Hayakawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"J. Hayakawa","raw_affiliation_strings":["Hitachi, Ltd. 2 Advanced Research Laboratory, , 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","1Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hitachi, Ltd. 2 Advanced Research Laboratory, , 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]},{"raw_affiliation_string":"1Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I4405285984"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084844670","display_name":"F. Matsukura","orcid":"https://orcid.org/0000-0003-3272-8947","observed_orcids":["https://orcid.org/0000-0003-3272-8947"]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"F. Matsukura","raw_affiliation_strings":["Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5081983682","display_name":"Hideo Ohno","orcid":"https://orcid.org/0000-0001-9688-8259","observed_orcids":["https://orcid.org/0000-0001-9688-8259"]},"institutions":[{"id":"https://openalex.org/I201537933","display_name":"Tohoku University","ror":"https://ror.org/01dq60k83","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},{"id":"https://openalex.org/I4405285984","display_name":"Research Institute of Electrical Communication, Tohoku University","ror":"https://ror.org/00vbrys56","country_code":"JP","type":"facility","lineage":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"id":"https://openalex.org/I65143321","display_name":"Hitachi (Japan)","ror":"https://ror.org/02exqgm79","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Ohno","raw_affiliation_strings":["Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tohoku University 1 Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan","institution_ids":["https://openalex.org/I201537933","https://openalex.org/I4405285984"]},{"raw_affiliation_string":"2Advanced Research Laboratory, Hitachi, Ltd., 1-280 Higashi-koigakubo, Kokubunji-shi, Tokyo 185-8601, Japan","institution_ids":["https://openalex.org/I65143321"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":8.7213,"has_fulltext":false,"cited_by_count":140,"citation_normalized_percentile":{"value":0.98685733,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":100},"biblio":{"volume":"95","issue":"23","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10049","display_name":"Magnetic properties of thin films","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10049","display_name":"Magnetic properties of thin films","score":0.9970999956130981,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11782","display_name":"Magnetic Properties of Alloys","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/mgo-barrier","display_name":"MgO barrier","score":0.7979999780654907},{"id":"https://openalex.org/keywords/magnetic-tunnel-junctions","display_name":"magnetic tunnel junctions","score":0.8960000276565552},{"id":"https://openalex.org/keywords/tunnel-magnetoresistance","display_name":"tunnel magnetoresistance","score":0.9160000085830688},{"id":"https://openalex.org/keywords/annealing-temperature","display_name":"annealing temperature","score":0.7580000162124634},{"id":"https://openalex.org/keywords/boron-diffusion","display_name":"boron diffusion","score":0.6520000100135803},{"id":"https://openalex.org/keywords/in-situ-annealing","display_name":"in situ annealing","score":0.8109999895095825},{"id":"https://openalex.org/keywords/post-annealing","display_name":"post-annealing","score":0.6129999756813049}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8203592896461487},{"id":"https://openalex.org/C82217956","wikidata":"https://www.wikidata.org/wiki/Q184207","display_name":"Ferromagnetism","level":2,"score":0.8000813126564026},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7896846532821655},{"id":"https://openalex.org/C56202322","wikidata":"https://www.wikidata.org/wiki/Q1884383","display_name":"Tunnel magnetoresistance","level":3,"score":0.7110350131988525},{"id":"https://openalex.org/C117958382","wikidata":"https://www.wikidata.org/wiki/Q58347","display_name":"Magnetoresistance","level":3,"score":0.7069785594940186},{"id":"https://openalex.org/C2988842714","wikidata":"https://www.wikidata.org/wiki/Q908630","display_name":"Iron alloys","level":2,"score":0.5619974136352539},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.561690092086792},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.43529850244522095},{"id":"https://openalex.org/C9395851","wikidata":"https://www.wikidata.org/wiki/Q177929","display_name":"Stack (abstract data type)","level":2,"score":0.412982314825058},{"id":"https://openalex.org/C2778836790","wikidata":"https://www.wikidata.org/wiki/Q5275435","display_name":"Diffusion barrier","level":3,"score":0.41215625405311584},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.28312188386917114},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.22702538967132568},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.22138437628746033},{"id":"https://openalex.org/C115260700","wikidata":"https://www.wikidata.org/wiki/Q11408","display_name":"Magnetic field","level":2,"score":0.1658479869365692},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.10826665163040161},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1063/1.3265740","doi":"https://doi.org/10.1063/1.3265740","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.3265740","pdf_url":null,"source":{"id":"https://openalex.org/S105243760","display_name":"Applied Physics Letters","issn_l":"0003-6951","issn":["0003-6951","1077-3118","1520-8842"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-3","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics Letters","raw_type":"journal-article"},{"id":"pmh:oai:arXiv.org:0910.4204","doi":null,"is_oa":true,"landing_page_url":"http://arxiv.org/abs/0910.4204","pdf_url":"https://arxiv.org/pdf/0910.4204","source":{"id":"https://openalex.org/S4306400194","display_name":"arXiv (Cornell University)","issn_l":"2331-8422","issn":["2331-8422"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I205783295","host_organization_name":"Cornell University","host_organization_lineage":["https://openalex.org/I205783295"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"text"},{"id":"doi:10.48550/arxiv.0910.4204","doi":"https://doi.org/10.48550/arxiv.0910.4204","is_oa":true,"landing_page_url":"https://doi.org/10.48550/arxiv.0910.4204","pdf_url":null,"source":{"id":"https://openalex.org/S4306400194","display_name":"arXiv (Cornell University)","issn_l":"2331-8422","issn":["2331-8422"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I205783295","host_organization_name":"Cornell University","host_organization_lineage":["https://openalex.org/I205783295"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"article-journal"}],"best_oa_location":{"id":"pmh:oai:arXiv.org:0910.4204","doi":null,"is_oa":true,"landing_page_url":"http://arxiv.org/abs/0910.4204","pdf_url":"https://arxiv.org/pdf/0910.4204","source":{"id":"https://openalex.org/S4306400194","display_name":"arXiv (Cornell University)","issn_l":"2331-8422","issn":["2331-8422"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I205783295","host_organization_name":"Cornell University","host_organization_lineage":["https://openalex.org/I205783295"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"text"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":23,"referenced_works":["https://openalex.org/W1973382704","https://openalex.org/W1997406853","https://openalex.org/W2001689978","https://openalex.org/W2010159951","https://openalex.org/W2013376634","https://openalex.org/W2028273838","https://openalex.org/W2030512563","https://openalex.org/W2032267407","https://openalex.org/W2045523249","https://openalex.org/W2061461541","https://openalex.org/W2085406501","https://openalex.org/W2087549254","https://openalex.org/W2088797290","https://openalex.org/W2092902282","https://openalex.org/W2093442853","https://openalex.org/W2093789552","https://openalex.org/W2102008139","https://openalex.org/W2138670105","https://openalex.org/W2145175359","https://openalex.org/W2148103386","https://openalex.org/W2148233578","https://openalex.org/W2148854117","https://openalex.org/W4242056484"],"related_works":["https://openalex.org/W2059230740","https://openalex.org/W2148103386","https://openalex.org/W2026414381","https://openalex.org/W1975698908","https://openalex.org/W2061461541","https://openalex.org/W2163770592","https://openalex.org/W2018889464","https://openalex.org/W3023582802","https://openalex.org/W1975996146","https://openalex.org/W2048335537"],"abstract_inverted_index":{"The":[0,52],"authors":[1],"studied":[2],"an":[3],"effect":[4],"of":[5,17,40,54,63,73,96],"ferromagnetic":[6],"(Co20Fe60B20":[7],"or":[8,67],"Fe)":[9],"layer":[10],"insertion":[11],"on":[12],"tunnel":[13,20],"magnetoresistance":[14],"(TMR)":[15],"properties":[16],"MgO-barrier":[18],"magnetic":[19],"junctions":[21],"(MTJs)":[22],"with":[23,31],"CoFe/Pd":[24,91],"multilayer":[25,92],"electrodes.":[26],"TMR":[27,56,94],"ratio":[28,57,95],"in":[29,81],"MTJs":[30,78],"CoFeB/MgO/Fe":[32],"stack":[33],"reached":[34],"67%":[35],"at":[36,47,84,100],"annealing":[37],"temperature":[38],"(Ta)":[39],"200":[41],"\u00b0C":[42,86],"and":[43],"then":[44],"decreased":[45],"rapidly":[46],"Ta":[48],"over":[49],"250":[50],"\u00b0C.":[51,102],"degradation":[53],"the":[55],"may":[58],"be":[59],"related":[60],"to":[61],"crystallization":[62],"CoFe(B)":[64],"into":[65,75],"fcc(111)":[66],"bcc(011)":[68],"texture":[69],"resulting":[70],"from":[71],"diffusion":[72],"B":[74],"Pd":[76],"layers.":[77],"which":[79],"were":[80],"situ":[82],"annealed":[83],"350":[85],"just":[87],"after":[88],"depositing":[89],"bottom":[90],"showed":[93],"78%":[97],"by":[98],"postannealing":[99],"Ta=200":[101]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":3},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":2},{"year":2019,"cited_by_count":5},{"year":2018,"cited_by_count":10},{"year":2017,"cited_by_count":10},{"year":2016,"cited_by_count":12},{"year":2015,"cited_by_count":10},{"year":2014,"cited_by_count":14},{"year":2013,"cited_by_count":19},{"year":2012,"cited_by_count":22}],"updated_date":"2026-10-29T09:56:32.521200","created_date":"2016-06-24T00:00:00"}