{"id":"https://openalex.org/W1964893391","doi":"https://doi.org/10.1117/12.808043","title":"A novel optical component for the development of an integrated interferometric system","display_name":"A novel optical component for the development of an integrated interferometric system","publication_year":2009,"publication_date":"2009-01-31","ids":{"openalex":"https://openalex.org/W1964893391","doi":"https://doi.org/10.1117/12.808043","mag":"1964893391"},"language":"en","primary_location":{"id":"doi:10.1117/12.808043","doi":"https://doi.org/10.1117/12.808043","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.808043","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5012289645","display_name":"Alison Gracias","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I392282","display_name":"University at Albany, State University of New York","ror":"https://ror.org/012zs8222","country_code":"US","type":"education","lineage":["https://openalex.org/I392282"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"A. Gracias","raw_affiliation_strings":["Univ. at Albany, SUNY (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. at Albany, SUNY (United States)","institution_ids":["https://openalex.org/I392282"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041312757","display_name":"Natalya A. Tokranova","orcid":"https://orcid.org/0009-0005-0778-4615","observed_orcids":["https://orcid.org/0009-0005-0778-4615"]},"institutions":[{"id":"https://openalex.org/I392282","display_name":"University at Albany, State University of New York","ror":"https://ror.org/012zs8222","country_code":"US","type":"education","lineage":["https://openalex.org/I392282"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"N. Tokranova","raw_affiliation_strings":["Univ. at Albany, SUNY (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. at Albany, SUNY (United States)","institution_ids":["https://openalex.org/I392282"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113676962","display_name":"Stephen Olson","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I392282","display_name":"University at Albany, State University of New York","ror":"https://ror.org/012zs8222","country_code":"US","type":"education","lineage":["https://openalex.org/I392282"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"S. Olson","raw_affiliation_strings":["Univ. at Albany, SUNY (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. at Albany, SUNY (United States)","institution_ids":["https://openalex.org/I392282"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5055059104","display_name":"James Castracane","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I392282","display_name":"University at Albany, State University of New York","ror":"https://ror.org/012zs8222","country_code":"US","type":"education","lineage":["https://openalex.org/I392282"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"J. Castracane","raw_affiliation_strings":["Univ. at Albany, SUNY (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Univ. at Albany, SUNY (United States)","institution_ids":["https://openalex.org/I392282"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I392282"],"apc_list":null,"apc_paid":null,"fwci":1.4349,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.76880958,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"7212","issue":null,"first_page":"72120P","last_page":"72120P"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11429","display_name":"Semiconductor Lasers and Optical Devices","score":0.4528999924659729,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11429","display_name":"Semiconductor Lasers and Optical Devices","score":0.4528999924659729,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.26510000228881836,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.09529999643564224,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/optical-interferometry","display_name":"optical interferometry","score":0.8820000290870667},{"id":"https://openalex.org/keywords/vertical-cavity-surface-emitting-lasers","display_name":"vertical-cavity surface-emitting lasers","score":0.6460000276565552},{"id":"https://openalex.org/keywords/beam-splitter","display_name":"beam splitter","score":0.7580000162124634},{"id":"https://openalex.org/keywords/reference-mirror","display_name":"reference mirror","score":0.9819999933242798},{"id":"https://openalex.org/keywords/wafer-level-integration","display_name":"wafer-level integration","score":0.902999997138977},{"id":"https://openalex.org/keywords/displacement-measurement","display_name":"displacement measurement","score":0.7409999966621399},{"id":"https://openalex.org/keywords/position-sensors","display_name":"position sensors","score":0.7870000004768372},{"id":"https://openalex.org/keywords/proximity-sensors","display_name":"proximity sensors","score":0.9179999828338623},{"id":"https://openalex.org/keywords/miniaturization","display_name":"miniaturization","score":0.7070000171661377}],"concepts":[{"id":"https://openalex.org/C166689943","wikidata":"https://www.wikidata.org/wiki/Q850283","display_name":"Interferometry","level":2,"score":0.676148533821106},{"id":"https://openalex.org/C19819980","wikidata":"https://www.wikidata.org/wiki/Q947542","display_name":"Beam splitter","level":3,"score":0.6113055944442749},{"id":"https://openalex.org/C23576306","wikidata":"https://www.wikidata.org/wiki/Q17004698","display_name":"Astronomical interferometer","level":3,"score":0.6045557856559753},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.49773433804512024},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.49589595198631287},{"id":"https://openalex.org/C168167062","wikidata":"https://www.wikidata.org/wiki/Q1117970","display_name":"Component (thermodynamics)","level":2,"score":0.4900111258029938},{"id":"https://openalex.org/C151857401","wikidata":"https://www.wikidata.org/wiki/Q640621","display_name":"Optical engineering","level":2,"score":0.4444117248058319},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.423716276884079},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4140651822090149},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.3396684527397156},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3372122645378113},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.31766971945762634},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.27864059805870056},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.20312094688415527},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.19335493445396423},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.808043","doi":"https://doi.org/10.1117/12.808043","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.808043","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"sustainable_development_goals_aurora":[{"score":0.5799999833106995,"id":"https://metadata.un.org/sdg/9","display_name":"Industry, innovation and infrastructure"}],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2247131465","https://openalex.org/W4385980110","https://openalex.org/W1992150419","https://openalex.org/W2075605751","https://openalex.org/W2480106622","https://openalex.org/W1507872287","https://openalex.org/W2375807418","https://openalex.org/W2772860105","https://openalex.org/W2994647603","https://openalex.org/W4327711709"],"abstract_inverted_index":{"Optical":[0],"interferometry":[1],"is":[2,13,81,90,117],"a":[3,21,109,122,144],"well":[4],"established":[5],"technique":[6],"for":[7],"high":[8,105],"resolution":[9,107],"displacement":[10],"measurements.":[11],"It":[12],"commonly":[14],"used":[15],"in":[16,45,57,76,108],"the":[17,29,32,38,77,103,119,139,158,168,186,196,200],"semiconductor":[18],"industry":[19,30],"as":[20,207],"sub-system":[22],"of":[23,41,96,114,121,154,170,185,203],"manufacturing":[24],"and":[25,43,52,73,132,152,161,178],"metrology":[26],"tools.":[27],"As":[28],"progresses,":[31],"tools":[33],"continue":[34],"to":[35,55,62,83,92,142,198],"evolve,":[36],"requiring":[37],"concomitant":[39],"reduction":[40],"size":[42,124],"cost":[44,147],"sensors.":[46,210],"Existing":[47],"interferometric":[48,148],"systems":[49,65],"are":[50,60],"bulky":[51],"therefore":[53],"difficult":[54,82],"incorporate":[56],"equipment.":[58],"Efforts":[59],"ongoing":[61],"miniaturize":[63],"these":[64],"but":[66],"with":[67,136,174],"optical":[68,125,130,176,183],"components":[69,99],"(beam":[70],"splitters,":[71],"detectors":[72],"lasers)":[74],"still":[75],"millimeter":[78],"range,":[79],"it":[80,89],"realize":[84],"ultra":[85],"compact":[86,110],"systems.":[87],"Thus,":[88],"imperative":[91],"focus":[93,113],"on":[94,118],"development":[95,120,153],"micron":[97,123,204],"scale":[98,205],"that":[100,127],"would":[101],"provide":[102],"necessary":[104],"spatial":[106],"format.":[111],"The":[112,150],"this":[115,155],"paper":[116],"component":[126,156],"combines":[128],"multiple":[129],"elements":[131],"can":[133],"be":[134,165,191],"integrated":[135,187],"VCSELs":[137],"at":[138],"wafer":[140],"level":[141],"yield":[143],"compact,":[145],"low":[146],"system.":[149],"design":[151],"containing":[157],"beam":[159],"splitter":[160],"reference":[162],"mirror":[163],"will":[164,189],"presented":[166],"including":[167],"investigation":[169],"suitable":[171],"polymeric":[172],"materials":[173],"desirable":[175],"properties":[177],"appropriate":[179],"fabrication":[180],"techniques.":[181],"Preliminary":[182],"measurements":[184],"system":[188],"also":[190],"demonstrated.":[192],"This":[193],"approach":[194],"has":[195],"potential":[197],"impact":[199],"next":[201],"generation":[202],"interferometers":[206],"precise":[208],"position/proximity":[209]},"counts_by_year":[{"year":2012,"cited_by_count":1}],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2016-06-24T00:00:00"}