{"id":"https://openalex.org/W1920162676","doi":"https://doi.org/10.1109/vlsit.1999.799324","title":"SON (silicon on nothing)-a new device architecture for the ULSI era","display_name":"SON (silicon on nothing)-a new device architecture for the ULSI era","publication_year":1999,"publication_date":"1999-01-01","ids":{"openalex":"https://openalex.org/W1920162676","doi":"https://doi.org/10.1109/vlsit.1999.799324","mag":"1920162676"},"language":"en","primary_location":{"id":"doi:10.1109/vlsit.1999.799324","doi":"https://doi.org/10.1109/vlsit.1999.799324","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vlsit.1999.799324","pdf_url":null,"source":{"id":"https://openalex.org/S4306421008","display_name":"Symposium on VLSI Technology","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325)","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5021583905","display_name":"Ma\u0142gorzata Jurczak","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I108403487","display_name":"Warsaw University of Technology","ror":"https://ror.org/00y0xnp53","country_code":"PL","type":"education","lineage":["https://openalex.org/I108403487"]}],"countries":["PL"],"is_corresponding":false,"raw_author_name":"M. Jurczak","raw_affiliation_strings":["Inst. of Microelectron. & Optoelectron., Warsaw Univ. of Technol., Poland"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Inst. of Microelectron. & Optoelectron., Warsaw Univ. of Technol., Poland","institution_ids":["https://openalex.org/I108403487"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048063495","display_name":"T. Skotnicki","orcid":"https://orcid.org/0000-0001-7573-1201","observed_orcids":["https://orcid.org/0000-0001-7573-1201"]},"institutions":[{"id":"https://openalex.org/I19370010","display_name":"Orange (France)","ror":"https://ror.org/035j0tq82","country_code":"FR","type":"company","lineage":["https://openalex.org/I19370010"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"T. Skotnicki","raw_affiliation_strings":["CNET Grenoble, France Telecom, Meylan, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CNET Grenoble, France Telecom, Meylan, France","institution_ids":["https://openalex.org/I19370010"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028903078","display_name":"Maryse Paoli","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19370010","display_name":"Orange (France)","ror":"https://ror.org/035j0tq82","country_code":"FR","type":"company","lineage":["https://openalex.org/I19370010"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"M. Paoli","raw_affiliation_strings":["CNET Grenoble, France Telecom, Meylan, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CNET Grenoble, France Telecom, Meylan, France","institution_ids":["https://openalex.org/I19370010"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062704326","display_name":"B. Tormen","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"B. Tormen","raw_affiliation_strings":["STMicroelectronics, Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110176417","display_name":"Jorge Luis Regolini","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19370010","display_name":"Orange (France)","ror":"https://ror.org/035j0tq82","country_code":"FR","type":"company","lineage":["https://openalex.org/I19370010"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J.-L. Regolini","raw_affiliation_strings":["CNET Grenoble, France Telecom, Meylan, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CNET Grenoble, France Telecom, Meylan, France","institution_ids":["https://openalex.org/I19370010"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108509931","display_name":"Christine Morin","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19370010","display_name":"Orange (France)","ror":"https://ror.org/035j0tq82","country_code":"FR","type":"company","lineage":["https://openalex.org/I19370010"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"C. Morin","raw_affiliation_strings":["CNET Grenoble, France Telecom, Meylan, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CNET Grenoble, France Telecom, Meylan, France","institution_ids":["https://openalex.org/I19370010"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109922049","display_name":"A. Schiltz","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19370010","display_name":"Orange (France)","ror":"https://ror.org/035j0tq82","country_code":"FR","type":"company","lineage":["https://openalex.org/I19370010"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"A. Schiltz","raw_affiliation_strings":["CNET Grenoble, France Telecom, Meylan, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CNET Grenoble, France Telecom, Meylan, France","institution_ids":["https://openalex.org/I19370010"]}]},{"author_position":"middle","author":{"id":null,"display_name":"J. Martins","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210104693","display_name":"STMicroelectronics (France)","ror":"https://ror.org/01c74sd89","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J. Martins","raw_affiliation_strings":["STMicroelectronics, Crolles, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"STMicroelectronics, Crolles, France","institution_ids":["https://openalex.org/I4210104693"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082212090","display_name":"R. Pantel","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19370010","display_name":"Orange (France)","ror":"https://ror.org/035j0tq82","country_code":"FR","type":"company","lineage":["https://openalex.org/I19370010"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"R. Pantel","raw_affiliation_strings":["CNET Grenoble, France Telecom, Meylan, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CNET Grenoble, France Telecom, Meylan, France","institution_ids":["https://openalex.org/I19370010"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5006105024","display_name":"Jean Galvier","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19370010","display_name":"Orange (France)","ror":"https://ror.org/035j0tq82","country_code":"FR","type":"company","lineage":["https://openalex.org/I19370010"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J. Galvier","raw_affiliation_strings":["CNET Grenoble, France Telecom, Meylan, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CNET Grenoble, France Telecom, Meylan, France","institution_ids":["https://openalex.org/I19370010"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":3.9257,"has_fulltext":false,"cited_by_count":51,"citation_normalized_percentile":{"value":0.92260548,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"1999","issue":null,"first_page":"29","last_page":"30"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9878000020980835,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9878000020980835,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.01140000019222498,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/silicon-on-nothing","display_name":"silicon-on-nothing","score":0.9539999961853027},{"id":"https://openalex.org/keywords/device-architecture","display_name":"device architecture","score":0.902999997138977},{"id":"https://openalex.org/keywords/short-channel-effects","display_name":"short-channel effects","score":0.7730000019073486},{"id":"https://openalex.org/keywords/drain-induced-barrier-lowering","display_name":"drain-induced barrier lowering","score":0.8799999952316284},{"id":"https://openalex.org/keywords/thin-buried-oxide","display_name":"thin buried oxide","score":0.7950000166893005},{"id":"https://openalex.org/keywords/silicon-thin-films","display_name":"silicon thin films","score":0.7229999899864197},{"id":"https://openalex.org/keywords/on-off-ratio","display_name":"on/off current ratio","score":0.8569999933242798},{"id":"https://openalex.org/keywords/threshold-voltage-roll-off","display_name":"threshold voltage roll-off","score":0.9940000176429749},{"id":"https://openalex.org/keywords/self-heating-effect","display_name":"self-heating","score":0.7889999747276306},{"id":"https://openalex.org/keywords/source-drain-resistance","display_name":"source/drain resistance","score":0.9380000233650208},{"id":"https://openalex.org/keywords/ulsi","display_name":"ULSI","score":0.8809999823570251}],"concepts":[{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.8135454654693604},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.7867681384086609},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6198504567146301},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6159865260124207},{"id":"https://openalex.org/C14485415","wikidata":"https://www.wikidata.org/wiki/Q5384730","display_name":"Equivalent series resistance","level":3,"score":0.4961768090724945},{"id":"https://openalex.org/C127162648","wikidata":"https://www.wikidata.org/wiki/Q16858953","display_name":"Channel (broadcasting)","level":2,"score":0.462862104177475},{"id":"https://openalex.org/C136815107","wikidata":"https://www.wikidata.org/wiki/Q154242","display_name":"Nothing","level":2,"score":0.4583430290222168},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.44115522503852844},{"id":"https://openalex.org/C123657996","wikidata":"https://www.wikidata.org/wiki/Q12271","display_name":"Architecture","level":2,"score":0.418265700340271},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.40288597345352173},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3252069652080536},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.2033464014530182},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.07150369882583618},{"id":"https://openalex.org/C111472728","wikidata":"https://www.wikidata.org/wiki/Q9471","display_name":"Epistemology","level":1,"score":0.0},{"id":"https://openalex.org/C142362112","wikidata":"https://www.wikidata.org/wiki/Q735","display_name":"Art","level":0,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C153349607","wikidata":"https://www.wikidata.org/wiki/Q36649","display_name":"Visual arts","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/vlsit.1999.799324","doi":"https://doi.org/10.1109/vlsit.1999.799324","is_oa":false,"landing_page_url":"https://doi.org/10.1109/vlsit.1999.799324","pdf_url":null,"source":{"id":"https://openalex.org/S4306421008","display_name":"Symposium on VLSI Technology","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325)","raw_type":"proceedings-article"},{"id":"mag:3095415160","doi":null,"is_oa":false,"landing_page_url":"https://jglobal.jst.go.jp/detail?JGLOBAL_ID=200902138241630971","pdf_url":null,"source":{"id":"https://openalex.org/S4306421008","display_name":"Symposium on VLSI Technology","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"Symposium on VLSI Technology","raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W2036853252","https://openalex.org/W2046652516","https://openalex.org/W2133800303"],"related_works":["https://openalex.org/W2130939293","https://openalex.org/W4248854610","https://openalex.org/W2170444538","https://openalex.org/W2116386727","https://openalex.org/W2111344291","https://openalex.org/W2042963364","https://openalex.org/W2164610911","https://openalex.org/W1715007634","https://openalex.org/W2188969745","https://openalex.org/W2540393034"],"abstract_inverted_index":{"A":[0],"novel":[1],"device":[2,37],"architecture":[3],"called":[4],"SON":[5,39,82],"(silicon":[6],"on":[7,86],"nothing)":[8],"is":[9],"proposed,":[10],"allowing":[11],"extremely":[12],"thin":[13],"buried":[14],"oxides":[15],"and":[16,22,32,60,77],"silicon":[17],"films":[18],"to":[19,27,43,55,61],"be":[20,62],"fabricated":[21,85],"thereby":[23],"provide":[24],"better":[25],"resistance":[26],"short":[28],"channel":[29,58],"effects":[30],"(SCE)":[31],"DIBL":[33],"than":[34],"any":[35],"other":[36],"architecture.":[38],"devices":[40,83],"are":[41,84],"shown":[42],"present":[44],"excellent":[45],"I/sub":[46],"on//I/sub":[47],"off/":[48],"trade-off,":[49],"V/sub":[50],"th/":[51],"roll-off":[52],"suppression":[53],"down":[54],"15":[56],"nm":[57],"length,":[59],"free":[63],"from":[64],"the":[65],"shortcomings":[66],"of":[67],"conventional":[68],"SOI,":[69],"such":[70],"as":[71],"self-heating,":[72],"high":[73],"S/D":[74],"series":[75],"resistances,":[76],"expensive":[78],"SOI":[79],"substrates":[80],"since":[81],"bulk":[87],"silicon.":[88]},"counts_by_year":[{"year":2026,"cited_by_count":2},{"year":2021,"cited_by_count":2},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":4},{"year":2013,"cited_by_count":3},{"year":2012,"cited_by_count":3}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}