{"id":"https://openalex.org/W1877804367","doi":"https://doi.org/10.1109/iit.2000.924238","title":"A new tool for nondestructive monitoring of ion implantation","display_name":"A new tool for nondestructive monitoring of ion implantation","publication_year":2002,"publication_date":"2002-11-11","ids":{"openalex":"https://openalex.org/W1877804367","doi":"https://doi.org/10.1109/iit.2000.924238","mag":"1877804367"},"language":"en","primary_location":{"id":"doi:10.1109/iit.2000.924238","doi":"https://doi.org/10.1109/iit.2000.924238","is_oa":false,"landing_page_url":"https://doi.org/10.1109/iit.2000.924238","pdf_url":null,"source":{"id":"https://openalex.org/S4306419624","display_name":"International Conference on Ion Implantation Technology","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5108555909","display_name":"P. G. Coleman","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I51601045","display_name":"University of Bath","ror":"https://ror.org/002h8g185","country_code":"GB","type":"education","lineage":["https://openalex.org/I51601045"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"P.G. Coleman","raw_affiliation_strings":["Department of Physics, University of Bath, Bath, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, University of Bath, Bath, UK","institution_ids":["https://openalex.org/I51601045"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008546913","display_name":"C. P. Burrows","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I51601045","display_name":"University of Bath","ror":"https://ror.org/002h8g185","country_code":"GB","type":"education","lineage":["https://openalex.org/I51601045"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"C.P. Burrows","raw_affiliation_strings":["Department of Physics, University of Bath, Bath, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, University of Bath, Bath, UK","institution_ids":["https://openalex.org/I51601045"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5017198460","display_name":"Andrew P. Knights","orcid":"https://orcid.org/0000-0002-5201-6560","observed_orcids":["https://orcid.org/0000-0002-5201-6560"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"A.P. Knights","raw_affiliation_strings":["Bookham Technology Public Limited Company, Abingdon, Oxfordshire, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bookham Technology Public Limited Company, Abingdon, Oxfordshire, UK","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5068125922","display_name":"R. Gwilliam","orcid":"https://orcid.org/0000-0002-1488-755X","observed_orcids":["https://orcid.org/0000-0002-1488-755X"]},"institutions":[{"id":"https://openalex.org/I28290843","display_name":"University of Surrey","ror":"https://ror.org/00ks66431","country_code":"GB","type":"education","lineage":["https://openalex.org/I28290843"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"R.M. Gwilliam","raw_affiliation_strings":["Surrey Centre for Research into Ion Beam Applications School of Electronic Engineering, Information Technology and Mathematics, University of Surrey, Guildford, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Surrey Centre for Research into Ion Beam Applications School of Electronic Engineering, Information Technology and Mathematics, University of Surrey, Guildford, UK","institution_ids":["https://openalex.org/I28290843"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108380003","display_name":"Brian J. Sealy","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I28290843","display_name":"University of Surrey","ror":"https://ror.org/00ks66431","country_code":"GB","type":"education","lineage":["https://openalex.org/I28290843"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"B.J. Sealy","raw_affiliation_strings":["Surrey Centre for Research into Ion Beam Applications School of Electronic Engineering, Information Technology and Mathematics, University of Surrey, Guildford, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Surrey Centre for Research into Ion Beam Applications School of Electronic Engineering, Information Technology and Mathematics, University of Surrey, Guildford, UK","institution_ids":["https://openalex.org/I28290843"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044664775","display_name":"Richard D. Goldberg","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210087370","display_name":"Applied Materials (United Kingdom)","ror":"https://ror.org/006471y50","country_code":"GB","type":"company","lineage":["https://openalex.org/I193427800","https://openalex.org/I4210087370"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"R.D. Goldberg","raw_affiliation_strings":["Ion Implant Division, Applied Materials, Horsham, Sussex, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ion Implant Division, Applied Materials, Horsham, Sussex, UK","institution_ids":["https://openalex.org/I4210087370"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5053093918","display_name":"Amir H. Al-Bayati","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210087370","display_name":"Applied Materials (United Kingdom)","ror":"https://ror.org/006471y50","country_code":"GB","type":"company","lineage":["https://openalex.org/I193427800","https://openalex.org/I4210087370"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"A. Al-Bayati","raw_affiliation_strings":["Ion Implant Division, Applied Materials, Horsham, Sussex, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ion Implant Division, Applied Materials, Horsham, Sussex, UK","institution_ids":["https://openalex.org/I4210087370"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075204354","display_name":"Majeed A. Foad","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210087370","display_name":"Applied Materials (United Kingdom)","ror":"https://ror.org/006471y50","country_code":"GB","type":"company","lineage":["https://openalex.org/I193427800","https://openalex.org/I4210087370"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"M. Foad","raw_affiliation_strings":["Ion Implant Division, Applied Materials, Horsham, Sussex, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ion Implant Division, Applied Materials, Horsham, Sussex, UK","institution_ids":["https://openalex.org/I4210087370"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5059074078","display_name":"Adrian J. Murrell","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210087370","display_name":"Applied Materials (United Kingdom)","ror":"https://ror.org/006471y50","country_code":"GB","type":"company","lineage":["https://openalex.org/I193427800","https://openalex.org/I4210087370"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"A. Murrell","raw_affiliation_strings":["Ion Implant Division, Applied Materials, Horsham, Sussex, UK"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Ion Implant Division, Applied Materials, Horsham, Sussex, UK","institution_ids":["https://openalex.org/I4210087370"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.2213,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.81607987,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"654","last_page":"657"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12579","display_name":"Muon and positron interactions and applications","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12579","display_name":"Muon and positron interactions and applications","score":0.9976000189781189,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.001500000013038516,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11044","display_name":"Particle Detector Development and Performance","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3106","display_name":"Nuclear and High Energy Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/positron-annihilation-spectroscopy","display_name":"positron annihilation spectroscopy","score":0.9490000009536743},{"id":"https://openalex.org/keywords/charged-particle-beams","display_name":"charged particle beams","score":0.8899999856948853},{"id":"https://openalex.org/keywords/depth-resolved-analysis","display_name":"depth-resolved analysis","score":0.5440000295639038},{"id":"https://openalex.org/keywords/nondestructive-monitoring","display_name":"non-destructive monitoring","score":0.6629999876022339},{"id":"https://openalex.org/keywords/semiconductor-manufacturing","display_name":"semiconductor manufacturing","score":0.5540000200271606}],"concepts":[{"id":"https://openalex.org/C41823505","wikidata":"https://www.wikidata.org/wiki/Q1436752","display_name":"Ion implantation","level":3,"score":0.6342750191688538},{"id":"https://openalex.org/C56529433","wikidata":"https://www.wikidata.org/wiki/Q626700","display_name":"Nondestructive testing","level":2,"score":0.5634539723396301},{"id":"https://openalex.org/C50774322","wikidata":"https://www.wikidata.org/wiki/Q644248","display_name":"Ion beam","level":3,"score":0.474556028842926},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.41918328404426575},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.3809240162372589},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3807573914527893},{"id":"https://openalex.org/C168834538","wikidata":"https://www.wikidata.org/wiki/Q3705329","display_name":"Beam (structure)","level":2,"score":0.36767327785491943},{"id":"https://openalex.org/C201995342","wikidata":"https://www.wikidata.org/wiki/Q682496","display_name":"Systems engineering","level":1,"score":0.3451498746871948},{"id":"https://openalex.org/C116915560","wikidata":"https://www.wikidata.org/wiki/Q83504","display_name":"Nuclear engineering","level":1,"score":0.33896446228027344},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3174608051776886},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.24738255143165588},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.17664095759391785},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/iit.2000.924238","doi":"https://doi.org/10.1109/iit.2000.924238","is_oa":false,"landing_page_url":"https://doi.org/10.1109/iit.2000.924238","pdf_url":null,"source":{"id":"https://openalex.org/S4306419624","display_name":"International Conference on Ion Implantation Technology","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)","raw_type":"proceedings-article"},{"id":"doi:10.1109/.2000.924238","doi":"https://doi.org/10.1109/.2000.924238","is_oa":false,"landing_page_url":"https://doi.org/10.1109/.2000.924238","pdf_url":null,"source":{"id":"https://openalex.org/S4306419624","display_name":"International Conference on Ion Implantation Technology","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320322","display_name":"University of Bath","ror":"https://ror.org/002h8g185"},{"id":"https://openalex.org/F4320321979","display_name":"University of Surrey","ror":"https://ror.org/00ks66431"},{"id":"https://openalex.org/F4320334627","display_name":"Engineering and Physical Sciences Research Council","ror":"https://ror.org/0439y7842"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":8,"referenced_works":["https://openalex.org/W7493403","https://openalex.org/W1968644301","https://openalex.org/W2050956820","https://openalex.org/W2078119727","https://openalex.org/W2084147203","https://openalex.org/W2141543680","https://openalex.org/W2489441986","https://openalex.org/W2494739996"],"related_works":["https://openalex.org/W1624705052","https://openalex.org/W2097705124","https://openalex.org/W2050956820","https://openalex.org/W2064708502","https://openalex.org/W7097616929","https://openalex.org/W2160428151","https://openalex.org/W2048785950","https://openalex.org/W2109726026","https://openalex.org/W1996501635","https://openalex.org/W1964103377"],"abstract_inverted_index":{"We":[0],"describe":[1],"recent":[2],"research":[3,109],"designed":[4],"to":[5,31,47,96],"assess":[6],"the":[7,55,63,78,101,104],"potential":[8],"of":[9,65,103],"charged":[10],"particle":[11],"beams":[12],"as":[13,34,36],"an":[14],"implant-monitoring":[15],"tool.":[16],"The":[17],"technique":[18],"currently":[19],"under":[20],"development,":[21],"based":[22,93],"on":[23],"positron":[24],"annihilation":[25],"spectroscopy,":[26],"is":[27,67,84,113],"totally":[28],"nondestructive,":[29],"sensitive":[30],"implant":[32],"doses":[33],"low":[35],"10/sup":[37],"9/":[38],"cm/sup":[39],"-2/,":[40],"and":[41,60,100,110],"most":[42],"importantly,":[43],"can":[44],"be":[45],"tuned":[46],"obtain":[48],"depth-resolved":[49],"information.":[50],"A":[51,81],"collaborative":[52],"project":[53],"between":[54],"Surrey":[56],"Ion":[57],"Beam":[58],"Centre":[59],"researchers":[61],"at":[62,70],"University":[64],"Bath":[66],"underway,":[68],"aimed":[69],"developing":[71],"a":[72,91,108],"tool":[73],"suitable":[74],"for":[75],"use":[76],"in":[77,107],"semiconductor":[79],"industry.":[80],"prototype":[82],"instrument":[83,106],"described,":[85],"together":[86],"with":[87],"preliminary":[88],"measurements":[89],"using":[90],"laboratory":[92],"instrument.":[94],"Applications":[95],"other":[97],"vacancy-mediated":[98],"processes,":[99],"value":[102],"new":[105],"development":[111],"environment":[112],"discussed.":[114]},"counts_by_year":[],"updated_date":"2026-11-08T12:12:28.789561","created_date":"2016-06-24T00:00:00"}