{"id":"https://openalex.org/W1663014858","doi":"https://doi.org/10.1109/asmc.2004.1309609","title":"Advanced metrology tool for Si/sub 1-x/Ge/sub x/ characterization: Infrared Spectroscopic Ellipsometer (IRSE)","display_name":"Advanced metrology tool for Si/sub 1-x/Ge/sub x/ characterization: Infrared Spectroscopic Ellipsometer (IRSE)","publication_year":2004,"publication_date":"2004-09-07","ids":{"openalex":"https://openalex.org/W1663014858","doi":"https://doi.org/10.1109/asmc.2004.1309609","mag":"1663014858"},"language":"en","primary_location":{"id":"doi:10.1109/asmc.2004.1309609","doi":"https://doi.org/10.1109/asmc.2004.1309609","is_oa":false,"landing_page_url":"https://doi.org/10.1109/asmc.2004.1309609","pdf_url":null,"source":{"id":"https://openalex.org/S4210195742","display_name":"ASMC proceedings","issn_l":"1078-8743","issn":["1078-8743","2376-6697"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530)","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5009076965","display_name":"Darwin Enicks","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"D. Enicks","raw_affiliation_strings":["ATMEL Colorado Springs CO., Saitama, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ATMEL Colorado Springs CO., Saitama, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111477577","display_name":"I-L Teng","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"I-L Teng","raw_affiliation_strings":["ATMEL Colorado Springs CO., Saitama, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ATMEL Colorado Springs CO., Saitama, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"J. Rubino","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"J. Rubino","raw_affiliation_strings":["ATMEL Colorado Springs CO., Saitama, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ATMEL Colorado Springs CO., Saitama, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090401330","display_name":"Lei Sun","orcid":"https://orcid.org/0000-0002-5246-1373","observed_orcids":["https://orcid.org/0000-0002-5246-1373"]},"institutions":[{"id":"https://openalex.org/I4210150581","display_name":"Atmel (United States)","ror":"https://ror.org/03v861t80","country_code":"US","type":"company","lineage":["https://openalex.org/I4210150581"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"L. Sun","raw_affiliation_strings":["ATMEL Colorado Springs CO., Acton, Saitama, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ATMEL Colorado Springs CO., Acton, Saitama, USA","institution_ids":["https://openalex.org/I4210150581"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113545462","display_name":"Christophe Defranoux","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127368","display_name":"Sopra (France)","ror":"https://ror.org/02mhjkx12","country_code":"FR","type":"company","lineage":["https://openalex.org/I4210127368"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"C. Defranoux","raw_affiliation_strings":["ATMEL Colorado Springs CO., Saitama, USA","SOPRA SA, Paris, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ATMEL Colorado Springs CO., Saitama, USA","institution_ids":[]},{"raw_affiliation_string":"SOPRA SA, Paris, France","institution_ids":["https://openalex.org/I4210127368"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048829136","display_name":"Sophie Bourtault","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"S. Bourtault","raw_affiliation_strings":["ATMEL Colorado Springs CO., Saitama, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ATMEL Colorado Springs CO., Saitama, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5011307119","display_name":"P. Hendrich","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127368","display_name":"Sopra (France)","ror":"https://ror.org/02mhjkx12","country_code":"FR","type":"company","lineage":["https://openalex.org/I4210127368"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"P. Hendrich","raw_affiliation_strings":["ATMEL Colorado Springs CO., Saitama, USA","SOPRA SA, Paris, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ATMEL Colorado Springs CO., Saitama, USA","institution_ids":[]},{"raw_affiliation_string":"SOPRA SA, Paris, France","institution_ids":["https://openalex.org/I4210127368"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5110269347","display_name":"Jean Louis Stehle","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127368","display_name":"Sopra (France)","ror":"https://ror.org/02mhjkx12","country_code":"FR","type":"company","lineage":["https://openalex.org/I4210127368"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"J.-L. Stehle","raw_affiliation_strings":["ATMEL Colorado Springs CO., Saitama, USA","SOPRA SA, Paris, France"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ATMEL Colorado Springs CO., Saitama, USA","institution_ids":[]},{"raw_affiliation_string":"SOPRA SA, Paris, France","institution_ids":["https://openalex.org/I4210127368"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"452","issue":null,"first_page":"425","last_page":"432"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12050","display_name":"Optical Polarization and Ellipsometry","score":0.6298999786376953,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12050","display_name":"Optical Polarization and Ellipsometry","score":0.6298999786376953,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.1979999989271164,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.07119999825954437,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/sige-epilayers","display_name":"SiGe epilayers","score":0.8180000185966492},{"id":"https://openalex.org/keywords/infrared-spectroscopic-ellipsometry","display_name":"infrared ellipsometry","score":0.9169999957084656},{"id":"https://openalex.org/keywords/dopant-concentration-measurement","display_name":"dopant concentration measurement","score":0.7580000162124634},{"id":"https://openalex.org/keywords/boron-doping","display_name":"boron doping","score":0.7129999995231628},{"id":"https://openalex.org/keywords/carbon-incorporation","display_name":"carbon incorporation","score":0.6019999980926514},{"id":"https://openalex.org/keywords/si-cap-layer","display_name":"Si cap layer","score":0.7009999752044678},{"id":"https://openalex.org/keywords/film-thickness-uniformity","display_name":"film thickness uniformity","score":0.6449999809265137},{"id":"https://openalex.org/keywords/online-process-monitoring","display_name":"real-time process monitoring","score":0.6340000033378601}],"concepts":[{"id":"https://openalex.org/C191952053","wikidata":"https://www.wikidata.org/wiki/Q15119237","display_name":"Dopant","level":3,"score":0.7639275789260864},{"id":"https://openalex.org/C18293161","wikidata":"https://www.wikidata.org/wiki/Q898774","display_name":"Ellipsometry","level":3,"score":0.722424328327179},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6920961737632751},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.6636018753051758},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.595903217792511},{"id":"https://openalex.org/C550623735","wikidata":"https://www.wikidata.org/wiki/Q867","display_name":"Germanium","level":3,"score":0.5272708535194397},{"id":"https://openalex.org/C501308230","wikidata":"https://www.wikidata.org/wiki/Q618","display_name":"Boron","level":2,"score":0.5236082673072815},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.4822002947330475},{"id":"https://openalex.org/C153642686","wikidata":"https://www.wikidata.org/wiki/Q70906","display_name":"Infrared spectroscopy","level":2,"score":0.4274996519088745},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.3924205005168915},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.2946563959121704},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.23170334100723267},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.18906185030937195},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.16272690892219543},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/asmc.2004.1309609","doi":"https://doi.org/10.1109/asmc.2004.1309609","is_oa":false,"landing_page_url":"https://doi.org/10.1109/asmc.2004.1309609","pdf_url":null,"source":{"id":"https://openalex.org/S4210195742","display_name":"ASMC proceedings","issn_l":"1078-8743","issn":["1078-8743","2376-6697"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core"],"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1979025043","https://openalex.org/W1992833998","https://openalex.org/W1996666405","https://openalex.org/W1998510463","https://openalex.org/W2005324826","https://openalex.org/W2077067721"],"related_works":["https://openalex.org/W2103668344","https://openalex.org/W1619099940","https://openalex.org/W2014432933","https://openalex.org/W2047264364","https://openalex.org/W2064364201","https://openalex.org/W2381125698","https://openalex.org/W2009920292","https://openalex.org/W2054885022","https://openalex.org/W2010576788","https://openalex.org/W2050466406"],"abstract_inverted_index":{"The":[0,90,107],"ability":[1],"to":[2,84,144],"precisely":[3],"determine":[4],"epilayer":[5,53],"thickness":[6,54,238],"and":[7,20,32,42,55,117,155,190,197,219,239],"Ge":[8,56,181],"concentration":[9,57,68],"in":[10,101],"Si/sub":[11,86,93,110,161,167,175,186,199],"1-x/Ge/sub":[12,87,94,111,162,168,176,187,200],"x/":[13,88,95,112,163,169,177,188,201],"is":[14,27,211],"essential":[15,213],"for":[16,35,109,131,204,215,237],"calibrating":[17],"growth":[18,113],"processes":[19],"thus":[21],"control":[22],"film":[23],"quality.":[24],"Spectroscopic":[25],"ellipsometry":[26,226],"a":[28,141],"nondestructive":[29],"optical":[30],"technique":[31,233],"has":[33],"advantages":[34],"in-line":[36],"process":[37,217],"monitoring":[38],"over":[39],"SIMS,":[40],"TEM":[41],"other":[43,232],"destructive":[44],"techniques.":[45],"With":[46],"integrated":[47],"UV-Vis-IR":[48],"spectroscopic":[49,225],"ellipsometer,":[50],"not":[51],"only":[52],"can":[58],"be":[59,82],"obtained":[60],"with":[61,69,99,171,179,229],"the":[62,70,126],"UV-Vis":[63],"channel,":[64],"but":[65],"also":[66,138,208],"dopant":[67,128],"IR":[71],"channel.":[72],"Therefore,":[73],"an":[74,102,212],"advanced":[75],"SOPRA":[76],"IRSE":[77],"300":[78],"metrology":[79],"tool":[80],"will":[81],"used":[83,124],"characterize":[85],"epilayers.":[89,202],"sub":[91],"50-nm":[92],"films":[96],"were":[97,153,227],"processed":[98],"LPCVD":[100],"AMAT":[103],"5200":[104],"Centura":[105],"platform.":[106],"precursors":[108],"are":[114,158],"SiH/sub":[115],"4/":[116],"GeH/sub":[118],"4/.":[119],"B/sub":[120],"2/H/sub":[121],"6/":[122],"was":[123,137,207],"as":[125,140,235],"p-type":[127],"source":[129,143],"(B)":[130],"certain":[132],"samples.":[133],"CH/sub":[134],"3/SiH/sub":[135],"3/":[136],"utilized":[139],"carbon":[142,192],"minimize":[145],"boron":[146],"out":[147],"diffusion.":[148],"Five":[149],"types":[150],"of":[151],"samples":[152,206],"prepared":[154],"characterized,":[156],"which":[157,210],"(a)":[159],"single":[160],"layer":[164,170,178,189],"(Box),":[165],"(b)":[166],"Si":[172],"cap,":[173],"(c)":[174],"graded":[180],"concentration,":[182],"(d)":[183],"Boron":[184],"doped":[185,198],"(e)":[191],"effect":[193],"on":[194],"both":[195],"undoped":[196],"Uniformity":[203],"these":[205],"examined,":[209],"measure":[214],"improving":[216],"performance":[218],"device":[220],"yield.":[221],"Finally,":[222],"results":[223],"from":[224,231],"compared":[228],"that":[230],"such":[234],"XRD":[236],"%Ge.":[240]},"counts_by_year":[],"updated_date":"2026-10-29T09:56:32.521200","created_date":"2016-06-24T00:00:00"}