{"id":"https://openalex.org/W1527488804","doi":"https://doi.org/10.1116/1.575585","title":"Plastic flow in ion\u2010assisted deposition of refractory metals","display_name":"Plastic flow in ion\u2010assisted deposition of refractory metals","publication_year":1988,"publication_date":"1988-07-01","ids":{"openalex":"https://openalex.org/W1527488804","doi":"https://doi.org/10.1116/1.575585","mag":"1527488804"},"language":"en","primary_location":{"id":"doi:10.1116/1.575585","doi":"https://doi.org/10.1116/1.575585","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.575585","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5015958750","display_name":"B. Window","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1292875679","display_name":"Commonwealth Scientific and Industrial Research Organisation","ror":"https://ror.org/03qn8fb07","country_code":"AU","type":"government","lineage":["https://openalex.org/I1292875679","https://openalex.org/I2801453606","https://openalex.org/I4387156119"]},{"id":"https://openalex.org/I4210126632","display_name":"National Measurement Laboratory","ror":"https://ror.org/031ebne21","country_code":"AU","type":"facility","lineage":["https://openalex.org/I1292875679","https://openalex.org/I2801453606","https://openalex.org/I4210126632","https://openalex.org/I4387156119"]}],"countries":["AU"],"is_corresponding":false,"raw_author_name":"B. Window","raw_affiliation_strings":["CSIRO Division of Applied Physics, National Measurement Laboratory, Lindfield, Australia 2070"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CSIRO Division of Applied Physics, National Measurement Laboratory, Lindfield, Australia 2070","institution_ids":["https://openalex.org/I1292875679","https://openalex.org/I4210126632"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110266570","display_name":"Frank P. Sharples","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1292875679","display_name":"Commonwealth Scientific and Industrial Research Organisation","ror":"https://ror.org/03qn8fb07","country_code":"AU","type":"government","lineage":["https://openalex.org/I1292875679","https://openalex.org/I2801453606","https://openalex.org/I4387156119"]},{"id":"https://openalex.org/I4210126632","display_name":"National Measurement Laboratory","ror":"https://ror.org/031ebne21","country_code":"AU","type":"facility","lineage":["https://openalex.org/I1292875679","https://openalex.org/I2801453606","https://openalex.org/I4210126632","https://openalex.org/I4387156119"]}],"countries":["AU"],"is_corresponding":false,"raw_author_name":"F. Sharples","raw_affiliation_strings":["CSIRO Division of Applied Physics, National Measurement Laboratory, Lindfield, Australia 2070"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CSIRO Division of Applied Physics, National Measurement Laboratory, Lindfield, Australia 2070","institution_ids":["https://openalex.org/I1292875679","https://openalex.org/I4210126632"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5003951934","display_name":"Nick Savvides","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I1292875679","display_name":"Commonwealth Scientific and Industrial Research Organisation","ror":"https://ror.org/03qn8fb07","country_code":"AU","type":"government","lineage":["https://openalex.org/I1292875679","https://openalex.org/I2801453606","https://openalex.org/I4387156119"]},{"id":"https://openalex.org/I4210126632","display_name":"National Measurement Laboratory","ror":"https://ror.org/031ebne21","country_code":"AU","type":"facility","lineage":["https://openalex.org/I1292875679","https://openalex.org/I2801453606","https://openalex.org/I4210126632","https://openalex.org/I4387156119"]}],"countries":["AU"],"is_corresponding":false,"raw_author_name":"N. Savvides","raw_affiliation_strings":["CSIRO Division of Applied Physics, National Measurement Laboratory, Lindfield, Australia 2070"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CSIRO Division of Applied Physics, National Measurement Laboratory, Lindfield, Australia 2070","institution_ids":["https://openalex.org/I1292875679","https://openalex.org/I4210126632"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":6.3519,"has_fulltext":false,"cited_by_count":43,"citation_normalized_percentile":{"value":0.96006759,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"6","issue":"4","first_page":"2333","last_page":"2340"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9911999702453613,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9911999702453613,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","score":0.002400000113993883,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.0010000000474974513,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ion-assisted-deposition","display_name":"ion beam assisted deposition","score":0.9950000047683716},{"id":"https://openalex.org/keywords/refractory-metals","display_name":"refractory metals","score":0.9700000286102295},{"id":"https://openalex.org/keywords/plastic-flow","display_name":"plastic flow","score":0.9490000009536743},{"id":"https://openalex.org/keywords/thin-film-stress","display_name":"film stress","score":0.6110000014305115},{"id":"https://openalex.org/keywords/compressive-stress","display_name":"compressive stress","score":0.7689999938011169},{"id":"https://openalex.org/keywords/ion-bombardment-energy","display_name":"ion bombardment energy","score":0.9210000038146973},{"id":"https://openalex.org/keywords/lattice-parameters","display_name":"lattice parameters","score":0.6539999842643738},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.8859999775886536},{"id":"https://openalex.org/keywords/tungsten","display_name":"tungsten","score":0.6850000023841858},{"id":"https://openalex.org/keywords/tantalum","display_name":"tantalum","score":0.9760000109672546},{"id":"https://openalex.org/keywords/platinum","display_name":"platinum","score":0.5839999914169312},{"id":"https://openalex.org/keywords/niobium","display_name":"niobium","score":0.7919999957084656},{"id":"https://openalex.org/keywords/molybdenum","display_name":"molybdenum","score":0.9900000095367432},{"id":"https://openalex.org/keywords/iron","display_name":"iron","score":0.8109999895095825},{"id":"https://openalex.org/keywords/porosity","display_name":"porosity","score":0.6079999804496765}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7301425933837891},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.5602557063102722},{"id":"https://openalex.org/C95627916","wikidata":"https://www.wikidata.org/wiki/Q428932","display_name":"Refractory metals","level":2,"score":0.5567876696586609},{"id":"https://openalex.org/C118442862","wikidata":"https://www.wikidata.org/wiki/Q899143","display_name":"Ion plating","level":3,"score":0.45373740792274475},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4526214599609375},{"id":"https://openalex.org/C547737533","wikidata":"https://www.wikidata.org/wiki/Q696","display_name":"Argon","level":2,"score":0.4392704367637634},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.43162888288497925},{"id":"https://openalex.org/C544153396","wikidata":"https://www.wikidata.org/wiki/Q11426","display_name":"Metal","level":2,"score":0.43118393421173096},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.418038547039032},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.4173160195350647},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.4131159484386444},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.20799520611763},{"id":"https://openalex.org/C2781448156","wikidata":"https://www.wikidata.org/wiki/Q1570182","display_name":"Coating","level":2,"score":0.08460730314254761},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C41895202","wikidata":"https://www.wikidata.org/wiki/Q8162","display_name":"Linguistics","level":1,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/1.575585","doi":"https://doi.org/10.1116/1.575585","is_oa":false,"landing_page_url":"https://doi.org/10.1116/1.575585","pdf_url":null,"source":{"id":"https://openalex.org/S4210190837","display_name":"Journal of Vacuum Science & Technology A Vacuum Surfaces and Films","issn_l":"0734-2101","issn":["0734-2101","1520-8559"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","ki-jl-1","norway-1","poland-70","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1991971269","https://openalex.org/W2055435431","https://openalex.org/W3024488814","https://openalex.org/W2326036174","https://openalex.org/W2053021835","https://openalex.org/W1581746468","https://openalex.org/W1670236395","https://openalex.org/W1998575588","https://openalex.org/W2171352885","https://openalex.org/W1999000424"],"abstract_inverted_index":{"Ion\u2010assisted":[0],"deposition":[1],"of":[2,48,98,146,184],"refractory":[3],"metals":[4,112,136],"(Fe,":[5],"Mo,":[6,80],"Nb,":[7,79,114],"Ta,":[8,138],"W,":[9,89,137],"Pt)":[10],"was":[11,57],"studied":[12],"using":[13],"an":[14,173],"unbalanced":[15],"magnetron":[16],"source":[17],"to":[18,104],"provide":[19],"both":[20],"the":[21,26,35,46,53,59,62,67,71,99,105,109,131,156,178],"depositing":[22],"atom":[23],"flux":[24,29,32],"and":[25,45,81,85,90,101,115,139,154,167,181],"argon":[27],"ion":[28,54],"at":[30,119],"ion\u2010to\u2010atom":[31],"ratios":[33],"in":[34,61,70,96,176],"range":[36],"2\u201310.":[37],"The":[38,92,111,135,164],"films":[39,63],"were":[40,117,141],"characterized":[41],"by":[42,66,108],"x\u2010ray":[43],"diffraction":[44],"measurement":[47],"room\u2010temperature":[49],"electrical":[50],"resistivity.":[51],"As":[52],"bombardment":[55,128,157],"energy":[56,129,158],"increased,":[58],"stress":[60,106,147,166],"as":[64],"measured":[65],"lattice":[68],"parameter":[69],"growth":[72],"direction":[73],"became":[74,124],"more":[75,125,161],"compressive":[76,126,165],"for":[77,87,151],"Fe,":[78,113],"\u03b2\u2010Ta":[82],"before":[83],"decreasing,":[84],"decreased":[86],"\u03b1\u2010Ta,":[88],"Pt.":[91],"results":[93],"are":[94],"interpreted":[95],"terms":[97],"elastic":[100],"plastic":[102,152,162,169],"response":[103],"produced":[107],"bombardment.":[110],"Mo":[116],"deposited":[118,142],"a":[120,144],"low":[121,179],"stress,":[122],"which":[123],"with":[127,143],"until":[130],"metal":[132],"plastically":[133],"flowed.":[134],"Pt":[140],"level":[145],"above":[148],"that":[149],"required":[150],"flow,":[153],"increasing":[155],"just":[159],"caused":[160],"flow.":[163],"resulting":[168],"flow":[170],"could":[171],"be":[172],"important":[174],"mechanism":[175],"producing":[177],"porosity":[180],"other":[182],"behavior":[183],"ion\u2010assisted":[185],"thin":[186],"films.":[187]},"counts_by_year":[{"year":2017,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2026-10-01T08:54:57.152042","created_date":"2016-06-24T00:00:00"}