{"id":"https://openalex.org/W1499809129","doi":"https://doi.org/10.1002/0471653829.ch3","title":"Theory and Practicalities of Subwavelength Optical Lithography","display_name":"Theory and Practicalities of Subwavelength Optical Lithography","publication_year":2004,"publication_date":"2004-11-12","ids":{"openalex":"https://openalex.org/W1499809129","doi":"https://doi.org/10.1002/0471653829.ch3","mag":"1499809129"},"language":"en","primary_location":{"id":"doi:10.1002/0471653829.ch3","doi":"https://doi.org/10.1002/0471653829.ch3","is_oa":false,"landing_page_url":"https://doi.org/10.1002/0471653829.ch3","pdf_url":null,"source":{"id":"https://openalex.org/S4306464293","display_name":"Wiley eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nano\u2010CMOS Circuit and Physical Design","raw_type":"other"},"volume":{"id":"https://openalex.org/W270615609","display_name":"Nano\u2010CMOS Circuit and Physical Design"},"type":"book-chapter","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5050746850","display_name":"Ban P. Wong","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210127875","display_name":"Nvidia (United States)","ror":"https://ror.org/03jdj4y14","country_code":"US","type":"company","lineage":["https://openalex.org/I4210127875"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ban P. Wong","raw_affiliation_strings":["NVIDIA, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"NVIDIA, USA","institution_ids":["https://openalex.org/I4210127875"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069220649","display_name":"Anurag Mittal","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Anurag Mittal","raw_affiliation_strings":["Virage Logic, Inc., USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Virage Logic, Inc., USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5066499031","display_name":"Yu Cao","orcid":"https://orcid.org/0000-0002-3486-5518","observed_orcids":["https://orcid.org/0000-0002-3486-5518"]},"institutions":[{"id":"https://openalex.org/I95457486","display_name":"University of California, Berkeley","ror":"https://ror.org/01an7q238","country_code":"US","type":"education","lineage":["https://openalex.org/I95457486"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Yu Cao","raw_affiliation_strings":["University of California-Berkeley, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of California-Berkeley, USA","institution_ids":["https://openalex.org/I95457486"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5039237494","display_name":"Greg W. Starr","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I32923980","display_name":"Xilinx (United States)","ror":"https://ror.org/01rb7bk56","country_code":"US","type":"company","lineage":["https://openalex.org/I32923980"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Greg Starr","raw_affiliation_strings":["Xilinx, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Xilinx, USA","institution_ids":["https://openalex.org/I32923980"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.1540593,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"73","last_page":"133"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/resolution-enhancement-techniques","display_name":"resolution enhancement techniques","score":0.7350000143051147},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"optical proximity correction","score":0.8790000081062317},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.9580000042915344},{"id":"https://openalex.org/keywords/mask-error-factor","display_name":"mask error factor","score":0.9879999756813049},{"id":"https://openalex.org/keywords/process-variation","display_name":"process variation","score":0.48899999260902405},{"id":"https://openalex.org/keywords/critical-dimension-variation","display_name":"critical dimension variation","score":0.8289999961853027}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7319456338882446},{"id":"https://openalex.org/C182873914","wikidata":"https://www.wikidata.org/wiki/Q5157329","display_name":"Computational lithography","level":5,"score":0.7186755537986755},{"id":"https://openalex.org/C192209626","wikidata":"https://www.wikidata.org/wiki/Q190909","display_name":"Focus (optics)","level":2,"score":0.5469142198562622},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.48798173666000366},{"id":"https://openalex.org/C12713177","wikidata":"https://www.wikidata.org/wiki/Q1900281","display_name":"Perspective (graphical)","level":2,"score":0.4384796917438507},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4185755252838135},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4052850604057312},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4006238579750061},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.36614254117012024},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.25853145122528076},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.22689604759216309},{"id":"https://openalex.org/C177409738","wikidata":"https://www.wikidata.org/wiki/Q1917460","display_name":"Multiple patterning","level":4,"score":0.17107132077217102},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.15136227011680603},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1002/0471653829.ch3","doi":"https://doi.org/10.1002/0471653829.ch3","is_oa":false,"landing_page_url":"https://doi.org/10.1002/0471653829.ch3","pdf_url":null,"source":{"id":"https://openalex.org/S4306464293","display_name":"Wiley eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nano\u2010CMOS Circuit and Physical Design","raw_type":"other"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W7098597078","https://openalex.org/W1973070317","https://openalex.org/W109174641","https://openalex.org/W1979616688","https://openalex.org/W2137912174","https://openalex.org/W7099390445","https://openalex.org/W2147282201","https://openalex.org/W2354409762","https://openalex.org/W4206636848","https://openalex.org/W7096456662"],"abstract_inverted_index":{"Chapter":[0],"3":[1],"is":[2,54,109,139],"a":[3,28,97,129,142,159],"tutorial":[4],"on":[5,69,82,150],"optical":[6],"lithography":[7,126],"which":[8,118],"encompasses":[9],"the":[10,41,44,47,60,64,110,113,121,124,132,135,145,163,171],"physics":[11],"and":[12,22,34,51,101,152],"theory":[13],"of":[14,59,66,75,84,99,112,123,131,134,144],"operation":[15],"including":[16,79],"issues":[17],"associated":[18],"with":[19,27,158],"advanced":[20],"processes,":[21],"corresponding":[23],"solutions.":[24],"It":[25],"begins":[26],"brief":[29],"historical":[30],"perspective,":[31],"an":[32,57],"introduction":[33],"simple":[35],"imaging":[36,68,77],"theory.":[37],"Then":[38],"it":[39],"takes":[40],"reader":[42],"through":[43],"challenges":[45],"for":[46],"100":[48],"nm":[49],"nodes":[50],"beyond.":[52],"This":[53,138],"followed":[55,140],"by":[56,141],"overview":[58],"significant":[61],"process":[62,70],"variations,":[63],"impact":[65],"low-\u03ba":[67,76],"sensitivities.":[71],"A":[72],"detailed":[73],"discussion":[74,143],"follows,":[78],"its":[80],"effect":[81],"depth":[83],"focus;":[85],"exposure":[86],"tolerance;":[87],"mask":[88],"error":[89],"factor;":[90],"sensitivity":[91],"to":[92,128],"aberrations;":[93],"CD":[94],"variation":[95],"as":[96,168,170],"function":[98],"pitch;":[100],"corner":[102],"rounding":[103],"radius.":[104],"The":[105,155],"next":[106],"topic":[107],"covered":[108],"state":[111],"art":[114],"resolution":[115,122],"enhancement":[116],"techniques":[117],"will":[119],"extend":[120],"current":[125],"down":[127],"quarter":[130],"wave-length":[133],"illumination":[136],"used.":[137],"Physical":[146],"Design":[147],"Style":[148],"Impact":[149],"RET":[151],"OPC":[153],"Complexity.":[154],"chapter":[156],"concludes":[157],"look":[160],"ahead":[161],"into":[162],"future":[164],"Lithography":[165],"Technologies\u2014the":[166],"evolutionary":[167],"well":[169],"revolutionary":[172],"road":[173],"maps.":[174]},"counts_by_year":[],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}