{"id":"https://openalex.org/W1487069997","doi":"https://doi.org/10.1038/21602","title":"The electronic structure at the atomic scale of ultrathin gate oxides","display_name":"The electronic structure at the atomic scale of ultrathin gate oxides","publication_year":1999,"publication_date":"1999-06-01","ids":{"openalex":"https://openalex.org/W1487069997","doi":"https://doi.org/10.1038/21602","mag":"1487069997"},"language":"en","primary_location":{"id":"doi:10.1038/21602","doi":"https://doi.org/10.1038/21602","is_oa":false,"landing_page_url":"https://doi.org/10.1038/21602","pdf_url":null,"source":{"id":"https://openalex.org/S137773608","display_name":"Nature","issn_l":"0028-0836","issn":["0028-0836","1476-4687"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-class-a","anvur-scientific","cwts-core","dongbi-a","doyens","erih-plus","jufo-3","ki-jl-3","medline","norway-2","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310319908","host_organization_name":"Nature Portfolio","host_organization_lineage":["https://openalex.org/P4310319908","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Nature Portfolio","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nature","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5042016235","display_name":"David Anthony Muller","orcid":"https://orcid.org/0000-0003-4129-0473","observed_orcids":["https://orcid.org/0000-0003-4129-0473"]},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"D. A. Muller","raw_affiliation_strings":["Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","Bell Laboratories-Lucent Technologies, Murray Hill, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","institution_ids":[]},{"raw_affiliation_string":"Bell Laboratories-Lucent Technologies, Murray Hill, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061585648","display_name":"T. Sorsch","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"T. Sorsch","raw_affiliation_strings":["Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","Bell Laboratories-Lucent Technologies, Murray Hill, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","institution_ids":[]},{"raw_affiliation_string":"Bell Laboratories-Lucent Technologies, Murray Hill, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054281432","display_name":"S. V. Moccio","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"S. Moccio","raw_affiliation_strings":["Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","Bell Laboratories-Lucent Technologies, Murray Hill, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","institution_ids":[]},{"raw_affiliation_string":"Bell Laboratories-Lucent Technologies, Murray Hill, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076949285","display_name":"Frieder H. Baumann","orcid":"https://orcid.org/0000-0002-8061-7646","observed_orcids":["https://orcid.org/0000-0002-8061-7646"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"F. H. Baumann","raw_affiliation_strings":["Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","Bell Laboratories-Lucent Technologies, Murray Hill, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","institution_ids":[]},{"raw_affiliation_string":"Bell Laboratories-Lucent Technologies, Murray Hill, USA","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5037669561","display_name":"Kenneth Evans\u2010Lutterodt","orcid":"https://orcid.org/0000-0003-4743-4888","observed_orcids":["https://orcid.org/0000-0003-4743-4888"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"K. Evans-Lutterodt","raw_affiliation_strings":["Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","Bell Laboratories-Lucent Technologies, Murray Hill, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","institution_ids":[]},{"raw_affiliation_string":"Bell Laboratories-Lucent Technologies, Murray Hill, USA","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5016484755","display_name":"Gregory L. Timp","orcid":"https://orcid.org/0000-0003-4418-5679","observed_orcids":["https://orcid.org/0000-0003-4418-5679"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"G. Timp","raw_affiliation_strings":["Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","Bell Laboratories-Lucent Technologies, Murray Hill, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Bell Laboratories, Lucent Technologies, Murray Hill, 07974, New Jersey, USA","institution_ids":[]},{"raw_affiliation_string":"Bell Laboratories-Lucent Technologies, Murray Hill, USA","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":["https://openalex.org/A5042016235"],"corresponding_institution_ids":[],"apc_list":{"value":12690,"currency":"USD","value_usd":12690},"apc_paid":null,"fwci":82.0854,"has_fulltext":false,"cited_by_count":986,"citation_normalized_percentile":{"value":0.99984347,"is_in_top_1_percent":true,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":99,"max":100},"biblio":{"volume":"399","issue":"6738","first_page":"758","last_page":"761"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9878000020980835,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9878000020980835,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.005400000140070915,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10857","display_name":"Advanced Electron Microscopy Techniques and Applications","score":0.0010000000474974513,"subfield":{"id":"https://openalex.org/subfields/1315","display_name":"Structural Biology"},"field":{"id":"https://openalex.org/fields/13","display_name":"Biochemistry, Genetics and Molecular Biology"},"domain":{"id":"https://openalex.org/domains/1","display_name":"Life Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ultrathin-gate-oxide","display_name":"ultra-thin gate oxide","score":0.906000018119812},{"id":"https://openalex.org/keywords/silica","display_name":"silica","score":0.9480000138282776},{"id":"https://openalex.org/keywords/electronic-structure","display_name":"electronic structure","score":0.5730000138282776},{"id":"https://openalex.org/keywords/si-sio2-interface","display_name":"Si/SiO2 interface","score":0.6940000057220459},{"id":"https://openalex.org/keywords/interfacial-states","display_name":"interfacial states","score":0.9150000214576721},{"id":"https://openalex.org/keywords/interface-roughness","display_name":"interface roughness","score":0.9079999923706055},{"id":"https://openalex.org/keywords/chemical-composition","display_name":"chemical composition","score":0.5509999990463257},{"id":"https://openalex.org/keywords/electron-energy-loss-spectroscopy","display_name":"electron energy loss spectroscopy","score":0.7459999918937683},{"id":"https://openalex.org/keywords/scanning-transmission-electron-microscopy","display_name":"scanning transmission electron microscopy","score":0.7620000243186951},{"id":"https://openalex.org/keywords/field-effect-devices","display_name":"field-effect devices","score":0.5709999799728394},{"id":"https://openalex.org/keywords/integrated-circuit-miniaturization","display_name":"integrated circuit miniaturization","score":0.8080000281333923}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6639466881752014},{"id":"https://openalex.org/C2361726","wikidata":"https://www.wikidata.org/wiki/Q5527031","display_name":"Gate oxide","level":4,"score":0.6613707542419434},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6234816312789917},{"id":"https://openalex.org/C166972891","wikidata":"https://www.wikidata.org/wiki/Q5527011","display_name":"Gate dielectric","level":4,"score":0.5665966272354126},{"id":"https://openalex.org/C2779089622","wikidata":"https://www.wikidata.org/wiki/Q116269","display_name":"Silicon dioxide","level":2,"score":0.5646752715110779},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.5632765889167786},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5537060499191284},{"id":"https://openalex.org/C52780932","wikidata":"https://www.wikidata.org/wiki/Q994752","display_name":"Equivalent oxide thickness","level":5,"score":0.49956774711608887},{"id":"https://openalex.org/C2779105228","wikidata":"https://www.wikidata.org/wiki/Q2286029","display_name":"Silicon oxide","level":4,"score":0.48510682582855225},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.45588430762290955},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4474430978298187},{"id":"https://openalex.org/C66823137","wikidata":"https://www.wikidata.org/wiki/Q757568","display_name":"Atomic units","level":2,"score":0.42431554198265076},{"id":"https://openalex.org/C77066764","wikidata":"https://www.wikidata.org/wiki/Q178674","display_name":"Nanometre","level":2,"score":0.41457316279411316},{"id":"https://openalex.org/C192245399","wikidata":"https://www.wikidata.org/wiki/Q772250","display_name":"Strained silicon","level":5,"score":0.4134840965270996},{"id":"https://openalex.org/C2779667780","wikidata":"https://www.wikidata.org/wiki/Q18206302","display_name":"Crystalline silicon","level":3,"score":0.24213334918022156},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.1304090917110443},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.1168767511844635},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09699386358261108},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.07029029726982117},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C2777431650","wikidata":"https://www.wikidata.org/wiki/Q413828","display_name":"Silicon nitride","level":3,"score":0.0},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.0},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C2776390347","wikidata":"https://www.wikidata.org/wiki/Q474163","display_name":"Amorphous silicon","level":4,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1038/21602","doi":"https://doi.org/10.1038/21602","is_oa":false,"landing_page_url":"https://doi.org/10.1038/21602","pdf_url":null,"source":{"id":"https://openalex.org/S137773608","display_name":"Nature","issn_l":"0028-0836","issn":["0028-0836","1476-4687"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-class-a","anvur-scientific","cwts-core","dongbi-a","doyens","erih-plus","jufo-3","ki-jl-3","medline","norway-2","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310319908","host_organization_name":"Nature Portfolio","host_organization_lineage":["https://openalex.org/P4310319908","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Nature Portfolio","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nature","raw_type":"journal-article"},{"id":"pmh:oai:RePEc:nat:nature:v:399:y:1999:i:6738:d:10.1038_21602","doi":null,"is_oa":false,"landing_page_url":"https://www.nature.com/articles/21602","pdf_url":null,"source":{"id":"https://openalex.org/S4306401271","display_name":"RePEc: Research Papers in Economics","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I77793887","host_organization_name":"Federal Reserve Bank of St. Louis","host_organization_lineage":["https://openalex.org/I77793887"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":22,"referenced_works":["https://openalex.org/W1521045116","https://openalex.org/W1570878024","https://openalex.org/W1963887314","https://openalex.org/W1964939344","https://openalex.org/W1981013200","https://openalex.org/W1981341546","https://openalex.org/W1984112249","https://openalex.org/W1988722541","https://openalex.org/W1990522939","https://openalex.org/W1992447612","https://openalex.org/W2001750987","https://openalex.org/W2029035749","https://openalex.org/W2030383355","https://openalex.org/W2060391937","https://openalex.org/W2071342387","https://openalex.org/W2080466540","https://openalex.org/W2118620985","https://openalex.org/W2127337789","https://openalex.org/W2273886880","https://openalex.org/W2572687589","https://openalex.org/W3023747339","https://openalex.org/W4301524803"],"related_works":["https://openalex.org/W41457098","https://openalex.org/W1991471897","https://openalex.org/W1011777387","https://openalex.org/W1998991681","https://openalex.org/W7097273967","https://openalex.org/W1625743584","https://openalex.org/W2065247666","https://openalex.org/W1990821540","https://openalex.org/W3038221467","https://openalex.org/W139290974"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":12},{"year":2025,"cited_by_count":9},{"year":2024,"cited_by_count":15},{"year":2023,"cited_by_count":14},{"year":2022,"cited_by_count":22},{"year":2021,"cited_by_count":18},{"year":2020,"cited_by_count":24},{"year":2019,"cited_by_count":17},{"year":2018,"cited_by_count":25},{"year":2017,"cited_by_count":28},{"year":2016,"cited_by_count":25},{"year":2015,"cited_by_count":28},{"year":2014,"cited_by_count":26},{"year":2013,"cited_by_count":29},{"year":2012,"cited_by_count":37}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2016-06-24T00:00:00"}