{"id":"https://openalex.org/W1482221978","doi":"https://doi.org/10.1063/1.2435336","title":"Electrical properties of Bi2Mg2\u22153Nb4\u22153O7 (BMN) pyrochlore thin films deposited on Pt and Cu metal at low temperatures for embedded capacitor applications","display_name":"Electrical properties of Bi2Mg2\u22153Nb4\u22153O7 (BMN) pyrochlore thin films deposited on Pt and Cu metal at low temperatures for embedded capacitor applications","publication_year":2007,"publication_date":"2007-01-29","ids":{"openalex":"https://openalex.org/W1482221978","doi":"https://doi.org/10.1063/1.2435336","mag":"1482221978"},"language":"en","primary_location":{"id":"doi:10.1063/1.2435336","doi":"https://doi.org/10.1063/1.2435336","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.2435336","pdf_url":null,"source":{"id":"https://openalex.org/S105243760","display_name":"Applied Physics Letters","issn_l":"0003-6951","issn":["0003-6951","1077-3118","1520-8842"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-3","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics Letters","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5040855527","display_name":"Cheng-Ji Xian","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I196345858","display_name":"Chungnam National University","ror":"https://ror.org/0227as991","country_code":"KR","type":"education","lineage":["https://openalex.org/I196345858"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Cheng-Ji Xian","raw_affiliation_strings":["Chungnam National University School of Nano Science and Technology, , Daeduk Science Town, Daejeon 305-764, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chungnam National University School of Nano Science and Technology, , Daeduk Science Town, Daejeon 305-764, Korea","institution_ids":["https://openalex.org/I196345858"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100645977","display_name":"Jong Hyun Park","orcid":"https://orcid.org/0009-0001-8005-7597","observed_orcids":["https://orcid.org/0009-0001-8005-7597","https://orcid.org/0009-0001-5311-922X"]},"institutions":[{"id":"https://openalex.org/I196345858","display_name":"Chungnam National University","ror":"https://ror.org/0227as991","country_code":"KR","type":"education","lineage":["https://openalex.org/I196345858"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jong-Hyun Park","raw_affiliation_strings":["Chungnam National University School of Nano Science and Technology, , Daeduk Science Town, Daejeon 305-764, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chungnam National University School of Nano Science and Technology, , Daeduk Science Town, Daejeon 305-764, Korea","institution_ids":["https://openalex.org/I196345858"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110110337","display_name":"Kyung-Chan Ahn","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I196345858","display_name":"Chungnam National University","ror":"https://ror.org/0227as991","country_code":"KR","type":"education","lineage":["https://openalex.org/I196345858"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Kyung-Chan Ahn","raw_affiliation_strings":["Chungnam National University School of Nano Science and Technology, , Daeduk Science Town, Daejeon 305-764, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chungnam National University School of Nano Science and Technology, , Daeduk Science Town, Daejeon 305-764, Korea","institution_ids":["https://openalex.org/I196345858"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028567565","display_name":"Soon\u2010Gil Yoon","orcid":"https://orcid.org/0000-0002-5404-9876","observed_orcids":["https://orcid.org/0000-0002-5404-9876"]},"institutions":[{"id":"https://openalex.org/I196345858","display_name":"Chungnam National University","ror":"https://ror.org/0227as991","country_code":"KR","type":"education","lineage":["https://openalex.org/I196345858"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Soon-Gil Yoon","raw_affiliation_strings":["Chungnam National University School of Nano Science and Technology, , Daeduk Science Town, Daejeon 305-764, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chungnam National University School of Nano Science and Technology, , Daeduk Science Town, Daejeon 305-764, Korea","institution_ids":["https://openalex.org/I196345858"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100672938","display_name":"Jeong\u2010Won Lee","orcid":"https://orcid.org/0000-0001-9207-7678","observed_orcids":["https://orcid.org/0000-0001-9207-7678"]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jeong-Won Lee","raw_affiliation_strings":["Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5084676284","display_name":"Woon-Chun Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Woon-Chun Kim","raw_affiliation_strings":["Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108473927","display_name":"Sung-Taek Lim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sung-Taek Lim","raw_affiliation_strings":["Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Seung-Hyun Sohn","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seung-Hyun Sohn","raw_affiliation_strings":["Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109148708","display_name":"Jin-Seok Moon","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jin-Seok Moon","raw_affiliation_strings":["Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5025677161","display_name":"Hyung-Mi Jung","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hyung-Mi Jung","raw_affiliation_strings":["Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101830814","display_name":"Seung\u2010Eun Lee","orcid":"https://orcid.org/0000-0002-5734-5961","observed_orcids":["https://orcid.org/0000-0002-5734-5961"]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seung-Eun Lee","raw_affiliation_strings":["Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102131841","display_name":"In-Hyung Lee","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"In-Hyung Lee","raw_affiliation_strings":["Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052024344","display_name":"Yul-Kyo Chung","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Yul-Kyo Chung","raw_affiliation_strings":["Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Samsung Electro-Mechanics Co. Ltd. , 314 Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Korea","institution_ids":["https://openalex.org/I2250650973"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5087308454","display_name":"Min-Ku Jeon","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Min-Ku Jeon","raw_affiliation_strings":["Korea Advanced Institute of Science and Technology Center for Ultramicrochemical Process Systems, , 373-1 Kusong-Dong, Yusong-Gu, Daejeon 305-701, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Korea Advanced Institute of Science and Technology Center for Ultramicrochemical Process Systems, , 373-1 Kusong-Dong, Yusong-Gu, Daejeon 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113458255","display_name":"Seong-Ihl Woo","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seong-Ihl Woo","raw_affiliation_strings":["Korea Advanced Institute of Science and Technology Center for Ultramicrochemical Process Systems, , 373-1 Kusong-Dong, Yusong-Gu, Daejeon 305-701, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Korea Advanced Institute of Science and Technology Center for Ultramicrochemical Process Systems, , 373-1 Kusong-Dong, Yusong-Gu, Daejeon 305-701, Korea","institution_ids":["https://openalex.org/I157485424"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":1.7188,"has_fulltext":false,"cited_by_count":24,"citation_normalized_percentile":{"value":0.82478416,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":96},"biblio":{"volume":"90","issue":"5","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10107","display_name":"Ferroelectric and Piezoelectric Materials","score":0.9330999851226807,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10107","display_name":"Ferroelectric and Piezoelectric Materials","score":0.9330999851226807,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12155","display_name":"Microwave Dielectric Ceramics Synthesis","score":0.03020000085234642,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10886","display_name":"Multiferroics and related materials","score":0.014000000432133675,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/dielectric-constant","display_name":"dielectric constant","score":0.7429999709129333},{"id":"https://openalex.org/keywords/dielectric-loss","display_name":"dielectric loss","score":0.9010000228881836},{"id":"https://openalex.org/keywords/dielectric-strength","display_name":"dielectric strength","score":0.9110000133514404},{"id":"https://openalex.org/keywords/capacitance-density","display_name":"capacitance density","score":0.7179999947547913},{"id":"https://openalex.org/keywords/deposition-temperature","display_name":"deposition temperature","score":0.6629999876022339},{"id":"https://openalex.org/keywords/platinum-electrode","display_name":"platinum electrode","score":0.6019999980926514},{"id":"https://openalex.org/keywords/copper-electrode","display_name":"copper electrode","score":0.9980000257492065},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.8659999966621399},{"id":"https://openalex.org/keywords/secondary-phase-formation","display_name":"secondary phase formation","score":0.8059999942779541},{"id":"https://openalex.org/keywords/embedded-capacitors","display_name":"embedded capacitors","score":0.8880000114440918},{"id":"https://openalex.org/keywords/pulsed-laser-deposition","display_name":"pulsed laser deposition","score":0.8450000286102295}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8034263253211975},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.7186468243598938},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.6449025869369507},{"id":"https://openalex.org/C37982897","wikidata":"https://www.wikidata.org/wiki/Q901321","display_name":"Pulsed laser deposition","level":3,"score":0.6436268091201782},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.6224736571311951},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.511017918586731},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.4966912865638733},{"id":"https://openalex.org/C2779303976","wikidata":"https://www.wikidata.org/wiki/Q417202","display_name":"Pyrochlore","level":3,"score":0.4714066982269287},{"id":"https://openalex.org/C30066665","wikidata":"https://www.wikidata.org/wiki/Q164399","display_name":"Capacitance","level":3,"score":0.44535428285598755},{"id":"https://openalex.org/C91066073","wikidata":"https://www.wikidata.org/wiki/Q1417868","display_name":"Dielectric loss","level":3,"score":0.4256889224052429},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.20475637912750244},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.14709186553955078},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.10406160354614258},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C44280652","wikidata":"https://www.wikidata.org/wiki/Q104837","display_name":"Phase (matter)","level":2,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1063/1.2435336","doi":"https://doi.org/10.1063/1.2435336","is_oa":false,"landing_page_url":"https://doi.org/10.1063/1.2435336","pdf_url":null,"source":{"id":"https://openalex.org/S105243760","display_name":"Applied Physics Letters","issn_l":"0003-6951","issn":["0003-6951","1077-3118","1520-8842"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-3","ki-jl-1","norway-2","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Physics Letters","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":12,"referenced_works":["https://openalex.org/W1578228524","https://openalex.org/W1636073591","https://openalex.org/W1934960924","https://openalex.org/W1996513699","https://openalex.org/W2006508775","https://openalex.org/W2021832355","https://openalex.org/W2039862640","https://openalex.org/W2076021068","https://openalex.org/W2082443998","https://openalex.org/W2087843226","https://openalex.org/W2100295141","https://openalex.org/W2167170316"],"related_works":["https://openalex.org/W1636073591","https://openalex.org/W854831275","https://openalex.org/W2099956045","https://openalex.org/W1982980603","https://openalex.org/W2161508862","https://openalex.org/W867274733","https://openalex.org/W1993436120","https://openalex.org/W1979297013","https://openalex.org/W1993815118","https://openalex.org/W2066561390"],"abstract_inverted_index":{"200":[0],"-":[1],"nm":[2],"-thick":[3],"BMN":[4,83,111],"films":[5,28,50,64,84,89,112],"were":[6],"deposited":[7,29,51,90],"on":[8,30,52,65,85,91],"Pt\u2215TiO2\u2215SiO2\u2215Si":[9],"and":[10,23,32,113],"Cu\u2215Ti\u2215SiO2\u2215Si":[11],"substrates":[12],"at":[13,108],"various":[14],"temperatures":[15],"by":[16,102],"pulsed":[17],"laser":[18],"deposition.":[19],"The":[20,76],"dielectric":[21,46,61],"constant":[22],"capacitance":[24],"density":[25],"of":[26,48,63,79,99,105],"the":[27,43,49,72,97,103],"Pt":[31,66,86,114],"Cu":[33,53,92],"electrodes":[34],"show":[35],"similar":[36],"tendency":[37],"with":[38],"increasing":[39],"deposition":[40,73],"temperature.":[41],"On":[42],"other":[44],"hand,":[45],"loss":[47,62],"electrode":[54,93],"varies":[55],"from":[56],"0.7%":[57],"to":[58,88,96],"1.3%,":[59],"while":[60],"constantly":[67],"shows":[68],"0.2%":[69],"even":[70],"though":[71],"temperature":[74],"increases.":[75],"low":[77],"value":[78],"breakdown":[80],"strength":[81],"in":[82],"compared":[87],"was":[94],"attributed":[95],"increase":[98],"surface":[100],"roughness":[101],"formation":[104],"secondary":[106],"phases":[107],"interface":[109],"between":[110],"electrodes.":[115]},"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2017,"cited_by_count":1},{"year":2016,"cited_by_count":2},{"year":2015,"cited_by_count":2},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":2}],"updated_date":"2026-10-12T09:40:04.860316","created_date":"2016-06-24T00:00:00"}