{"id":"https://openalex.org/A5117564656","orcid":"https://orcid.org/0009-0003-9981-2446","observed_orcids":["https://orcid.org/0009-0003-9981-2446"],"display_name":"Lukas P. Lingenfelder","raw_author_names":["L.P. Lingenfelder","Lukas P. Lingenfelder","Lukas Paul Lingenfelder"],"full_name":"Lukas P. Lingenfelder","works_count":3,"cited_by_count":3,"summary_stats":{"2yr_mean_citedness":1.0,"h_index":1,"i10_index":0},"ids":{"openalex":"https://openalex.org/A5117564656","orcid":"https://orcid.org/0009-0003-9981-2446","observed_orcids":["https://orcid.org/0009-0003-9981-2446"]},"affiliations":[{"institution":{"id":"https://openalex.org/I4210156779","ror":"https://ror.org/04vx4mk32","display_name":"Leibniz Institute of Surface Engineering","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I4210156779"]},"years":[2026,2025]}],"last_known_institutions":[{"id":"https://openalex.org/I4210156779","ror":"https://ror.org/04vx4mk32","display_name":"Leibniz Institute of Surface Engineering","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I4210156779"]}],"topics":[{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","count":3,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","count":2,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","count":2,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":1,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":1,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","value":1.73e-05,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","value":1.57e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":1.06e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":9.3e-06,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","value":3.3e-06,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"180088628","wikidata":"https://www.wikidata.org/wiki/Q1069404","display_name":"Chemical-mechanical planarization","score":0.8863000273704529},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8009999990463257},{"id":"100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","score":0.6344512701034546},{"id":"50774322","wikidata":"https://www.wikidata.org/wiki/Q644248","display_name":"Ion beam","score":0.592199981212616},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.5450999736785889}],"counts_by_year":[{"year":2025,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2026,"works_count":2,"oa_works_count":2,"cited_by_count":3}],"display_name_alternatives":["L.P. Lingenfelder","Lukas P. Lingenfelder","Lukas Paul Lingenfelder"],"block_key":"l lingenfelder","works_api_url":"https://api.openalex.org/works?filter=author.id:A5117564656","awards_count":0,"updated_date":"2026-11-01T11:00:13","created_date":"2025-05-17T00:00:00"}