{"id":"https://openalex.org/A5113879874","orcid":null,"observed_orcids":[],"display_name":"Takuya Hagiwara","raw_author_names":["Takuya Hagiwara"],"full_name":"HAGIWARA, Takuya","works_count":33,"cited_by_count":100,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":6,"i10_index":1},"ids":{"openalex":"https://openalex.org/A5113879874","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I4210153176","ror":"https://ror.org/058wb7691","display_name":"Renesas Electronics (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210153176"]},"years":[2015,2011,2010,2009,2008,2007]},{"institution":{"id":"https://openalex.org/I4405276234","ror":"https://ror.org/0523jgb37","display_name":"Semiconductor Leading Edge Technologies, Inc (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405276234"]},"years":[2006,2005,2004,2003]},{"institution":{"id":"https://openalex.org/I65143321","ror":"https://ror.org/02exqgm79","display_name":"Hitachi (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]},"years":[2002,2001,2000]}],"last_known_institutions":null,"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":30,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":13,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":11,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12084","display_name":"Synthesis and properties of polymers","count":9,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","count":7,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0002778,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":0.0001382,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","value":8.18e-05,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12084","display_name":"Synthesis and properties of polymers","value":7.72e-05,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":4.65e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","score":0.9915899038314819},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.816857635974884},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.5965864658355713},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.5647915601730347},{"id":"2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","score":0.5548836588859558}],"counts_by_year":[{"year":2000,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2001,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":5,"oa_works_count":2,"cited_by_count":0},{"year":2004,"works_count":7,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":5,"oa_works_count":2,"cited_by_count":0},{"year":2009,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2011,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2015,"works_count":1,"oa_works_count":1,"cited_by_count":4},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":8},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2018,"works_count":1,"oa_works_count":0,"cited_by_count":3},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":7},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":2}],"display_name_alternatives":["Takuya Hagiwara"],"block_key":"t hagiwara","works_api_url":"https://api.openalex.org/works?filter=author.id:A5113879874","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}