{"id":"https://openalex.org/A5113623941","orcid":null,"observed_orcids":[],"display_name":"T. Kunio","raw_author_names":["Kunio, T","T Kunio","T. KUNIO","T. Kunio","Takemitsu KUNIO","Takemitsu Kunio","Takemitsu Kunio Takemitsu Kunio"],"full_name":"Takemitsu Kunio Takemitsu Kunio","works_count":108,"cited_by_count":1295,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":21,"i10_index":44},"ids":{"openalex":"https://openalex.org/A5113623941","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I116465919","ror":"https://ror.org/01wc2tq75","display_name":"Kogakuin University","country_code":"JP","type":"education","lineage":["https://openalex.org/I116465919"]},"years":[1985]},{"institution":{"id":"https://openalex.org/I118347220","ror":"https://ror.org/04jndar25","display_name":"NEC (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]},"years":[2009,2004,2003,2002,2001,2000,1999,1998,1997,1996,1993,1992,1991,1990,1988,1987]},{"institution":{"id":"https://openalex.org/I125852741","ror":"https://ror.org/02ws33e43","display_name":"Kanazawa Institute of Technology","country_code":"JP","type":"education","lineage":["https://openalex.org/I125852741"]},"years":[1983]},{"institution":{"id":"https://openalex.org/I1325736334","ror":"https://ror.org/01h5tnr73","display_name":"Battelle","country_code":"US","type":"nonprofit","lineage":["https://openalex.org/I1325736334"]},"years":[1982]},{"institution":{"id":"https://openalex.org/I157090871","ror":"https://ror.org/05q041y44","display_name":"Kokugakuin University","country_code":"JP","type":"education","lineage":["https://openalex.org/I157090871"]},"years":[1985]},{"institution":{"id":"https://openalex.org/I173915773","ror":"https://ror.org/03cxys317","display_name":"Yamaguchi University","country_code":"JP","type":"education","lineage":["https://openalex.org/I173915773"]},"years":[1982]},{"institution":{"id":"https://openalex.org/I197507943","ror":"https://ror.org/03yskk486","display_name":"Sumitomo Heavy Industries (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I197507943"]},"years":[1982]},{"institution":{"id":"https://openalex.org/I203951103","ror":"https://ror.org/02kn6nx58","display_name":"Keio University","country_code":"JP","type":"education","lineage":["https://openalex.org/I203951103"]},"years":[1988,1986,1985,1984,1983,1982,1981,1980,1979,1975,1973,1969]},{"institution":{"id":"https://openalex.org/I2801240501","ror":"https://ror.org/00146wx41","display_name":"Japan Steel Works (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I2801240501"]},"years":[1982]},{"institution":{"id":"https://openalex.org/I4210101228","ror":"https://ror.org/018nb9n34","display_name":"IHI Corporation (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210101228"]},"years":[1982]},{"institution":{"id":"https://openalex.org/I4210130036","ror":"https://ror.org/03qemwx69","display_name":"Wolters Kluwer (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210130036"]},"years":[1982]},{"institution":{"id":"https://openalex.org/I4210146667","ror":"https://ror.org/044mkdq33","display_name":"Ajinomoto (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210146667"]},"years":[1982]},{"institution":{"id":"https://openalex.org/I60134161","ror":"https://ror.org/04chrp450","display_name":"Nagoya University","country_code":"JP","type":"education","lineage":["https://openalex.org/I60134161"]},"years":[2002]},{"institution":{"id":"https://openalex.org/I98083888","ror":"https://ror.org/05qp61e83","display_name":"Musashi University","country_code":"JP","type":"education","lineage":["https://openalex.org/I98083888"]},"years":[1979]}],"last_known_institutions":[{"id":"https://openalex.org/I118347220","ror":"https://ror.org/04jndar25","display_name":"NEC (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I118347220"]}],"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":54,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":31,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":24,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","count":22,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10396","display_name":"Fatigue and fracture mechanics","count":20,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","value":0.0002397,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","value":0.0001149,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","value":0.0001119,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","value":8.27e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","value":7.9e-05,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.9169632196426392},{"id":"159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","score":0.798592209815979},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.6477823257446289},{"id":"119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","score":0.5310816168785095},{"id":"127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","score":0.4026593267917633}],"counts_by_year":[{"year":1969,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":1973,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1974,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1975,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1978,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":1979,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":1980,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1981,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":1982,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1983,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1984,"works_count":8,"oa_works_count":2,"cited_by_count":0},{"year":1985,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1986,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1987,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1988,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1990,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1991,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":1992,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":1993,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":1994,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1995,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1996,"works_count":6,"oa_works_count":1,"cited_by_count":0},{"year":1997,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":1998,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1999,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2001,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":25,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":22},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":25},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":27},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":27},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":21},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":25},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":19},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":10},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":14},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":17},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":15},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":16},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":14},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":5}],"display_name_alternatives":["Kunio, T","T Kunio","T. KUNIO","T. Kunio","Takemitsu KUNIO","Takemitsu Kunio","Takemitsu Kunio Takemitsu Kunio"],"block_key":"t kunio","works_api_url":"https://api.openalex.org/works?filter=author.id:A5113623941","awards_count":0,"updated_date":"2026-11-08T12:57:04","created_date":"2016-06-24T00:00:00"}