{"id":"https://openalex.org/A5113587444","orcid":null,"observed_orcids":[],"display_name":"Jeffrey A. Gregus","raw_author_names":["J. A. Gregus","J. Gregus","J. Gregu\u0161","J.A Gregus","J.A. Gregus","Jeffrey A. Gregus"],"full_name":"Jeffrey A. Gregus","works_count":25,"cited_by_count":466,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":11,"i10_index":12},"ids":{"openalex":"https://openalex.org/A5113587444","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I1283103587","ror":"https://ror.org/02bbd5539","display_name":"AT&T (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]},"years":[2005,1995,1993,1992,1991,1990]},{"institution":{"id":"https://openalex.org/I4387152956","ror":"https://ror.org/024850w61","display_name":"Alcatel-Lucent (France)","country_code":"FR","type":"company","lineage":["https://openalex.org/I2738502077","https://openalex.org/I4210149358","https://openalex.org/I4387152956"]},"years":[2002,1998]},{"institution":{"id":"https://openalex.org/I74788687","ror":"https://ror.org/0587ef340","display_name":"Comenius University Bratislava","country_code":"SK","type":"education","lineage":["https://openalex.org/I74788687"]},"years":[2006,2005]}],"last_known_institutions":null,"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","count":11,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":8,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":6,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","count":5,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","count":4,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":7.4e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","value":4.73e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":3.77e-05,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","value":1.71e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10460","display_name":"Electronic Packaging and Soldering Technologies","value":1.7e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.7574546337127686},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.7083607316017151},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.4336675703525543},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.3553721606731415},{"id":"2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","score":0.15889695286750793}],"counts_by_year":[{"year":1990,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1991,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1992,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1993,"works_count":6,"oa_works_count":1,"cited_by_count":0},{"year":1995,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1997,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1998,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1999,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":1,"oa_works_count":0,"cited_by_count":7},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":10},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":13},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":7},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":8},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":5}],"display_name_alternatives":["J. A. Gregus","J. Gregus","J. Gregu\u0161","J.A Gregus","J.A. Gregus","Jeffrey A. Gregus"],"block_key":"j gregus","works_api_url":"https://api.openalex.org/works?filter=author.id:A5113587444","awards_count":0,"updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}