{"id":"https://openalex.org/A5113576594","orcid":null,"observed_orcids":[],"display_name":"Michael C. Smayling","raw_author_names":["M SMAYLING","M. C. Smayling","M. Smayling","M.C. Smayling","Michael C. Smayling","Michael C. Smayling Michael C. Smayling","Michael Smayling"],"full_name":"Michael C. Smayling Michael C. Smayling","works_count":85,"cited_by_count":960,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":16,"i10_index":27},"ids":{"openalex":"https://openalex.org/A5113576594","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I193427800","ror":"https://ror.org/04h1q4c89","display_name":"Applied Materials (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]},"years":[2006,2004]},{"institution":{"id":"https://openalex.org/I4210147385","ror":"https://ror.org/03wbd7629","display_name":"Tela Innovations (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4210147385"]},"years":[2016,2015,2014,2013,2012,2011,2010,2009,2008,2007]},{"institution":{"id":"https://openalex.org/I74760111","ror":"https://ror.org/03vsmv677","display_name":"Texas Instruments (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I74760111"]},"years":[2002,1998,1997,1995,1993,1991,1989,1985,1984,1983]},{"institution":{"id":"https://openalex.org/I74775410","ror":"https://ror.org/008zs3103","display_name":"Rice University","country_code":"US","type":"education","lineage":["https://openalex.org/I74775410"]},"years":[2005,2000,1999,1998,1997,1996,1995,1994,1993,1991,1984,1981,1980]}],"last_known_institutions":[{"id":"https://openalex.org/I4210147385","ror":"https://ror.org/03wbd7629","display_name":"Tela Innovations (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4210147385"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":48,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","count":28,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":24,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","count":14,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":12,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0004443,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","value":0.0001408,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","value":0.0001373,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":0.0001013,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":9.04e-05,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8207535743713379},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.7544253468513489},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.6616743803024292},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.5489705801010132},{"id":"127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","score":0.42890000343322754}],"counts_by_year":[{"year":1975,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1980,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":1981,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":1983,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1984,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":1985,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":1989,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1991,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1993,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1994,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1995,"works_count":5,"oa_works_count":2,"cited_by_count":0},{"year":1996,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":1997,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":1998,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1999,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":2008,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":6,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":4,"oa_works_count":0,"cited_by_count":52},{"year":2013,"works_count":2,"oa_works_count":0,"cited_by_count":40},{"year":2014,"works_count":4,"oa_works_count":0,"cited_by_count":66},{"year":2015,"works_count":2,"oa_works_count":0,"cited_by_count":60},{"year":2016,"works_count":1,"oa_works_count":0,"cited_by_count":54},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":30},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":29},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":10},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":17},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":27},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":13},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":15},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":11},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":6}],"display_name_alternatives":["M SMAYLING","M. C. Smayling","M. Smayling","M.C. Smayling","Michael C. Smayling","Michael C. Smayling Michael C. Smayling","Michael Smayling"],"block_key":"m smayling","works_api_url":"https://api.openalex.org/works?filter=author.id:A5113576594","awards_count":0,"updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}