{"id":"https://openalex.org/A5113497219","orcid":null,"observed_orcids":[],"display_name":"Len Tsou","raw_author_names":["L. Tsou","L. Y. TSOU","L. Y. Tsou","Len Tsou"],"full_name":"Len Tsou","works_count":21,"cited_by_count":217,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":7,"i10_index":7},"ids":{"openalex":"https://openalex.org/A5113497219","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I1283103587","ror":"https://ror.org/02bbd5539","display_name":"AT&T (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1283103587"]},"years":[1985]},{"institution":{"id":"https://openalex.org/I1341412227","ror":"https://ror.org/05hh8d621","display_name":"IBM (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},"years":[2009,2008,2006,2005,2004,2003,2002,2001]},{"institution":{"id":"https://openalex.org/I4210131230","ror":"https://ror.org/03kw6wr76","display_name":"Philips (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4210122849","https://openalex.org/I4210131230"]},"years":[1990]}],"last_known_institutions":[{"id":"https://openalex.org/I1341412227","ror":"https://ror.org/05hh8d621","display_name":"IBM (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":14,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":13,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":7,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","count":7,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","count":4,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0001203,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":3.19e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","value":2.9e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","value":2.59e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","value":2e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8321572542190552},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.6320885419845581},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.38263919949531555},{"id":"2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","score":0.37574875354766846},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.2449408769607544}],"counts_by_year":[{"year":1985,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1986,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1988,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1989,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":1990,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1992,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1993,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2001,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":12},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":2}],"display_name_alternatives":["L. Tsou","L. Y. TSOU","L. Y. Tsou","Len Tsou"],"block_key":"l tsou","works_api_url":"https://api.openalex.org/works?filter=author.id:A5113497219","awards_count":0,"updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}