{"id":"https://openalex.org/A5113492986","orcid":"https://orcid.org/0009-0005-6046-1815","observed_orcids":["https://orcid.org/0009-0005-6046-1815"],"display_name":"A. Wei","raw_author_names":["A. Wei","Andy Wei","Anying Wei","Wei Andy","Wei, A.","Wei, Andy, 1972-"],"full_name":"Anying Wei","works_count":80,"cited_by_count":1636,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":19,"i10_index":30},"ids":{"openalex":"https://openalex.org/A5113492986","orcid":"https://orcid.org/0009-0005-6046-1815","observed_orcids":["https://orcid.org/0009-0005-6046-1815"]},"affiliations":[{"institution":{"id":"https://openalex.org/I1341412227","ror":"https://ror.org/05hh8d621","display_name":"IBM (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},"years":[2005]},{"institution":{"id":"https://openalex.org/I138006243","ror":"https://ror.org/03m2x1q45","display_name":"University of Arizona","country_code":"US","type":"education","lineage":["https://openalex.org/I138006243"]},"years":[2002,1995,1994,1993]},{"institution":{"id":"https://openalex.org/I177933477","ror":"https://ror.org/04tavpn47","display_name":"Second Military Medical University","country_code":"CN","type":"education","lineage":["https://openalex.org/I177933477"]},"years":[2026]},{"institution":{"id":"https://openalex.org/I193427800","ror":"https://ror.org/04h1q4c89","display_name":"Applied Materials (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]},"years":[2013,2012]},{"institution":{"id":"https://openalex.org/I35662394","ror":"https://ror.org/02h0ps145","display_name":"GlobalFoundries (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]},"years":[2015,2014,2013,2011]},{"institution":{"id":"https://openalex.org/I4210137977","ror":"https://ror.org/04kd6c783","display_name":"Advanced Micro Devices (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4210137977"]},"years":[2004,2002]},{"institution":{"id":"https://openalex.org/I4210142027","ror":"https://ror.org/045jad561","display_name":"GlobalFoundries (Germany)","country_code":"DE","type":"company","lineage":["https://openalex.org/I35662394","https://openalex.org/I4210142027"]},"years":[2013,2012,2011,2010,2009]},{"institution":{"id":"https://openalex.org/I63966007","ror":"https://ror.org/042nb2s44","display_name":"Massachusetts Institute of Technology","country_code":"US","type":"education","lineage":["https://openalex.org/I63966007"]},"years":[2003,2002,1998,1996,1995,1994]}],"last_known_institutions":[{"id":"https://openalex.org/I177933477","ror":"https://ror.org/04tavpn47","display_name":"Second Military Medical University","country_code":"CN","type":"education","lineage":["https://openalex.org/I177933477"]}],"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":68,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":64,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","count":29,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":21,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11005","display_name":"Radiation Effects in Electronics","count":11,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","value":0.0002275,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","value":0.0001347,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","value":9.75e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11005","display_name":"Radiation Effects in Electronics","value":9.11e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","value":8.8e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.907878041267395},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.7025840282440186},{"id":"119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","score":0.5716743469238281},{"id":"165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","score":0.5296356678009033},{"id":"127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","score":0.4344261586666107}],"counts_by_year":[{"year":1993,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":1994,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":1995,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":1996,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":1998,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1999,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":2002,"works_count":11,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":5,"oa_works_count":5,"cited_by_count":0},{"year":2007,"works_count":11,"oa_works_count":4,"cited_by_count":0},{"year":2008,"works_count":5,"oa_works_count":1,"cited_by_count":0},{"year":2009,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":3,"oa_works_count":0,"cited_by_count":59},{"year":2013,"works_count":3,"oa_works_count":0,"cited_by_count":71},{"year":2014,"works_count":3,"oa_works_count":0,"cited_by_count":53},{"year":2015,"works_count":1,"oa_works_count":0,"cited_by_count":55},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":50},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":59},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":73},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":67},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":38},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":39},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":31},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":27},{"year":2024,"works_count":1,"oa_works_count":1,"cited_by_count":24},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":31},{"year":2026,"works_count":1,"oa_works_count":1,"cited_by_count":16}],"display_name_alternatives":["A. Wei","Andy Wei","Anying Wei","Wei Andy","Wei, A.","Wei, Andy, 1972-"],"block_key":"a wei","works_api_url":"https://api.openalex.org/works?filter=author.id:A5113492986","updated_date":"2026-10-29T12:27:34","created_date":"2025-10-10T00:00:00"}