{"id":"https://openalex.org/A5111789110","orcid":null,"observed_orcids":[],"display_name":"Eungnak Han","raw_author_names":["E. Han","Eungnak Han"],"full_name":"Han, Eungnak","works_count":28,"cited_by_count":2077,"summary_stats":{"2yr_mean_citedness":2.6666666666666665,"h_index":18,"i10_index":20},"ids":{"openalex":"https://openalex.org/A5111789110","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I1304256225","ror":"https://ror.org/03ydkyb10","display_name":"University of Wisconsin System","country_code":"US","type":"education","lineage":["https://openalex.org/I1304256225"]},"years":[2008]},{"institution":{"id":"https://openalex.org/I1343180700","ror":"https://ror.org/01ek73717","display_name":"Intel (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1343180700"]},"years":[2026,2024,2015]},{"institution":{"id":"https://openalex.org/I135310074","ror":"https://ror.org/01y2jtd41","display_name":"University of Wisconsin\u2013Madison","country_code":"US","type":"education","lineage":["https://openalex.org/I135310074"]},"years":[2015,2013,2012,2011,2010,2009,2008,2007]},{"institution":{"id":"https://openalex.org/I157485424","ror":"https://ror.org/05apxxy63","display_name":"Korea Advanced Institute of Science and Technology","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]},"years":[2007]}],"last_known_institutions":[{"id":"https://openalex.org/I1343180700","ror":"https://ror.org/01ek73717","display_name":"Intel (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1343180700"]}],"topics":[{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","count":24,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10405","display_name":"Advanced Polymer Synthesis and Characterization","count":17,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":14,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":10,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10389","display_name":"Polymer crystallization and properties","count":8,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","value":0.0002395,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":0.0001488,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":9.26e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10405","display_name":"Advanced Polymer Synthesis and Characterization","value":4.86e-05,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10389","display_name":"Polymer crystallization and properties","value":2.11e-05,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"15920480","wikidata":"https://www.wikidata.org/wiki/Q421281","display_name":"Copolymer","score":0.9545326232910156},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.9154919385910034},{"id":"521977710","wikidata":"https://www.wikidata.org/wiki/Q81163","display_name":"Polymer","score":0.7453551292419434},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.6214103102684021},{"id":"159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","score":0.5506904125213623}],"counts_by_year":[{"year":2007,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":2,"oa_works_count":0,"cited_by_count":121},{"year":2013,"works_count":4,"oa_works_count":0,"cited_by_count":187},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":186},{"year":2015,"works_count":3,"oa_works_count":0,"cited_by_count":230},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":232},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":156},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":124},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":146},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":93},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":104},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":77},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":48},{"year":2024,"works_count":1,"oa_works_count":0,"cited_by_count":65},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":62},{"year":2026,"works_count":2,"oa_works_count":0,"cited_by_count":53}],"display_name_alternatives":["E. Han","Eungnak Han"],"block_key":"e han","works_api_url":"https://api.openalex.org/works?filter=author.id:A5111789110","awards_count":0,"updated_date":"2026-11-09T14:06:01","created_date":"2016-06-24T00:00:00"}