{"id":"https://openalex.org/A5111699047","orcid":null,"observed_orcids":[],"display_name":"R.W. Bower","raw_author_names":["Bower, Robert William","R W Bower","R. Bower","R. W. Bower","R.W Bower","R.W. BOWER","R.W. Bower","Robert Bower","Robert W. Bower","Robert W. Bower Robert W. Bower"],"full_name":"Robert W. Bower Robert W. Bower","works_count":71,"cited_by_count":1116,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":15,"i10_index":27},"ids":{"openalex":"https://openalex.org/A5111699047","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I122411786","ror":"https://ror.org/05dxps055","display_name":"California Institute of Technology","country_code":"US","type":"education","lineage":["https://openalex.org/I122411786"]},"years":[2004,1973,1972]},{"institution":{"id":"https://openalex.org/I200576644","ror":"https://ror.org/05p7te762","display_name":"HRL Laboratories (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I200576644"]},"years":[1969,1968,1967,1966]},{"institution":{"id":"https://openalex.org/I2803209242","ror":"https://ror.org/00pjdza24","display_name":"University of California System","country_code":"US","type":"education","lineage":["https://openalex.org/I2803209242"]},"years":[2002]},{"institution":{"id":"https://openalex.org/I4388482704","ror":"https://ror.org/00wes5t10","display_name":"TRW (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4388482704"]},"years":[1974,1973]},{"institution":{"id":"https://openalex.org/I4388891881","ror":"https://ror.org/0431d2d16","display_name":"Hughes Aircraft (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4388891881"]},"years":[1971,1970,1968]},{"institution":{"id":"https://openalex.org/I84218800","ror":"https://ror.org/05rrcem69","display_name":"University of California, Davis","country_code":"US","type":"education","lineage":["https://openalex.org/I84218800"]},"years":[2003,2002,2001,2000,1999,1998,1997,1996,1995,1994,1993,1992,1991,1990]}],"last_known_institutions":[{"id":"https://openalex.org/I122411786","ror":"https://ror.org/05dxps055","display_name":"California Institute of Technology","country_code":"US","type":"education","lineage":["https://openalex.org/I122411786"]}],"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":36,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","count":22,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","count":17,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":17,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","count":14,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","value":0.0002612,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","value":9.24e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","value":7.68e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","value":7.46e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","value":6.94e-05,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.9069792032241821},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.8582384586334229},{"id":"544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","score":0.8101677298545837},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.7867107391357422},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.6722398996353149}],"counts_by_year":[{"year":1966,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1967,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1968,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":1969,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1970,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1971,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1972,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1973,"works_count":6,"oa_works_count":0,"cited_by_count":0},{"year":1974,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1975,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1976,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1990,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1991,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":1992,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1993,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1994,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1995,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1996,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1997,"works_count":7,"oa_works_count":1,"cited_by_count":0},{"year":1998,"works_count":6,"oa_works_count":3,"cited_by_count":0},{"year":1999,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2001,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":2003,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":12},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":11},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":11},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":12},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":11},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":7},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":16},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":7},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":8},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":10},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":6}],"display_name_alternatives":["Bower, Robert William","R W Bower","R. Bower","R. W. Bower","R.W Bower","R.W. BOWER","R.W. Bower","Robert Bower","Robert W. Bower","Robert W. Bower Robert W. Bower"],"block_key":"r bower","works_api_url":"https://api.openalex.org/works?filter=author.id:A5111699047","updated_date":"2026-11-04T11:47:51","created_date":"2016-06-24T00:00:00"}