{"id":"https://openalex.org/A5111592656","orcid":null,"observed_orcids":[],"display_name":"Carlos Fonseca","raw_author_names":["C. A. Fonseca","C. Fonseca","Carlos A. Fonseca","Carlos Fonseca","Fonseca, Carlos"],"full_name":"Carlos Augusto dos Santos Fonseca","works_count":49,"cited_by_count":620,"summary_stats":{"2yr_mean_citedness":14.0,"h_index":14,"i10_index":18},"ids":{"openalex":"https://openalex.org/A5111592656","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I114132059","ror":"https://ror.org/05gd76j39","display_name":"Tokyo Electron (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]},"years":[2022,2018,2017,2016,2011,2010,2009,2008]},{"institution":{"id":"https://openalex.org/I1341412227","ror":"https://ror.org/05hh8d621","display_name":"IBM (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]},"years":[2024,2018,2017,2007,2006,2004,2003,2002,2001]},{"institution":{"id":"https://openalex.org/I1343180700","ror":"https://ror.org/01ek73717","display_name":"Intel (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1343180700"]},"years":[1998]},{"institution":{"id":"https://openalex.org/I155173764","ror":"https://ror.org/00v4yb702","display_name":"Rochester Institute of Technology","country_code":"US","type":"education","lineage":["https://openalex.org/I155173764"]},"years":[1997]},{"institution":{"id":"https://openalex.org/I4405285863","ror":"https://ror.org/00h39s752","display_name":"IBM Research and Development Inc. (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4405285863"]},"years":[2006,2002]}],"last_known_institutions":[{"id":"https://openalex.org/I1341412227","ror":"https://ror.org/05hh8d621","display_name":"IBM (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1341412227"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":42,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":15,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":12,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","count":11,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","count":8,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0003896,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":0.0001596,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":8.31e-05,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","value":8e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":5.07e-05,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","score":0.9921838045120239},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8320909142494202},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.8165284395217896},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.454620897769928},{"id":"2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","score":0.2592499852180481}],"counts_by_year":[{"year":1997,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1998,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1999,"works_count":2,"oa_works_count":2,"cited_by_count":0},{"year":2001,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":28},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":13},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":26},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":36},{"year":2016,"works_count":1,"oa_works_count":0,"cited_by_count":32},{"year":2017,"works_count":8,"oa_works_count":0,"cited_by_count":23},{"year":2018,"works_count":4,"oa_works_count":0,"cited_by_count":28},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":20},{"year":2020,"works_count":1,"oa_works_count":0,"cited_by_count":13},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":12},{"year":2022,"works_count":1,"oa_works_count":0,"cited_by_count":10},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":12},{"year":2024,"works_count":1,"oa_works_count":1,"cited_by_count":20},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":37},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":22}],"display_name_alternatives":["C. A. Fonseca","C. Fonseca","Carlos A. Fonseca","Carlos Fonseca","Fonseca, Carlos"],"block_key":"c fonseca","works_api_url":"https://api.openalex.org/works?filter=author.id:A5111592656","updated_date":"2026-11-04T11:47:51","created_date":"2016-06-24T00:00:00"}
