{"id":"https://openalex.org/A5111319388","orcid":"https://orcid.org/0000-0003-3181-6873","observed_orcids":["https://orcid.org/0000-0003-3181-6873"],"display_name":"Zuozuo Wu","raw_author_names":["Zuozuo Wu"],"full_name":"Zuozuo Wu","works_count":7,"cited_by_count":20,"summary_stats":{"2yr_mean_citedness":2.857142857142857,"h_index":3,"i10_index":0},"ids":{"openalex":"https://openalex.org/A5111319388","orcid":"https://orcid.org/0000-0003-3181-6873","observed_orcids":["https://orcid.org/0000-0003-3181-6873"]},"affiliations":[{"institution":{"id":"https://openalex.org/I76130692","ror":"https://ror.org/00a2xv884","display_name":"Zhejiang University","country_code":"CN","type":"education","lineage":["https://openalex.org/I76130692"]},"years":[2026,2025]}],"last_known_institutions":[{"id":"https://openalex.org/I76130692","ror":"https://ror.org/00a2xv884","display_name":"Zhejiang University","country_code":"CN","type":"education","lineage":["https://openalex.org/I76130692"]}],"topics":[{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","count":4,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","count":3,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","count":3,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","count":3,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10188","display_name":"Advanced machining processes and optimization","count":2,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","value":2.59e-05,"subfield":{"id":"https://openalex.org/subfields/3105","display_name":"Instrumentation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","value":2.36e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","value":1.69e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","value":1.5e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12092","display_name":"Erosion and Abrasive Machining","value":1.34e-05,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.7918999791145325},{"id":"544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","score":0.7361000776290894},{"id":"160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","score":0.7138000130653381},{"id":"138113353","wikidata":"https://www.wikidata.org/wiki/Q611639","display_name":"Polishing","score":0.64410001039505},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.6200000047683716}],"counts_by_year":[{"year":2024,"works_count":1,"oa_works_count":1,"cited_by_count":1},{"year":2025,"works_count":2,"oa_works_count":2,"cited_by_count":7},{"year":2026,"works_count":4,"oa_works_count":0,"cited_by_count":12}],"display_name_alternatives":["Zuozuo Wu"],"block_key":"z wu","works_api_url":"https://api.openalex.org/works?filter=author.id:A5111319388","awards_count":0,"updated_date":"2026-11-04T11:47:51","created_date":"2024-09-09T00:00:00"}