{"id":"https://openalex.org/A5110090501","orcid":null,"observed_orcids":[],"display_name":"Hans\u2010Werner Schock","raw_author_names":["H W Schock","H- W. Schock","H-W. Schock","H. -W. Schock","H. Schock","H. W. Schock","H.-W Schock","H.-W. Schock","H.W Schock","H.W. Schock","HANS W. SCHOCK","Hans W Schock","Hans W. Schock","Hans Werner Schock","Hans-W. Schock","Hans-Werner Schock","Hans\u2010Werner Schock","Prof. Dr. Hans-Werner Schock","Schock, H. W.","Schock, H.-W.","Schock, H.W.","Schock, Hans Werner"],"full_name":"Hans-Werner Schock","works_count":259,"cited_by_count":13676,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":59,"i10_index":137},"ids":{"openalex":"https://openalex.org/A5110090501","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I100066346","ror":"https://ror.org/04vnq7t77","display_name":"University of Stuttgart","country_code":"DE","type":"education","lineage":["https://openalex.org/I100066346"]},"years":[2017,2012,2011,2007,2005,2004,2003,2002,2001,2000,1999,1998,1997,1996,1995,1994,1993,1992,1991,1990,1988,1987,1985,1982,1981]},{"institution":{"id":"https://openalex.org/I108403487","ror":"https://ror.org/00y0xnp53","display_name":"Warsaw University of Technology","country_code":"PL","type":"education","lineage":["https://openalex.org/I108403487"]},"years":[1996]},{"institution":{"id":"https://openalex.org/I1297288678","ror":"https://ror.org/036266993","display_name":"National Laboratory of the Rockies","country_code":"US","type":"facility","lineage":["https://openalex.org/I1297288678","https://openalex.org/I1330989302","https://openalex.org/I2800842121"]},"years":[2008]},{"institution":{"id":"https://openalex.org/I1313323035","ror":"https://ror.org/05qrfxd25","display_name":"Russian Academy of Sciences","country_code":"RU","type":"government","lineage":["https://openalex.org/I1313323035"]},"years":[1997]},{"institution":{"id":"https://openalex.org/I137975476","ror":"https://ror.org/0244rem06","display_name":"Shinshu University","country_code":"JP","type":"education","lineage":["https://openalex.org/I137975476"]},"years":[2014]},{"institution":{"id":"https://openalex.org/I146655781","ror":"https://ror.org/04xs57h96","display_name":"University of Liverpool","country_code":"GB","type":"education","lineage":["https://openalex.org/I146655781"]},"years":[2012]},{"institution":{"id":"https://openalex.org/I149758196","ror":"https://ror.org/05q65zh81","display_name":"Chimie ParisTech - PSL","country_code":"FR","type":"education","lineage":["https://openalex.org/I149758196","https://openalex.org/I190752583"]},"years":[2000,1990]},{"institution":{"id":"https://openalex.org/I160414472","ror":"https://ror.org/000q08p21","display_name":"Schott (Germany)","country_code":"DE","type":"company","lineage":["https://openalex.org/I160414472"]},"years":[2010]},{"institution":{"id":"https://openalex.org/I2800795503","ror":"https://ror.org/02aj13c28","display_name":"Helmholtz-Zentrum Berlin f\u00fcr Materialien und Energie","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I2800795503"]},"years":[2018,2017,2015,2014,2013,2012,2011,2010,2009,2008]},{"institution":{"id":"https://openalex.org/I2801876189","ror":"https://ror.org/01js2sh04","display_name":"Deutsches Elektronen-Synchrotron DESY","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I2801876189"]},"years":[2008]},{"institution":{"id":"https://openalex.org/I4210116306","ror":"https://ror.org/01mk1hj86","display_name":"Paul Drude Institute for Solid State Electronics","country_code":"DE","type":"facility","lineage":["https://openalex.org/I315704651","https://openalex.org/I4210116306"]},"years":[2008]},{"institution":{"id":"https://openalex.org/I4577782","ror":"https://ror.org/03v4gjf40","display_name":"Technische Universit\u00e4t Berlin","country_code":"DE","type":"education","lineage":["https://openalex.org/I4577782"]},"years":[2013]},{"institution":{"id":"https://openalex.org/I53964585","ror":"https://ror.org/0316ej306","display_name":"Weizmann Institute of Science","country_code":"IL","type":"education","lineage":["https://openalex.org/I53964585"]},"years":[2000]},{"institution":{"id":"https://openalex.org/I68956291","ror":"https://ror.org/05gqaka33","display_name":"Martin Luther University Halle-Wittenberg","country_code":"DE","type":"education","lineage":["https://openalex.org/I68956291"]},"years":[2011]},{"institution":{"id":"https://openalex.org/I88060688","ror":"https://ror.org/03n6nwv02","display_name":"Universidad Polit\u00e9cnica de Madrid","country_code":"ES","type":"education","lineage":["https://openalex.org/I88060688"]},"years":[2009]},{"institution":{"id":"https://openalex.org/I95568926","ror":"https://ror.org/05dkdaa55","display_name":"Ioffe Institute","country_code":"RU","type":"facility","lineage":["https://openalex.org/I1313323035","https://openalex.org/I4210096333","https://openalex.org/I95568926"]},"years":[1997]}],"last_known_institutions":null,"topics":[{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","count":247,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","count":124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11315","display_name":"Phase-change materials and chalcogenides","count":77,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","count":40,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":38,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","value":0.0017373,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11315","display_name":"Phase-change materials and chalcogenides","value":0.0006684,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","value":0.000619,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12309","display_name":"solar cell performance optimization","value":0.0002654,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","value":0.0002128,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","score":0.9389463663101196},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.9310289621353149},{"id":"19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","score":0.802590012550354},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.7152833938598633},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.4908629059791565}],"counts_by_year":[{"year":1976,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1981,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1982,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1984,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1985,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1987,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1988,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":1989,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1990,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1991,"works_count":6,"oa_works_count":0,"cited_by_count":0},{"year":1992,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1993,"works_count":10,"oa_works_count":2,"cited_by_count":0},{"year":1994,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":1995,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1996,"works_count":14,"oa_works_count":0,"cited_by_count":0},{"year":1997,"works_count":7,"oa_works_count":1,"cited_by_count":0},{"year":1998,"works_count":6,"oa_works_count":1,"cited_by_count":0},{"year":1999,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":2000,"works_count":15,"oa_works_count":2,"cited_by_count":0},{"year":2001,"works_count":12,"oa_works_count":2,"cited_by_count":0},{"year":2002,"works_count":12,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":6,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":7,"oa_works_count":1,"cited_by_count":0},{"year":2007,"works_count":11,"oa_works_count":2,"cited_by_count":0},{"year":2008,"works_count":12,"oa_works_count":1,"cited_by_count":0},{"year":2009,"works_count":16,"oa_works_count":4,"cited_by_count":0},{"year":2010,"works_count":21,"oa_works_count":6,"cited_by_count":0},{"year":2011,"works_count":26,"oa_works_count":4,"cited_by_count":0},{"year":2012,"works_count":16,"oa_works_count":6,"cited_by_count":902},{"year":2013,"works_count":8,"oa_works_count":1,"cited_by_count":964},{"year":2014,"works_count":10,"oa_works_count":3,"cited_by_count":1017},{"year":2015,"works_count":1,"oa_works_count":1,"cited_by_count":878},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":924},{"year":2017,"works_count":3,"oa_works_count":1,"cited_by_count":701},{"year":2018,"works_count":2,"oa_works_count":1,"cited_by_count":772},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":592},{"year":2020,"works_count":1,"oa_works_count":0,"cited_by_count":644},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":630},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":431},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":407},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":344},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":326},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":202}],"display_name_alternatives":["H W Schock","H- W. Schock","H-W. Schock","H. -W. Schock","H. Schock","H. W. Schock","H.-W Schock","H.-W. Schock","H.W Schock","H.W. Schock","HANS W. SCHOCK","Hans W Schock","Hans W. Schock","Hans Werner Schock","Hans-W. Schock","Hans-Werner Schock","Hans\u2010Werner Schock","Prof. Dr. Hans-Werner Schock","Schock, H. W.","Schock, H.-W.","Schock, H.W.","Schock, Hans Werner"],"block_key":"h schock","works_api_url":"https://api.openalex.org/works?filter=author.id:A5110090501","updated_date":"2026-11-08T12:57:04","created_date":"2016-06-24T00:00:00"}