{"id":"https://openalex.org/A5109920849","orcid":null,"observed_orcids":[],"display_name":"K. Murali","raw_author_names":["Dr. K. Murali","K Murali","K V Murali","K. Murali","K. V. MURALI","K. V. Murali","K.V. Murali","Krishna Chintala Murali","Murali K"],"full_name":"Krishna Chintala Murali","works_count":43,"cited_by_count":339,"summary_stats":{"2yr_mean_citedness":1.0,"h_index":7,"i10_index":6},"ids":{"openalex":"https://openalex.org/A5109920849","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I1330855593","ror":"https://ror.org/05bc5bx80","display_name":"Vel Tech Rangarajan Dr. Sagunthala R&D Institute of Science and Technology","country_code":"IN","type":"education","lineage":["https://openalex.org/I1330855593"]},"years":[2024,2021,2020,2018]},{"institution":{"id":"https://openalex.org/I20497027","ror":"https://ror.org/00a4kqq17","display_name":"Cochin University of Science and Technology","country_code":"IN","type":"education","lineage":["https://openalex.org/I20497027"]},"years":[2004]},{"institution":{"id":"https://openalex.org/I24676775","ror":"https://ror.org/03v0r5n49","display_name":"Indian Institute of Technology Madras","country_code":"IN","type":"education","lineage":["https://openalex.org/I24676775"]},"years":[2023]},{"institution":{"id":"https://openalex.org/I4405272783","ror":"https://ror.org/04q2t0551","display_name":"Nehru Arts and Science College","country_code":"IN","type":"education","lineage":["https://openalex.org/I4405272783"]},"years":[2021,2014,2013,2012,2011]},{"institution":{"id":"https://openalex.org/I52703040","ror":"https://ror.org/00zz2cd87","display_name":"Kannur University","country_code":"IN","type":"education","lineage":["https://openalex.org/I52703040"]},"years":[2014,2013,2012,2011]},{"institution":{"id":"https://openalex.org/I81556334","ror":"https://ror.org/03am10p12","display_name":"Amrita Vishwa Vidyapeetham","country_code":"IN","type":"education","lineage":["https://openalex.org/I81556334"]},"years":[2024,2022]}],"last_known_institutions":null,"topics":[{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","count":13,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","count":11,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","count":10,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10125","display_name":"Advanced Wireless Communication Techniques","count":5,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11458","display_name":"Advanced Wireless Communication Technologies","count":5,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","value":9.33e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","value":6.76e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11458","display_name":"Advanced Wireless Communication Technologies","value":6.64e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11873","display_name":"PAPR reduction in OFDM","value":5.44e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","value":4.85e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8444024920463562},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.7698764801025391},{"id":"185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","score":0.40265658497810364},{"id":"127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","score":0.3810868561267853},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.31241488456726074}],"counts_by_year":[{"year":1999,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":5,"oa_works_count":0,"cited_by_count":8},{"year":2013,"works_count":4,"oa_works_count":1,"cited_by_count":18},{"year":2014,"works_count":2,"oa_works_count":0,"cited_by_count":27},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":24},{"year":2016,"works_count":1,"oa_works_count":0,"cited_by_count":21},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":30},{"year":2018,"works_count":2,"oa_works_count":1,"cited_by_count":26},{"year":2019,"works_count":3,"oa_works_count":1,"cited_by_count":25},{"year":2020,"works_count":4,"oa_works_count":0,"cited_by_count":22},{"year":2021,"works_count":5,"oa_works_count":3,"cited_by_count":30},{"year":2022,"works_count":2,"oa_works_count":0,"cited_by_count":17},{"year":2023,"works_count":3,"oa_works_count":2,"cited_by_count":19},{"year":2024,"works_count":3,"oa_works_count":1,"cited_by_count":22},{"year":2025,"works_count":1,"oa_works_count":0,"cited_by_count":14},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":14}],"display_name_alternatives":["Dr. K. Murali","K Murali","K V Murali","K. Murali","K. V. MURALI","K. V. Murali","K.V. Murali","Krishna Chintala Murali","Murali K"],"block_key":"k murali","works_api_url":"https://api.openalex.org/works?filter=author.id:A5109920849","updated_date":"2026-11-03T12:34:24","created_date":"2016-06-24T00:00:00"}