{"id":"https://openalex.org/A5100719657","orcid":"https://orcid.org/0000-0003-1716-6886","observed_orcids":["https://orcid.org/0000-0003-1716-6886"],"display_name":"Kiyoung Lee","raw_author_names":["K Lee","K. Lee","K. Y. LEE","K. Y. Lee","K.Y. Lee","KangYoung Lee","Kangyoung Lee","Kiyoung Lee"],"full_name":"KangYoung Lee","works_count":104,"cited_by_count":2416,"summary_stats":{"2yr_mean_citedness":3.111111111111111,"h_index":26,"i10_index":44},"ids":{"openalex":"https://openalex.org/A5100719657","orcid":"https://orcid.org/0000-0003-1716-6886","observed_orcids":["https://orcid.org/0000-0003-1716-6886"]},"affiliations":[{"institution":{"id":"https://openalex.org/I107639228","ror":"https://ror.org/00mkhxb43","display_name":"University of Notre Dame","country_code":"US","type":"education","lineage":["https://openalex.org/I107639228"]},"years":[2020]},{"institution":{"id":"https://openalex.org/I110152177","ror":"https://ror.org/02kyckx55","display_name":"University of Akron","country_code":"US","type":"education","lineage":["https://openalex.org/I110152177"]},"years":[2007]},{"institution":{"id":"https://openalex.org/I124633538","ror":"https://ror.org/05en5nh73","display_name":"University of Seoul","country_code":"KR","type":"education","lineage":["https://openalex.org/I124633538"]},"years":[2023]},{"institution":{"id":"https://openalex.org/I1343180700","ror":"https://ror.org/01ek73717","display_name":"Intel (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I1343180700"]},"years":[2025,2022,2021]},{"institution":{"id":"https://openalex.org/I155671955","ror":"https://ror.org/01xb4fs50","display_name":"Korea Atomic Energy Research Institute","country_code":"KR","type":"facility","lineage":["https://openalex.org/I155671955","https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098"]},"years":[2014,2013,2011]},{"institution":{"id":"https://openalex.org/I157725225","ror":"https://ror.org/047426m28","display_name":"University of Illinois Urbana-Champaign","country_code":"US","type":"education","lineage":["https://openalex.org/I157725225"]},"years":[2021]},{"institution":{"id":"https://openalex.org/I172675005","ror":"https://ror.org/02e7b5302","display_name":"Nanyang Technological University","country_code":"SG","type":"education","lineage":["https://openalex.org/I172675005"]},"years":[2014]},{"institution":{"id":"https://openalex.org/I193775966","ror":"https://ror.org/01wjejq96","display_name":"Yonsei University","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]},"years":[2010]},{"institution":{"id":"https://openalex.org/I19820366","ror":"https://ror.org/034t30j35","display_name":"Chinese Academy of Sciences","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},"years":[2021]},{"institution":{"id":"https://openalex.org/I20382870","ror":"https://ror.org/00scwqd12","display_name":"Missouri University of Science and Technology","country_code":"US","type":"education","lineage":["https://openalex.org/I20382870"]},"years":[2021]},{"institution":{"id":"https://openalex.org/I205783295","ror":"https://ror.org/05bnh6r87","display_name":"Cornell University","country_code":"US","type":"education","lineage":["https://openalex.org/I205783295"]},"years":[2021,2020]},{"institution":{"id":"https://openalex.org/I22265921","ror":"https://ror.org/00944ve71","display_name":"National Central University","country_code":"TW","type":"education","lineage":["https://openalex.org/I22265921"]},"years":[2024]},{"institution":{"id":"https://openalex.org/I2250650973","ror":"https://ror.org/04w3jy968","display_name":"Samsung (South Korea)","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},"years":[2026,2025,2022,2021,2020,2018,2017,2016,2007,2006,2005,2004,2003,2002,2001,2000]},{"institution":{"id":"https://openalex.org/I241749","ror":"https://ror.org/013meh722","display_name":"University of Cambridge","country_code":"GB","type":"education","lineage":["https://openalex.org/I241749"]},"years":[2014,2010,2008]},{"institution":{"id":"https://openalex.org/I33213144","ror":"https://ror.org/02y3ad647","display_name":"University of Florida","country_code":"US","type":"education","lineage":["https://openalex.org/I33213144"]},"years":[2021]},{"institution":{"id":"https://openalex.org/I4210088426","ror":"https://ror.org/005nteb15","display_name":"Gachon University Gil Medical Center","country_code":"KR","type":"healthcare","lineage":["https://openalex.org/I12832649","https://openalex.org/I4210088426"]},"years":[2016]},{"institution":{"id":"https://openalex.org/I4210120320","ror":"https://ror.org/031zj0q48","display_name":"Institute of Engineering Thermophysics","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210120320"]},"years":[2021]},{"institution":{"id":"https://openalex.org/I4210165038","ror":"https://ror.org/05qbk4x57","display_name":"University of Chinese Academy of Sciences","country_code":"CN","type":"education","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210165038"]},"years":[2021]},{"institution":{"id":"https://openalex.org/I4387152773","ror":"https://ror.org/04pw1zg89","display_name":"PARADIM","country_code":"US","type":"facility","lineage":["https://openalex.org/I1311060795","https://openalex.org/I145311948","https://openalex.org/I205783295","https://openalex.org/I4387152773"]},"years":[2020]},{"institution":{"id":"https://openalex.org/I4399598381","ror":"https://ror.org/04axnyp10","display_name":"Samsung Advanced Institute of Technology (South Korea)","country_code":"KR","type":"company","lineage":["https://openalex.org/I4399598381"]},"years":[2022,2021,2020,2019,2018,2017,2016,2007,2006,2005,2004,2003,2002,2001,2000]},{"institution":{"id":"https://openalex.org/I4405259277","ror":"https://ror.org/020m7t761","display_name":"Samsung Electronics (South Korea)","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]},"years":[2023,2022,2021,2020,2018,2017,2016,2006,1999]},{"institution":{"id":"https://openalex.org/I4405270239","ror":"https://ror.org/00abqpk49","display_name":"Cajamar Caja Rural (Spain)","country_code":"ES","type":"company","lineage":["https://openalex.org/I4405270239"]},"years":[1988]},{"institution":{"id":"https://openalex.org/I4405272572","ror":"https://ror.org/04c1a3283","display_name":"Samsung Display (South Korea)","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272572"]},"years":[2026,2025]},{"institution":{"id":"https://openalex.org/I58716616","ror":"https://ror.org/05kzfa883","display_name":"Korea Institute of Science and Technology","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]},"years":[2010]},{"institution":{"id":"https://openalex.org/I59553526","ror":"https://ror.org/05qghxh33","display_name":"Stony Brook University","country_code":"US","type":"education","lineage":["https://openalex.org/I59553526"]},"years":[2006,2005,2003]},{"institution":{"id":"https://openalex.org/I80611190","ror":"https://ror.org/05q92br09","display_name":"Jeonbuk National University","country_code":"KR","type":"education","lineage":["https://openalex.org/I80611190"]},"years":[2025]},{"institution":{"id":"https://openalex.org/I94588446","ror":"https://ror.org/00egdv862","display_name":"Hongik University","country_code":"KR","type":"education","lineage":["https://openalex.org/I94588446"]},"years":[2026,2025,2023,2022,2004]},{"institution":{"id":"https://openalex.org/I95457486","ror":"https://ror.org/01an7q238","display_name":"University of California, Berkeley","country_code":"US","type":"education","lineage":["https://openalex.org/I95457486"]},"years":[2020]}],"last_known_institutions":[{"id":"https://openalex.org/I2250650973","ror":"https://ror.org/04w3jy968","display_name":"Samsung (South Korea)","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},{"id":"https://openalex.org/I4405272572","ror":"https://ror.org/04c1a3283","display_name":"Samsung Display (South Korea)","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272572"]},{"id":"https://openalex.org/I94588446","ror":"https://ror.org/00egdv862","display_name":"Hongik University","country_code":"KR","type":"education","lineage":["https://openalex.org/I94588446"]}],"topics":[{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","count":28,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","count":17,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":16,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10022","display_name":"Semiconductor Quantum Structures and Devices","count":12,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10275","display_name":"2D Materials and Applications","count":12,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","value":0.0001155,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12588","display_name":"Electronic and Structural Properties of Oxides","value":9.44e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","value":7.48e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","value":4.77e-05,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","value":4.31e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.9386335611343384},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.7418957948684692},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.7393319606781006},{"id":"185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","score":0.5560384392738342},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.5111683011054993}],"counts_by_year":[{"year":1988,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1999,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2001,"works_count":13,"oa_works_count":1,"cited_by_count":0},{"year":2002,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":2004,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":6,"oa_works_count":1,"cited_by_count":0},{"year":2006,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":2007,"works_count":6,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":6,"oa_works_count":1,"cited_by_count":0},{"year":2010,"works_count":6,"oa_works_count":2,"cited_by_count":0},{"year":2011,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":61},{"year":2013,"works_count":1,"oa_works_count":0,"cited_by_count":45},{"year":2014,"works_count":3,"oa_works_count":2,"cited_by_count":66},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":49},{"year":2016,"works_count":6,"oa_works_count":3,"cited_by_count":57},{"year":2017,"works_count":2,"oa_works_count":0,"cited_by_count":89},{"year":2018,"works_count":3,"oa_works_count":1,"cited_by_count":99},{"year":2019,"works_count":2,"oa_works_count":1,"cited_by_count":139},{"year":2020,"works_count":4,"oa_works_count":1,"cited_by_count":178},{"year":2021,"works_count":5,"oa_works_count":4,"cited_by_count":171},{"year":2022,"works_count":6,"oa_works_count":3,"cited_by_count":178},{"year":2023,"works_count":4,"oa_works_count":2,"cited_by_count":165},{"year":2024,"works_count":1,"oa_works_count":0,"cited_by_count":184},{"year":2025,"works_count":6,"oa_works_count":3,"cited_by_count":188},{"year":2026,"works_count":2,"oa_works_count":1,"cited_by_count":155}],"display_name_alternatives":["K Lee","K. Lee","K. Y. LEE","K. Y. Lee","K.Y. Lee","KangYoung Lee","Kangyoung Lee","Kiyoung Lee"],"block_key":"k lee","works_api_url":"https://api.openalex.org/works?filter=author.id:A5100719657","updated_date":"2026-10-31T12:29:50","created_date":"2016-06-24T00:00:00"}
