{"id":"https://openalex.org/A5086967487","orcid":null,"observed_orcids":[],"display_name":"Tom Vandeweyer","raw_author_names":["T. Vandeweye","T. Vandeweyer","Tom Vandeweyer","Vandeweyer Tom"],"full_name":"Tom Vandeweyer","works_count":62,"cited_by_count":1755,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":21,"i10_index":30},"ids":{"openalex":"https://openalex.org/A5086967487","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I4210114974","ror":"https://ror.org/02kcbn207","display_name":"IMEC","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]},"years":[2023,2018,2017,2016,2015,2014,2013,2012,2011,2010,2009,2008,2007,2006]},{"institution":{"id":"https://openalex.org/I4210159858","ror":"https://ror.org/05bsjqt55","display_name":"Philips (Belgium)","country_code":"BE","type":"company","lineage":["https://openalex.org/I4210122849","https://openalex.org/I4210159858"]},"years":[2005]},{"institution":{"id":"https://openalex.org/I99464096","ror":"https://ror.org/05f950310","display_name":"KU Leuven","country_code":"BE","type":"education","lineage":["https://openalex.org/I99464096"]},"years":[2008]}],"last_known_institutions":[{"id":"https://openalex.org/I4210114974","ror":"https://ror.org/02kcbn207","display_name":"IMEC","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":34,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":30,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":27,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":12,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","count":11,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0003147,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","value":0.00013,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":0.0001276,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","value":0.0001001,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","value":6.91e-05,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.83188796043396},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.7088720798492432},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.6657575964927673},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.5000383853912354},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.4262285530567169}],"counts_by_year":[{"year":2004,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":2007,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":7,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":8,"oa_works_count":1,"cited_by_count":0},{"year":2010,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":7,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":2,"oa_works_count":0,"cited_by_count":93},{"year":2013,"works_count":2,"oa_works_count":0,"cited_by_count":95},{"year":2014,"works_count":4,"oa_works_count":0,"cited_by_count":143},{"year":2015,"works_count":5,"oa_works_count":0,"cited_by_count":151},{"year":2016,"works_count":4,"oa_works_count":1,"cited_by_count":174},{"year":2017,"works_count":3,"oa_works_count":0,"cited_by_count":147},{"year":2018,"works_count":1,"oa_works_count":0,"cited_by_count":114},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":102},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":91},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":76},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":55},{"year":2023,"works_count":1,"oa_works_count":0,"cited_by_count":63},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":50},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":60},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":37}],"display_name_alternatives":["T. Vandeweye","T. Vandeweyer","Tom Vandeweyer","Vandeweyer Tom"],"block_key":"t vandeweyer","works_api_url":"https://api.openalex.org/works?filter=author.id:A5086967487","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}