{"id":"https://openalex.org/A5085761829","orcid":null,"observed_orcids":[],"display_name":"Cheolkyun Kim","raw_author_names":["Cheol-kyun Kim","Cheolkyun Kim"],"full_name":"Cheolkyun Kim","works_count":14,"cited_by_count":36,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":3,"i10_index":1},"ids":{"openalex":"https://openalex.org/A5085761829","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I4405272917","ror":"https://ror.org/04z2p0w98","display_name":"SK Hynix (South Korea)","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]},"years":[2020,2019,2016,2014,2008,2006,2005]}],"last_known_institutions":[{"id":"https://openalex.org/I4405272917","ror":"https://ror.org/04z2p0w98","display_name":"SK Hynix (South Korea)","country_code":"KR","type":"company","lineage":["https://openalex.org/I4405272917"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":13,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","count":8,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":5,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","count":5,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11159","display_name":"Manufacturing Process and Optimization","count":3,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0001205,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","value":3.72e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","value":2.52e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":2.13e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":2.11e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","score":0.8214468955993652},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.8004235029220581},{"id":"98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","score":0.6965250968933105},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.22133228182792664},{"id":"111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","score":0.0}],"counts_by_year":[{"year":2005,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":1,"oa_works_count":0,"cited_by_count":3},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2014,"works_count":2,"oa_works_count":0,"cited_by_count":1},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2016,"works_count":2,"oa_works_count":0,"cited_by_count":3},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2019,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2020,"works_count":1,"oa_works_count":0,"cited_by_count":1},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":1}],"display_name_alternatives":["Cheol-kyun Kim","Cheolkyun Kim"],"block_key":"c kim","works_api_url":"https://api.openalex.org/works?filter=author.id:A5085761829","awards_count":0,"updated_date":"2026-10-28T12:34:19","created_date":"2016-06-24T00:00:00"}