{"id":"https://openalex.org/A5083533568","orcid":null,"observed_orcids":[],"display_name":"Water Lur","raw_author_names":["W. Lur","Water Lur"],"full_name":"Water Lur","works_count":27,"cited_by_count":377,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":9,"i10_index":9},"ids":{"openalex":"https://openalex.org/A5083533568","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I25846049","ror":"https://ror.org/00zdnkx70","display_name":"National Tsing Hua University","country_code":"TW","type":"education","lineage":["https://openalex.org/I25846049"]},"years":[1990,1989,1988]},{"institution":{"id":"https://openalex.org/I4210161555","ror":"https://ror.org/0580qje17","display_name":"United Microelectronics (Taiwan)","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210161555"]},"years":[2003,2002,2000,1999,1996,1995,1994,1993]},{"institution":{"id":"https://openalex.org/I77566578","ror":"https://ror.org/00vrhw316","display_name":"United Microelectronics (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4210161555","https://openalex.org/I77566578"]},"years":[2002,2000]}],"last_known_institutions":[{"id":"https://openalex.org/I4210161555","ror":"https://ror.org/0580qje17","display_name":"United Microelectronics (Taiwan)","country_code":"TW","type":"company","lineage":["https://openalex.org/I4210161555"]}],"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":23,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","count":15,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":13,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":5,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","count":3,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","value":0.0001485,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","value":4.76e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","value":2.63e-05,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","value":1.86e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":1.85e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8907484412193298},{"id":"191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","score":0.5740333795547485},{"id":"2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","score":0.5320749282836914},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.4515657424926758},{"id":"127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","score":0.27760761976242065}],"counts_by_year":[{"year":1985,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1988,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1989,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":1990,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1993,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1994,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1995,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1996,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1999,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":6,"oa_works_count":1,"cited_by_count":0},{"year":2003,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":10},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":1}],"display_name_alternatives":["W. Lur","Water Lur"],"block_key":"w lur","works_api_url":"https://api.openalex.org/works?filter=author.id:A5083533568","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}