{"id":"https://openalex.org/A5079166341","orcid":null,"observed_orcids":[],"display_name":"Richard J. F. van Haren","raw_author_names":["Richard J.  F. van Haren","Richard J. F. van Haren","Richard J. van Haren","Richard Van Haren","Richard van Haren"],"full_name":"Richard J.  F. van Haren","works_count":49,"cited_by_count":300,"summary_stats":{"2yr_mean_citedness":4.6,"h_index":10,"i10_index":11},"ids":{"openalex":"https://openalex.org/A5079166341","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I927257375","ror":"https://ror.org/01vxknj13","display_name":"ASML (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]},"years":[2026,2024,2023,2022,2021,2020,2019,2018,2017,2016,2015,2014,2013,2007,2005,2004,2003,2002,2001]}],"last_known_institutions":[{"id":"https://openalex.org/I927257375","ror":"https://ror.org/01vxknj13","display_name":"ASML (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":45,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","count":36,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","count":24,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":9,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10876","display_name":"Fault Detection and Control Systems","count":6,"subfield":{"id":"https://openalex.org/subfields/2207","display_name":"Control and Systems Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T14484","display_name":"Technology and Data Analysis","value":0.0005043,"subfield":{"id":"https://openalex.org/subfields/1710","display_name":"Information Systems"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0004165,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","value":0.0001669,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","value":0.000132,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","value":4.73e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"136085584","wikidata":"https://www.wikidata.org/wiki/Q910289","display_name":"Overlay","score":0.9770801067352295},{"id":"160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","score":0.9315437078475952},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.7918790578842163},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.6817561388015747},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.6023672819137573}],"counts_by_year":[{"year":2001,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2013,"works_count":1,"oa_works_count":0,"cited_by_count":1},{"year":2014,"works_count":1,"oa_works_count":0,"cited_by_count":4},{"year":2015,"works_count":4,"oa_works_count":0,"cited_by_count":7},{"year":2016,"works_count":1,"oa_works_count":0,"cited_by_count":10},{"year":2017,"works_count":4,"oa_works_count":0,"cited_by_count":12},{"year":2018,"works_count":5,"oa_works_count":0,"cited_by_count":18},{"year":2019,"works_count":5,"oa_works_count":0,"cited_by_count":31},{"year":2020,"works_count":3,"oa_works_count":0,"cited_by_count":9},{"year":2021,"works_count":2,"oa_works_count":0,"cited_by_count":11},{"year":2022,"works_count":3,"oa_works_count":0,"cited_by_count":30},{"year":2023,"works_count":6,"oa_works_count":1,"cited_by_count":42},{"year":2024,"works_count":4,"oa_works_count":0,"cited_by_count":35},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":43},{"year":2026,"works_count":1,"oa_works_count":0,"cited_by_count":33}],"display_name_alternatives":["Richard J.  F. van Haren","Richard J. F. van Haren","Richard J. van Haren","Richard Van Haren","Richard van Haren"],"block_key":"r haren","works_api_url":"https://api.openalex.org/works?filter=author.id:A5079166341","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}