{"id":"https://openalex.org/A5072285453","orcid":"https://orcid.org/0000-0002-3192-1449","observed_orcids":["https://orcid.org/0000-0002-3192-1449"],"display_name":"Soichiro Okada","raw_author_names":["Soichiro Okada","soichiro okada"],"full_name":"Soichiro Okada","works_count":36,"cited_by_count":162,"summary_stats":{"2yr_mean_citedness":1.75,"h_index":7,"i10_index":6},"ids":{"openalex":"https://openalex.org/A5072285453","orcid":"https://orcid.org/0000-0002-3192-1449","observed_orcids":["https://orcid.org/0000-0002-3192-1449"]},"affiliations":[{"institution":{"id":"https://openalex.org/I114132059","ror":"https://ror.org/05gd76j39","display_name":"Tokyo Electron (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]},"years":[2023,2020,2019,2017]},{"institution":{"id":"https://openalex.org/I4210114974","ror":"https://ror.org/02kcbn207","display_name":"IMEC","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]},"years":[2023]},{"institution":{"id":"https://openalex.org/I4405273698","ror":"https://ror.org/00a611q12","display_name":"Tokyo Electron Kyushu Ltd (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]},"years":[2026,2025,2024,2023,2022,2021,2020,2019,2018,2017,2016,2015,2014]}],"last_known_institutions":[{"id":"https://openalex.org/I4405273698","ror":"https://ror.org/00a611q12","display_name":"Tokyo Electron Kyushu Ltd (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273698"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":35,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":30,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","count":13,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","count":11,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","count":4,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0003239,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":0.0003189,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","value":0.0001297,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":8.29e-05,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","value":3.95e-05,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","score":0.9956212043762207},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8577523827552795},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.7143256664276123},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.5834494829177856},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.5394576191902161}],"counts_by_year":[{"year":2014,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2015,"works_count":2,"oa_works_count":0,"cited_by_count":11},{"year":2016,"works_count":1,"oa_works_count":0,"cited_by_count":13},{"year":2017,"works_count":2,"oa_works_count":0,"cited_by_count":9},{"year":2018,"works_count":1,"oa_works_count":0,"cited_by_count":12},{"year":2019,"works_count":2,"oa_works_count":1,"cited_by_count":8},{"year":2020,"works_count":3,"oa_works_count":1,"cited_by_count":4},{"year":2021,"works_count":3,"oa_works_count":0,"cited_by_count":5},{"year":2022,"works_count":6,"oa_works_count":1,"cited_by_count":8},{"year":2023,"works_count":7,"oa_works_count":0,"cited_by_count":16},{"year":2024,"works_count":3,"oa_works_count":1,"cited_by_count":27},{"year":2025,"works_count":3,"oa_works_count":0,"cited_by_count":30},{"year":2026,"works_count":2,"oa_works_count":0,"cited_by_count":19}],"display_name_alternatives":["Soichiro Okada","soichiro okada"],"block_key":"s okada","works_api_url":"https://api.openalex.org/works?filter=author.id:A5072285453","awards_count":0,"updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}