{"id":"https://openalex.org/A5070528860","orcid":"https://orcid.org/0000-0002-5973-0230","observed_orcids":["https://orcid.org/0000-0002-5973-0230"],"display_name":"Toshihide Nabatame","raw_author_names":["Nabatame Toshihide","Nabatame, Toshihide","T Nabatame","T. Nabatame","Toshihide NABATAME","Toshihide Nabatame","Toshihide Nabatame Toshihide Nabatame"],"full_name":"Toshihide Nabatame Toshihide Nabatame","works_count":444,"cited_by_count":5372,"summary_stats":{"2yr_mean_citedness":2.0,"h_index":35,"i10_index":134},"ids":{"openalex":"https://openalex.org/A5070528860","orcid":"https://orcid.org/0000-0002-5973-0230","observed_orcids":["https://orcid.org/0000-0002-5973-0230"]},"affiliations":[{"institution":{"id":"https://openalex.org/I113306721","ror":"https://ror.org/03t78wx29","display_name":"Hiroshima University","country_code":"JP","type":"education","lineage":["https://openalex.org/I113306721"]},"years":[2007]},{"institution":{"id":"https://openalex.org/I116465919","ror":"https://ror.org/01wc2tq75","display_name":"Kogakuin University","country_code":"JP","type":"education","lineage":["https://openalex.org/I116465919"]},"years":[2016]},{"institution":{"id":"https://openalex.org/I146399215","ror":"https://ror.org/02956yf07","display_name":"University of Tsukuba","country_code":"JP","type":"education","lineage":["https://openalex.org/I146399215"]},"years":[2018]},{"institution":{"id":"https://openalex.org/I157090871","ror":"https://ror.org/05q041y44","display_name":"Kokugakuin University","country_code":"JP","type":"education","lineage":["https://openalex.org/I157090871"]},"years":[2016]},{"institution":{"id":"https://openalex.org/I171481255","ror":"https://ror.org/020wjcq07","display_name":"Shibaura Institute of Technology","country_code":"JP","type":"education","lineage":["https://openalex.org/I171481255"]},"years":[2021,2020,2016]},{"institution":{"id":"https://openalex.org/I201537933","ror":"https://ror.org/01dq60k83","display_name":"Tohoku University","country_code":"JP","type":"education","lineage":["https://openalex.org/I201537933"]},"years":[1986]},{"institution":{"id":"https://openalex.org/I204291657","ror":"https://ror.org/00bx6dj65","display_name":"Hosei University","country_code":"JP","type":"education","lineage":["https://openalex.org/I204291657"]},"years":[2017]},{"institution":{"id":"https://openalex.org/I205349734","ror":"https://ror.org/02e16g702","display_name":"Hokkaido University","country_code":"JP","type":"education","lineage":["https://openalex.org/I205349734"]},"years":[2021,2020]},{"institution":{"id":"https://openalex.org/I205401836","ror":"https://ror.org/026v1ze26","display_name":"National Institute for Materials Science","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205401836"]},"years":[2026,2025,2024,2023,2022,2021,2020,2019,2018,2017,2016,2015,2014,2013,2012,2011,2010,2009]},{"institution":{"id":"https://openalex.org/I206011266","ror":"https://ror.org/02qf2tx24","display_name":"Kwansei Gakuin University","country_code":"JP","type":"education","lineage":["https://openalex.org/I206011266"]},"years":[2016]},{"institution":{"id":"https://openalex.org/I28130999","ror":"https://ror.org/027x43420","display_name":"Nihon Institute of Medical Science","country_code":"JP","type":"education","lineage":["https://openalex.org/I28130999"]},"years":[2026,2013]},{"institution":{"id":"https://openalex.org/I4210086780","ror":"https://ror.org/00097mb19","display_name":"Japan Science and Technology Agency","country_code":"JP","type":"government","lineage":["https://openalex.org/I1319490839","https://openalex.org/I4210086780"]},"years":[2017,2016,2015,2014]},{"institution":{"id":"https://openalex.org/I4210104871","ror":"https://ror.org/01d1kv753","display_name":"SPring-8","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210104871","https://openalex.org/I4210110652","https://openalex.org/I4210111000"]},"years":[2018]},{"institution":{"id":"https://openalex.org/I4210127336","ror":"https://ror.org/0292ym357","display_name":"Association of Super-Advanced Electronics","country_code":"JP","type":"other","lineage":["https://openalex.org/I4210127336"]},"years":[2008,2007,2006,2005,2004,2003]},{"institution":{"id":"https://openalex.org/I4210144711","ror":"https://ror.org/04048e026","display_name":"International Superconductivity Technology Center","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4210144711"]},"years":[1997,1996,1995,1994,1993]},{"institution":{"id":"https://openalex.org/I4210156525","ror":"https://ror.org/04m8nb974","display_name":"Spring-8 (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210156525"]},"years":[2018]},{"institution":{"id":"https://openalex.org/I4405265574","ror":"https://ror.org/056jpd933","display_name":"Kojundo Chemical Laboratory Co., Ltd. (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405265574"]},"years":[2021,2020]},{"institution":{"id":"https://openalex.org/I4405276234","ror":"https://ror.org/0523jgb37","display_name":"Semiconductor Leading Edge Technologies, Inc (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405276234"]},"years":[2009,2008]},{"institution":{"id":"https://openalex.org/I4405286035","ror":"https://ror.org/00zwctm44","display_name":"Research Center for Integrated Quantum Electronics, Hokkaido University","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205349734","https://openalex.org/I4405286035"]},"years":[2021,2020]},{"institution":{"id":"https://openalex.org/I4405286711","ror":"https://ror.org/02wb1d827","display_name":"Institute of Materials and Systems for Sustainability, Nagoya University","country_code":"JP","type":"facility","lineage":["https://openalex.org/I4405286711","https://openalex.org/I60134161"]},"years":[2021,2020,2017]},{"institution":{"id":"https://openalex.org/I4405286814","ror":"https://ror.org/03614j208","display_name":"Research Center for Materials Nanoarchitectonics","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205401836","https://openalex.org/I4405286814"]},"years":[2026,2025,2024,2023,2022,2021,2020,2019,2018,2017,2016,2015,2014,2013,2010]},{"institution":{"id":"https://openalex.org/I60134161","ror":"https://ror.org/04chrp450","display_name":"Nagoya University","country_code":"JP","type":"education","lineage":["https://openalex.org/I60134161"]},"years":[2021,2020,2017,1994]},{"institution":{"id":"https://openalex.org/I65143321","ror":"https://ror.org/02exqgm79","display_name":"Hitachi (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I65143321"]},"years":[2004,2003,2002,2001,2000,1999,1998,1996,1993,1992,1991,1990]},{"institution":{"id":"https://openalex.org/I73613424","ror":"https://ror.org/01703db54","display_name":"National Institute of Advanced Industrial Science and Technology","country_code":"JP","type":"government","lineage":["https://openalex.org/I73613424"]},"years":[2018,2009,2008,2007,2006,2005,2004,2003]},{"institution":{"id":"https://openalex.org/I98285908","ror":"https://ror.org/035t8zc32","display_name":"The University of Osaka","country_code":"JP","type":"education","lineage":["https://openalex.org/I98285908"]},"years":[2016]}],"last_known_institutions":[{"id":"https://openalex.org/I205401836","ror":"https://ror.org/026v1ze26","display_name":"National Institute for Materials Science","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205401836"]},{"id":"https://openalex.org/I28130999","ror":"https://ror.org/027x43420","display_name":"Nihon Institute of Medical Science","country_code":"JP","type":"education","lineage":["https://openalex.org/I28130999"]},{"id":"https://openalex.org/I4405286814","ror":"https://ror.org/03614j208","display_name":"Research Center for Materials Nanoarchitectonics","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205401836","https://openalex.org/I4405286814"]}],"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":338,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","count":174,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","count":133,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":89,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":65,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","value":0.0018971,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","value":0.0013166,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","value":0.0007003,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12529","display_name":"Ga2O3 and related materials","value":0.0004698,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","value":0.000325,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.9359956979751587},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.755173921585083},{"id":"185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","score":0.623062252998352},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.6002032160758972},{"id":"127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","score":0.31489330530166626}],"counts_by_year":[{"year":1986,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1987,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1989,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1990,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1991,"works_count":6,"oa_works_count":0,"cited_by_count":0},{"year":1992,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":1993,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":1994,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":1995,"works_count":7,"oa_works_count":1,"cited_by_count":0},{"year":1996,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":1997,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1998,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1999,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2000,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":2001,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":2002,"works_count":13,"oa_works_count":2,"cited_by_count":0},{"year":2003,"works_count":19,"oa_works_count":2,"cited_by_count":0},{"year":2004,"works_count":15,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":19,"oa_works_count":2,"cited_by_count":0},{"year":2006,"works_count":21,"oa_works_count":6,"cited_by_count":0},{"year":2007,"works_count":34,"oa_works_count":5,"cited_by_count":0},{"year":2008,"works_count":19,"oa_works_count":3,"cited_by_count":0},{"year":2009,"works_count":10,"oa_works_count":8,"cited_by_count":0},{"year":2010,"works_count":4,"oa_works_count":2,"cited_by_count":0},{"year":2011,"works_count":7,"oa_works_count":3,"cited_by_count":0},{"year":2012,"works_count":3,"oa_works_count":1,"cited_by_count":122},{"year":2013,"works_count":8,"oa_works_count":2,"cited_by_count":122},{"year":2014,"works_count":19,"oa_works_count":5,"cited_by_count":157},{"year":2015,"works_count":16,"oa_works_count":5,"cited_by_count":165},{"year":2016,"works_count":30,"oa_works_count":9,"cited_by_count":193},{"year":2017,"works_count":21,"oa_works_count":3,"cited_by_count":215},{"year":2018,"works_count":30,"oa_works_count":13,"cited_by_count":279},{"year":2019,"works_count":39,"oa_works_count":19,"cited_by_count":338},{"year":2020,"works_count":20,"oa_works_count":4,"cited_by_count":358},{"year":2021,"works_count":19,"oa_works_count":8,"cited_by_count":375},{"year":2022,"works_count":5,"oa_works_count":2,"cited_by_count":372},{"year":2023,"works_count":9,"oa_works_count":8,"cited_by_count":345},{"year":2024,"works_count":6,"oa_works_count":5,"cited_by_count":385},{"year":2025,"works_count":6,"oa_works_count":5,"cited_by_count":377},{"year":2026,"works_count":14,"oa_works_count":9,"cited_by_count":322}],"display_name_alternatives":["Nabatame Toshihide","Nabatame, Toshihide","T Nabatame","T. Nabatame","Toshihide NABATAME","Toshihide Nabatame","Toshihide Nabatame Toshihide Nabatame"],"block_key":"t nabatame","works_api_url":"https://api.openalex.org/works?filter=author.id:A5070528860","updated_date":"2026-11-06T12:48:51","created_date":"2016-06-24T00:00:00"}