{"id":"https://openalex.org/A5065769757","orcid":null,"observed_orcids":[],"display_name":"Tomoharu Fujiwara","raw_author_names":["Fujiwara Tomoharu","T. Fujiwara","Tomoharu Fujiwara"],"full_name":"Tomoharu FUJIWARA","works_count":58,"cited_by_count":269,"summary_stats":{"2yr_mean_citedness":1.2,"h_index":9,"i10_index":8},"ids":{"openalex":"https://openalex.org/A5065769757","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I122368001","ror":"https://ror.org/0280y9h11","display_name":"Nikon (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I122368001","https://openalex.org/I4210106587"]},"years":[2011,2006,2003,2002]},{"institution":{"id":"https://openalex.org/I205349734","ror":"https://ror.org/02e16g702","display_name":"Hokkaido University","country_code":"JP","type":"education","lineage":["https://openalex.org/I205349734"]},"years":[1997]},{"institution":{"id":"https://openalex.org/I4210106587","ror":"https://ror.org/01bvqg661","display_name":"Nikon (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210106587"]},"years":[2026,2024,2021,2013,2012,2011,2010,2009,2008,2007,2006,2004,2003,2002,2001,2000]},{"institution":{"id":"https://openalex.org/I4210130141","ror":"https://ror.org/02fbb9504","display_name":"Evolving Nano Process Infrastructure Development Center (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210130141"]},"years":[2015]}],"last_known_institutions":[{"id":"https://openalex.org/I4210106587","ror":"https://ror.org/01bvqg661","display_name":"Nikon (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210106587"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":51,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":31,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":23,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","count":12,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","count":8,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0004722,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":0.0003296,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":9.71e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","value":7.98e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","value":5.56e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.9029521346092224},{"id":"204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","score":0.8373016715049744},{"id":"2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","score":0.6041236519813538},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.5438826680183411},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.49637728929519653}],"counts_by_year":[{"year":1997,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2001,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":7,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":5,"oa_works_count":1,"cited_by_count":0},{"year":2009,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":3,"oa_works_count":0,"cited_by_count":11},{"year":2013,"works_count":1,"oa_works_count":1,"cited_by_count":12},{"year":2014,"works_count":2,"oa_works_count":1,"cited_by_count":9},{"year":2015,"works_count":4,"oa_works_count":1,"cited_by_count":22},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":27},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2021,"works_count":1,"oa_works_count":1,"cited_by_count":4},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2024,"works_count":3,"oa_works_count":3,"cited_by_count":9},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2026,"works_count":2,"oa_works_count":2,"cited_by_count":10}],"display_name_alternatives":["Fujiwara Tomoharu","T. Fujiwara","Tomoharu Fujiwara"],"block_key":"t fujiwara","works_api_url":"https://api.openalex.org/works?filter=author.id:A5065769757","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}