{"id":"https://openalex.org/A5065097032","orcid":null,"observed_orcids":[],"display_name":"Janko Versluijs","raw_author_names":["J J Versluijs","J Versluijs","J. J. Versluijs","J. Versluijs","J.J Versluijs","J.J. Versluijs","Janko Versluijs","Janko Versluis"],"full_name":"Janko Versluijs","works_count":67,"cited_by_count":984,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":14,"i10_index":24},"ids":{"openalex":"https://openalex.org/A5065097032","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I205274468","ror":"https://ror.org/02tyrky19","display_name":"Trinity College Dublin","country_code":"IE","type":"education","lineage":["https://openalex.org/I205274468"]},"years":[2003,2002,2001,2000,1999]},{"institution":{"id":"https://openalex.org/I4210114974","ror":"https://ror.org/02kcbn207","display_name":"IMEC","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]},"years":[2023,2022,2021,2020,2019,2018,2017,2016,2015,2014,2013,2012,2011,2010,2009,2008,2007,2006,2005]}],"last_known_institutions":[{"id":"https://openalex.org/I4210114974","ror":"https://ror.org/02kcbn207","display_name":"IMEC","country_code":"BE","type":"nonprofit","lineage":["https://openalex.org/I4210114974"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":36,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","count":29,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":26,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":18,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":18,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0003332,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","value":0.0002863,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":0.0001913,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11527","display_name":"3D IC and TSV technologies","value":9.45e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","value":8.98e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8650026321411133},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.7091684341430664},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.6818610429763794},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.5550541877746582},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.47497981786727905}],"counts_by_year":[{"year":1999,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2001,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":2002,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":6,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":2011,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":2,"oa_works_count":0,"cited_by_count":48},{"year":2013,"works_count":4,"oa_works_count":0,"cited_by_count":34},{"year":2014,"works_count":2,"oa_works_count":0,"cited_by_count":35},{"year":2015,"works_count":2,"oa_works_count":0,"cited_by_count":30},{"year":2016,"works_count":6,"oa_works_count":0,"cited_by_count":27},{"year":2017,"works_count":2,"oa_works_count":0,"cited_by_count":28},{"year":2018,"works_count":5,"oa_works_count":0,"cited_by_count":49},{"year":2019,"works_count":4,"oa_works_count":0,"cited_by_count":40},{"year":2020,"works_count":2,"oa_works_count":0,"cited_by_count":55},{"year":2021,"works_count":1,"oa_works_count":0,"cited_by_count":42},{"year":2022,"works_count":1,"oa_works_count":0,"cited_by_count":35},{"year":2023,"works_count":1,"oa_works_count":0,"cited_by_count":31},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":44},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":54},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":23}],"display_name_alternatives":["J J Versluijs","J Versluijs","J. J. Versluijs","J. Versluijs","J.J Versluijs","J.J. Versluijs","Janko Versluijs","Janko Versluis"],"block_key":"j versluijs","works_api_url":"https://api.openalex.org/works?filter=author.id:A5065097032","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}