{"id":"https://openalex.org/A5062409918","orcid":"https://orcid.org/0000-0001-8992-8654","observed_orcids":["https://orcid.org/0000-0001-8992-8654"],"display_name":"Charles Pitaval","raw_author_names":["Charles Pitaval"],"full_name":"Pitaval, Charles","works_count":3,"cited_by_count":10,"summary_stats":{"2yr_mean_citedness":5.0,"h_index":2,"i10_index":0},"ids":{"openalex":"https://openalex.org/A5062409918","orcid":"https://orcid.org/0000-0001-8992-8654","observed_orcids":["https://orcid.org/0000-0001-8992-8654"]},"affiliations":[{"institution":{"id":"https://openalex.org/I2279609970","ror":"https://ror.org/02kzqn938","display_name":"Universit\u00e9 de Lille","country_code":"FR","type":"education","lineage":["https://openalex.org/I2279609970"]},"years":[2023]},{"institution":{"id":"https://openalex.org/I4210123471","ror":"https://ror.org/02q4res37","display_name":"Institut d'Electronique, de Micro\u00e9lectronique et de Nanotechnologie","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I2279609970","https://openalex.org/I4210095849","https://openalex.org/I4210116330","https://openalex.org/I4210123471","https://openalex.org/I70348806","https://openalex.org/I7454413"]},"years":[2024,2022]},{"institution":{"id":"https://openalex.org/I4210152719","ror":"https://ror.org/0509ggw88","display_name":"III V Lab","country_code":"FR","type":"facility","lineage":["https://openalex.org/I4210152719"]},"years":[2024,2022]}],"last_known_institutions":[{"id":"https://openalex.org/I4210123471","ror":"https://ror.org/02q4res37","display_name":"Institut d'Electronique, de Micro\u00e9lectronique et de Nanotechnologie","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I2279609970","https://openalex.org/I4210095849","https://openalex.org/I4210116330","https://openalex.org/I4210123471","https://openalex.org/I70348806","https://openalex.org/I7454413"]},{"id":"https://openalex.org/I4210152719","ror":"https://ror.org/0509ggw88","display_name":"III V Lab","country_code":"FR","type":"facility","lineage":["https://openalex.org/I4210152719"]}],"topics":[{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","count":3,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","count":3,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":3,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","value":1.37e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","value":1.29e-05,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","value":6.1e-06,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.7418323755264282},{"id":"123671423","wikidata":"https://www.wikidata.org/wiki/Q332329","display_name":"Contact resistance","score":0.7137383818626404},{"id":"175665537","wikidata":"https://www.wikidata.org/wiki/Q1924991","display_name":"Metalorganic vapour phase epitaxy","score":0.6766852140426636},{"id":"110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","score":0.5504603385925293},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.3228999972343445}],"counts_by_year":[{"year":2022,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2023,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2024,"works_count":1,"oa_works_count":0,"cited_by_count":3},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":2}],"display_name_alternatives":["Charles Pitaval"],"block_key":"c pitaval","works_api_url":"https://api.openalex.org/works?filter=author.id:A5062409918","awards_count":0,"updated_date":"2026-11-07T12:08:38","created_date":"2022-11-29T00:00:00"}