{"id":"https://openalex.org/A5056215313","orcid":null,"observed_orcids":[],"display_name":"Andre Leschok","raw_author_names":["Andre Leschok"],"full_name":"Andre Leschok","works_count":5,"cited_by_count":33,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":3,"i10_index":1},"ids":{"openalex":"https://openalex.org/A5056215313","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I4210136567","ror":"https://ror.org/03whnfd14","display_name":"GlobalFoundries (Singapore)","country_code":"SG","type":"company","lineage":["https://openalex.org/I35662394","https://openalex.org/I4210136567"]},"years":[2012]},{"institution":{"id":"https://openalex.org/I4210142027","ror":"https://ror.org/045jad561","display_name":"GlobalFoundries (Germany)","country_code":"DE","type":"company","lineage":["https://openalex.org/I35662394","https://openalex.org/I4210142027"]},"years":[2013,2012]}],"last_known_institutions":[{"id":"https://openalex.org/I4210142027","ror":"https://ror.org/045jad561","display_name":"GlobalFoundries (Germany)","country_code":"DE","type":"company","lineage":["https://openalex.org/I35662394","https://openalex.org/I4210142027"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":5,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":4,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","count":4,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","count":1,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","count":1,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":4.64e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","value":1.86e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":1.69e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","value":5.5e-06,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","value":5e-06,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","score":0.8045008778572083},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.5699644088745117},{"id":"120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","score":0.4834252595901489},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.4537591338157654},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.27311885356903076}],"counts_by_year":[{"year":2012,"works_count":3,"oa_works_count":0,"cited_by_count":1},{"year":2013,"works_count":2,"oa_works_count":0,"cited_by_count":2},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":4}],"display_name_alternatives":["Andre Leschok"],"block_key":"a leschok","works_api_url":"https://api.openalex.org/works?filter=author.id:A5056215313","updated_date":"2026-10-27T12:30:23","created_date":"2016-06-24T00:00:00"}