{"id":"https://openalex.org/A5050003371","orcid":null,"observed_orcids":[],"display_name":"Marek \u0160kere\u0148","raw_author_names":["M Skeren","M \u0160kere\u0148","M. \u0160kere\u0148","Marek Skeren","Marek \u0160kere\u0148","Skeren, Marek"],"full_name":"Skeren, Marek","works_count":51,"cited_by_count":233,"summary_stats":{"2yr_mean_citedness":4.0,"h_index":7,"i10_index":4},"ids":{"openalex":"https://openalex.org/A5050003371","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I4210140038","ror":"https://ror.org/054jtdj73","display_name":"IQ Structures (Czechia)","country_code":"CZ","type":"company","lineage":["https://openalex.org/I4210140038"]},"years":[2018]},{"institution":{"id":"https://openalex.org/I44504214","ror":"https://ror.org/03kqpb082","display_name":"Czech Technical University in Prague","country_code":"CZ","type":"education","lineage":["https://openalex.org/I44504214"]},"years":[2017,2016,2015,2014,2013,2012,2011,2010,2009,2007,2006,2004,2003,2002,2001,2000]},{"institution":{"id":"https://openalex.org/I66862912","ror":"https://ror.org/040wg7k59","display_name":"Chalmers University of Technology","country_code":"SE","type":"education","lineage":["https://openalex.org/I66862912"]},"years":[2004]}],"last_known_institutions":null,"topics":[{"id":"https://openalex.org/T11408","display_name":"Advanced Optical Imaging Technologies","count":31,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":13,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","count":9,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","count":9,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","count":9,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11408","display_name":"Advanced Optical Imaging Technologies","value":0.0002071,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","value":7.7e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11897","display_name":"Digital Holography and Microscopy","value":6.98e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":5.47e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":4.25e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.9187536239624023},{"id":"120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","score":0.809861421585083},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.7572788596153259},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.5791279673576355},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.4918386936187744}],"counts_by_year":[{"year":2000,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2001,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":6,"oa_works_count":1,"cited_by_count":0},{"year":2012,"works_count":4,"oa_works_count":2,"cited_by_count":7},{"year":2013,"works_count":12,"oa_works_count":10,"cited_by_count":13},{"year":2014,"works_count":1,"oa_works_count":1,"cited_by_count":13},{"year":2015,"works_count":6,"oa_works_count":1,"cited_by_count":19},{"year":2016,"works_count":2,"oa_works_count":1,"cited_by_count":18},{"year":2017,"works_count":1,"oa_works_count":1,"cited_by_count":36},{"year":2018,"works_count":1,"oa_works_count":0,"cited_by_count":12},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":18},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":15},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":15},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":8},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":7},{"year":2024,"works_count":1,"oa_works_count":1,"cited_by_count":9},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":8},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":7}],"display_name_alternatives":["M Skeren","M \u0160kere\u0148","M. \u0160kere\u0148","Marek Skeren","Marek \u0160kere\u0148","Skeren, Marek"],"block_key":"m skeren","works_api_url":"https://api.openalex.org/works?filter=author.id:A5050003371","awards_count":2,"awards_api_url":"https://api.openalex.org/awards?filter=investigators.author.id:A5050003371","updated_date":"2026-11-10T14:30:39","created_date":"2016-06-24T00:00:00"}