{"id":"https://openalex.org/A5046330525","orcid":"https://orcid.org/0000-0002-7376-6571","observed_orcids":["https://orcid.org/0000-0002-7376-6571"],"display_name":"Toshiya Ogiwara","raw_author_names":["OGIWARA, Toshiya","Ogiwara, Toshiya","T Ogiwara","T. Ogiwara","Toshiya OGIWARA","Toshiya Ogiwara","\u4fca\u5f25 \u837b\u539f","\u837b\u539f \u4fca\u5f25","\u837b\u539f\u4fca\u5f25"],"full_name":"OGIWARA, Toshiya","works_count":79,"cited_by_count":98,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":6,"i10_index":3},"ids":{"openalex":"https://openalex.org/A5046330525","orcid":"https://orcid.org/0000-0002-7376-6571","observed_orcids":["https://orcid.org/0000-0002-7376-6571"]},"affiliations":[{"institution":{"id":"https://openalex.org/I205401836","ror":"https://ror.org/026v1ze26","display_name":"National Institute for Materials Science","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205401836"]},"years":[2025,2024,2023,2022,2019,2018,2016,2015,2014,2012,2011,2010,2009,2008,2007,2006]},{"institution":{"id":"https://openalex.org/I2251713219","ror":"https://ror.org/00berct97","display_name":"NTT (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I2251713219"]},"years":[2004]},{"institution":{"id":"https://openalex.org/I4405273792","ror":"https://ror.org/00fmedr36","display_name":"NTT Advanced Technology Corporation (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4405273792"]},"years":[2004,2002]}],"last_known_institutions":[{"id":"https://openalex.org/I205401836","ror":"https://ror.org/026v1ze26","display_name":"National Institute for Materials Science","country_code":"JP","type":"facility","lineage":["https://openalex.org/I205401836"]}],"topics":[{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","count":73,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","count":58,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11733","display_name":"X-ray Spectroscopy and Fluorescence Analysis","count":32,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13552","display_name":"Advanced Materials Characterization Techniques","count":25,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":11,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T13552","display_name":"Advanced Materials Characterization Techniques","value":0.0003152,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","value":0.000209,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11733","display_name":"X-ray Spectroscopy and Fluorescence Analysis","value":0.0001392,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","value":6.29e-05,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":2.91e-05,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"2780646311","wikidata":"https://www.wikidata.org/wiki/Q1142501","display_name":"Auger","score":0.9474976062774658},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.7636843323707581},{"id":"113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","score":0.6072700023651123},{"id":"185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","score":0.4471896290779114},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.30013883113861084}],"counts_by_year":[{"year":1990,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":1992,"works_count":5,"oa_works_count":5,"cited_by_count":0},{"year":1995,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1996,"works_count":4,"oa_works_count":3,"cited_by_count":0},{"year":2002,"works_count":4,"oa_works_count":3,"cited_by_count":0},{"year":2003,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":6,"oa_works_count":1,"cited_by_count":0},{"year":2006,"works_count":3,"oa_works_count":2,"cited_by_count":0},{"year":2007,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":2008,"works_count":7,"oa_works_count":1,"cited_by_count":0},{"year":2009,"works_count":3,"oa_works_count":2,"cited_by_count":0},{"year":2010,"works_count":6,"oa_works_count":4,"cited_by_count":0},{"year":2011,"works_count":5,"oa_works_count":4,"cited_by_count":0},{"year":2012,"works_count":1,"oa_works_count":1,"cited_by_count":5},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2014,"works_count":1,"oa_works_count":0,"cited_by_count":3},{"year":2015,"works_count":1,"oa_works_count":0,"cited_by_count":3},{"year":2016,"works_count":1,"oa_works_count":1,"cited_by_count":5},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2018,"works_count":2,"oa_works_count":2,"cited_by_count":2},{"year":2019,"works_count":4,"oa_works_count":4,"cited_by_count":5},{"year":2020,"works_count":1,"oa_works_count":1,"cited_by_count":4},{"year":2021,"works_count":4,"oa_works_count":4,"cited_by_count":3},{"year":2022,"works_count":2,"oa_works_count":2,"cited_by_count":3},{"year":2023,"works_count":6,"oa_works_count":6,"cited_by_count":4},{"year":2024,"works_count":2,"oa_works_count":2,"cited_by_count":8},{"year":2025,"works_count":2,"oa_works_count":2,"cited_by_count":0},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":2}],"display_name_alternatives":["OGIWARA, Toshiya","Ogiwara, Toshiya","T Ogiwara","T. Ogiwara","Toshiya OGIWARA","Toshiya Ogiwara","\u4fca\u5f25 \u837b\u539f","\u837b\u539f \u4fca\u5f25","\u837b\u539f\u4fca\u5f25"],"block_key":"t ogiwara","works_api_url":"https://api.openalex.org/works?filter=author.id:A5046330525","updated_date":"2026-11-03T12:34:24","created_date":"2016-06-24T00:00:00"}