{"id":"https://openalex.org/A5045803298","orcid":null,"observed_orcids":[],"display_name":"Kars Troost","raw_author_names":["K Z Troost","K. Troost","K. Z. Troost","K.Z. Troost","Kars Troost","Kars Z. Troost"],"full_name":"Kars Z. Troost","works_count":37,"cited_by_count":883,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":15,"i10_index":20},"ids":{"openalex":"https://openalex.org/A5045803298","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I193662353","ror":"https://ror.org/04pp8hn57","display_name":"Utrecht University","country_code":"NL","type":"education","lineage":["https://openalex.org/I193662353"]},"years":[1991,1990,1986]},{"institution":{"id":"https://openalex.org/I4210122849","ror":"https://ror.org/02p2bgp27","display_name":"Philips (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210122849"]},"years":[1993]},{"institution":{"id":"https://openalex.org/I927257375","ror":"https://ror.org/01vxknj13","display_name":"ASML (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]},"years":[2026,2022,2021,2020,2019,2018,2017,2016,2015,2014,2004]}],"last_known_institutions":[{"id":"https://openalex.org/I927257375","ror":"https://ror.org/01vxknj13","display_name":"ASML (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":24,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":22,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","count":19,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11277","display_name":"Thermal properties of materials","count":4,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","count":4,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0002222,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":0.0001433,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":9.29e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13552","display_name":"Advanced Materials Characterization Techniques","value":5.22e-05,"subfield":{"id":"https://openalex.org/subfields/2500","display_name":"General Materials Science"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","value":2.96e-05,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","score":0.9858958721160889},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8857063055038452},{"id":"120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","score":0.789406418800354},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.6832489967346191},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.671268105506897}],"counts_by_year":[{"year":1986,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1990,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1991,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":1993,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":1994,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":2004,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":8},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":13},{"year":2014,"works_count":1,"oa_works_count":0,"cited_by_count":8},{"year":2015,"works_count":1,"oa_works_count":0,"cited_by_count":17},{"year":2016,"works_count":2,"oa_works_count":0,"cited_by_count":16},{"year":2017,"works_count":3,"oa_works_count":0,"cited_by_count":30},{"year":2018,"works_count":3,"oa_works_count":0,"cited_by_count":49},{"year":2019,"works_count":3,"oa_works_count":0,"cited_by_count":45},{"year":2020,"works_count":4,"oa_works_count":0,"cited_by_count":33},{"year":2021,"works_count":2,"oa_works_count":0,"cited_by_count":49},{"year":2022,"works_count":2,"oa_works_count":0,"cited_by_count":94},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":57},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":95},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":70},{"year":2026,"works_count":1,"oa_works_count":0,"cited_by_count":46}],"display_name_alternatives":["K Z Troost","K. Troost","K. Z. Troost","K.Z. Troost","Kars Troost","Kars Z. Troost"],"block_key":"k troost","works_api_url":"https://api.openalex.org/works?filter=author.id:A5045803298","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}