{"id":"https://openalex.org/A5043639633","orcid":null,"observed_orcids":[],"display_name":"Paul F. Luehrmann","raw_author_names":["Paul F. Luehrmann","Paul F. Luehrmann, Jr.","Paul Luehrmann"],"full_name":"Paul F. Luehrmann, Jr.","works_count":14,"cited_by_count":44,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":4,"i10_index":1},"ids":{"openalex":"https://openalex.org/A5043639633","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I927257375","ror":"https://ror.org/01vxknj13","display_name":"ASML (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]},"years":[2011,2010,2009,2008,1993]}],"last_known_institutions":[{"id":"https://openalex.org/I927257375","ror":"https://ror.org/01vxknj13","display_name":"ASML (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":13,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":10,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","count":6,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","count":3,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","count":3,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0001204,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":4.22e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","value":2.78e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":2.26e-05,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13114","display_name":"Image Processing Techniques and Applications","value":1.11e-05,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","score":0.871519923210144},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.7715990543365479},{"id":"120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","score":0.738978385925293},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.650479793548584},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.24513459205627441}],"counts_by_year":[{"year":1984,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1991,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1992,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1993,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1994,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1998,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":1}],"display_name_alternatives":["Paul F. Luehrmann","Paul F. Luehrmann, Jr.","Paul Luehrmann"],"block_key":"p luehrmann","works_api_url":"https://api.openalex.org/works?filter=author.id:A5043639633","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}