{"id":"https://openalex.org/A5035537503","orcid":null,"observed_orcids":[],"display_name":"Lorie-Mae Baclea-an","raw_author_names":["Baclea-an, Lorie Mae","Baclea-an, Lorie-Mae","Lorie Mae Baclea-An","Lorie Mae Baclea-an","Lorie-Mae Baclea-an"],"full_name":"Baclea-an, Lorie-Mae","works_count":17,"cited_by_count":114,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":4,"i10_index":2},"ids":{"openalex":"https://openalex.org/A5035537503","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I148283060","ror":"https://ror.org/02jbv0t02","display_name":"Lawrence Berkeley National Laboratory","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]},"years":[2012,2011,2010,2009]}],"last_known_institutions":[{"id":"https://openalex.org/I148283060","ror":"https://ror.org/02jbv0t02","display_name":"Lawrence Berkeley National Laboratory","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I148283060","https://openalex.org/I39565521"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":17,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","count":15,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":9,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":3,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12084","display_name":"Synthesis and properties of polymers","count":2,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0001576,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":0.0001131,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":3.8e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":3.19e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12084","display_name":"Synthesis and properties of polymers","value":1.72e-05,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","score":0.9937230348587036},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.7398345470428467},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.49015483260154724},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.3678460121154785},{"id":"2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","score":0.18025287985801697}],"counts_by_year":[{"year":2009,"works_count":3,"oa_works_count":2,"cited_by_count":0},{"year":2010,"works_count":3,"oa_works_count":3,"cited_by_count":0},{"year":2011,"works_count":9,"oa_works_count":4,"cited_by_count":0},{"year":2012,"works_count":2,"oa_works_count":0,"cited_by_count":10},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":13},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":18},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":8},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":17},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":4}],"display_name_alternatives":["Baclea-an, Lorie Mae","Baclea-an, Lorie-Mae","Lorie Mae Baclea-An","Lorie Mae Baclea-an","Lorie-Mae Baclea-an"],"block_key":"l baclea-an","works_api_url":"https://api.openalex.org/works?filter=author.id:A5035537503","awards_count":0,"updated_date":"2026-11-04T11:47:51","created_date":"2016-06-24T00:00:00"}