{"id":"https://openalex.org/A5026809682","orcid":null,"observed_orcids":[],"display_name":"Christoph Schwan","raw_author_names":["C. Schwan","Christoph Schwan","Schwan, Christoph"],"full_name":"Christoph Schwan","works_count":19,"cited_by_count":247,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":9,"i10_index":6},"ids":{"openalex":"https://openalex.org/A5026809682","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I35662394","ror":"https://ror.org/02h0ps145","display_name":"GlobalFoundries (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I35662394"]},"years":[2019]},{"institution":{"id":"https://openalex.org/I4210137977","ror":"https://ror.org/04kd6c783","display_name":"Advanced Micro Devices (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4210137977"]},"years":[2007]},{"institution":{"id":"https://openalex.org/I4210142027","ror":"https://ror.org/045jad561","display_name":"GlobalFoundries (Germany)","country_code":"DE","type":"company","lineage":["https://openalex.org/I35662394","https://openalex.org/I4210142027"]},"years":[2023,2022,2019,2018,2017,2016]}],"last_known_institutions":null,"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":14,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":14,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10187","display_name":"Radio Frequency Integrated Circuit Design","count":13,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10262","display_name":"Microwave Engineering and Waveguides","count":7,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","count":4,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","value":5.19e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10187","display_name":"Radio Frequency Integrated Circuit Design","value":4.64e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","value":4.57e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","value":2.9e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10262","display_name":"Microwave Engineering and Waveguides","value":1.78e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8754175305366516},{"id":"53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","score":0.8259992599487305},{"id":"119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","score":0.6658473610877991},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.6413357257843018},{"id":"127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","score":0.44130000472068787}],"counts_by_year":[{"year":2004,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2007,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2016,"works_count":3,"oa_works_count":1,"cited_by_count":0},{"year":2017,"works_count":1,"oa_works_count":0,"cited_by_count":1},{"year":2018,"works_count":1,"oa_works_count":0,"cited_by_count":5},{"year":2019,"works_count":2,"oa_works_count":1,"cited_by_count":26},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":19},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":27},{"year":2022,"works_count":4,"oa_works_count":4,"cited_by_count":35},{"year":2023,"works_count":2,"oa_works_count":1,"cited_by_count":37},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":44},{"year":2025,"works_count":1,"oa_works_count":1,"cited_by_count":32},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":9}],"display_name_alternatives":["C. Schwan","Christoph Schwan","Schwan, Christoph"],"block_key":"c schwan","works_api_url":"https://api.openalex.org/works?filter=author.id:A5026809682","awards_count":0,"awards_api_url":"https://api.openalex.org/awards?filter=investigators.author.id:A5026809682","updated_date":"2026-11-08T12:57:04","created_date":"2016-06-24T00:00:00"}