{"id":"https://openalex.org/A5023950706","orcid":null,"observed_orcids":[],"display_name":"Werner Wiechmann","raw_author_names":["W. Wiechmann","Werner Wiechmann"],"full_name":"Werner Wiechmann","works_count":21,"cited_by_count":227,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":6,"i10_index":3},"ids":{"openalex":"https://openalex.org/A5023950706","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I4210096308","ror":"https://ror.org/00z8ws214","display_name":"Institute of Materials for Electronics and Magnetism","country_code":"IT","type":"facility","lineage":["https://openalex.org/I4210096308","https://openalex.org/I4210155236"]},"years":[2007]},{"institution":{"id":"https://openalex.org/I4210143797","ror":"https://ror.org/04wzv3n59","display_name":"Sony (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210143797"]},"years":[2004,1996,1995,1994,1993]},{"institution":{"id":"https://openalex.org/I72427458","ror":"https://ror.org/01a5v8x09","display_name":"JDSU (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I2800524328","https://openalex.org/I72427458"]},"years":[2007,2005]}],"last_known_institutions":[{"id":"https://openalex.org/I4210096308","ror":"https://ror.org/00z8ws214","display_name":"Institute of Materials for Electronics and Magnetism","country_code":"IT","type":"facility","lineage":["https://openalex.org/I4210096308","https://openalex.org/I4210155236"]},{"id":"https://openalex.org/I72427458","ror":"https://ror.org/01a5v8x09","display_name":"JDSU (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I2800524328","https://openalex.org/I72427458"]}],"topics":[{"id":"https://openalex.org/T11127","display_name":"Solid State Laser Technologies","count":18,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11050","display_name":"Photorefractive and Nonlinear Optics","count":12,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12760","display_name":"Laser Design and Applications","count":10,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11429","display_name":"Semiconductor Lasers and Optical Devices","count":5,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","count":3,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11127","display_name":"Solid State Laser Technologies","value":9.58e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12760","display_name":"Laser Design and Applications","value":7.46e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11050","display_name":"Photorefractive and Nonlinear Optics","value":3.74e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12510","display_name":"Magneto-Optical Properties and Applications","value":2.65e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","value":1.27e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","score":0.8390468955039978},{"id":"520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","score":0.8081117868423462},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.786468505859375},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.6903291344642639},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.6266192197799683}],"counts_by_year":[{"year":1993,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1994,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1995,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":1996,"works_count":5,"oa_works_count":1,"cited_by_count":0},{"year":1998,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":2006,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":7},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2015,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":10},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":4}],"display_name_alternatives":["W. Wiechmann","Werner Wiechmann"],"block_key":"w wiechmann","works_api_url":"https://api.openalex.org/works?filter=author.id:A5023950706","awards_count":0,"updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}